EP4177370 - SYSTEM FOR BALANCING CONSUMPTION OF TARGETS IN PULSED DUAL MAGNETRON SPUTTERING (DMS) [Right-click to bookmark this link] | Status | Request for examination was made Status updated on 06.10.2023 Database last updated on 19.10.2024 | |
Former | The application has been published Status updated on 07.04.2023 | Most recent event Tooltip | 12.06.2024 | New entry: Renewal fee paid | Applicant(s) | For all designated states AES Global Holdings, Pte. Ltd. 80 Robinson Road No. 02-00 Singapore 068898.3 / SG | [2023/19] | Inventor(s) | 01 /
CHRISTIE, David Fort Collins, CO, 80525 / US | [2023/19] | Representative(s) | McKinnon, Alistair James WP Thompson 138 Fetter Lane London EC4A 1BT / GB | [N/P] |
Former [2023/19] | Gill, David Alan WP Thompson 138 Fetter Lane London EC4A 1BT / GB | Application number, filing date | 22193138.9 | 16.07.2014 | [2023/19] | Priority number, date | US201361847498P | 17.07.2013 Original published format: US 201361847498 P | [2023/19] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP4177370 | Date: | 10.05.2023 | Language: | EN | [2023/19] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 13.04.2023 | Classification | IPC: | C23C14/00, C23C14/34, C23C14/54, H01J37/34, H01J37/32 | [2023/19] | CPC: |
H01J37/3405 (EP,US);
C23C14/0042 (EP,US);
C23C14/3464 (EP,US);
C23C14/3485 (EP,US);
C23C14/35 (US);
C23C14/54 (EP,US);
H01J37/32027 (US);
H01J37/32935 (EP,US);
H01J37/3299 (EP,US);
H01J37/3417 (EP,US);
H01J37/3438 (EP,US);
H01J37/3444 (EP,US);
| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2023/45] |
Former [2023/19] | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR | Title | German: | SYSTEM ZUM AUSGLEICHEN DES VERBRAUCHS VON TARGETS BEI GEPULSTEM DUALMAGNETRONSPUTTERN (DMS) | [2023/19] | English: | SYSTEM FOR BALANCING CONSUMPTION OF TARGETS IN PULSED DUAL MAGNETRON SPUTTERING (DMS) | [2023/19] | French: | SYSTÈME D'ÉQUILIBRAGE DE LA CONSOMMATION DE CIBLES DANS LA PULVÉRISATION À DOUBLES MAGNÉTRONS PULSÉS (DMS) | [2023/19] | Examination procedure | 02.10.2023 | Amendment by applicant (claims and/or description) | 02.10.2023 | Examination requested [2023/45] | 02.10.2023 | Date on which the examining division has become responsible | Parent application(s) Tooltip | EP14745332.8 / EP3022328 | Fees paid | Renewal fee | 31.08.2022 | Renewal fee patent year 03 | 31.08.2022 | Renewal fee patent year 04 | 31.08.2022 | Renewal fee patent year 05 | 31.08.2022 | Renewal fee patent year 06 | 31.08.2022 | Renewal fee patent year 07 | 31.08.2022 | Renewal fee patent year 08 | 31.08.2022 | Renewal fee patent year 09 | 14.06.2023 | Renewal fee patent year 10 | 12.06.2024 | Renewal fee patent year 11 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]US2004262156 (SEYMOUR ERIC A [US], et al) [A] 1-14 * page 1, paragraphs 2, 10 * * page 2, paragraph 18 *; | [AD]US2011248633 (NAUMAN KENNETH E [US], et al) [AD] 1-14* page 8, paragraph 103 - page 9, paragraph 109 * | by applicant | US942 | US13104 | US5917286 | US2011248633 | US8391025 |