EP4194949 - PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING A PATTERN USING THE PHOTOACID GENERATOR [Right-click to bookmark this link] | Status | Examination is in progress Status updated on 01.03.2024 Database last updated on 19.10.2024 | |
Former | Request for examination was made Status updated on 12.05.2023 | Most recent event Tooltip | 13.09.2024 | New entry: Renewal fee paid | Applicant(s) | For all designated states Samsung Electronics Co., Ltd. 129, Samsung-ro Yeongtong-gu Suwon-si Gyeonggi-do 16677 / KR | [2023/24] | Inventor(s) | 01 /
KIM, Minsang 16678 Suwon-si / KR | 02 /
KOH, Haengdeog 16678 Suwon-si / KR | 03 /
KIM, Hana 16678 Suwon-si / KR | 04 /
KWAK, Yoonhyun 16678 Suwon-si / KR | 05 /
KIM, Hyeran 16678 Suwon-si / KR | 06 /
LEE, Eunkyung 16678 Suwon-si / KR | 07 /
JEON, Aram 16678 Suwon-si / KR | [2023/24] | Representative(s) | Elkington and Fife LLP Prospect House 8 Pembroke Road Sevenoaks, Kent TN13 1XR / GB | [2023/24] | Application number, filing date | 22200779.1 | 11.10.2022 | [2023/24] | Priority number, date | KR20210164871 | 25.11.2021 Original published format: KR 20210164871 | KR20220121121 | 23.09.2022 Original published format: KR 20220121121 | [2023/24] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP4194949 | Date: | 14.06.2023 | Language: | EN | [2023/24] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 15.05.2023 | Classification | IPC: | G03F7/004, G03F7/039, G03F7/075 | [2023/24] | CPC: |
G03F7/0045 (EP,US);
G03F7/004 (CN);
C08F220/1807 (CN,US);
C08F220/382 (CN);
G03F7/0392 (EP,US);
G03F7/0397 (EP);
G03F7/0757 (EP)
(-)
| C-Set: |
C08F220/1807, C08F220/382 (CN);
C08F220/382, C08F220/1807 (CN) | Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, ME, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2023/24] | Extension states | BA | Not yet paid | Validation states | KH | Not yet paid | MA | Not yet paid | MD | Not yet paid | TN | Not yet paid | Title | German: | FOTOSÄUREGENERATOR, FOTOLACKZUSAMMENSETZUNG DAMIT UND VERFAHREN ZUR BILDUNG EINES MUSTERS MIT DEM FOTOSÄUREGENERATOR | [2023/24] | English: | PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING A PATTERN USING THE PHOTOACID GENERATOR | [2023/24] | French: | GÉNÉRATEUR DE PHOTOACIDE, COMPOSITION DE RÉSINE PHOTOSENSIBLE LE COMPRENANT ET PROCÉDÉ DE FORMATION D'UN MOTIF À L'AIDE DU GÉNÉRATEUR DE PHOTOACIDE | [2023/24] | Examination procedure | 29.03.2023 | Examination requested [2023/24] | 26.09.2023 | Amendment by applicant (claims and/or description) | 26.09.2023 | Date on which the examining division has become responsible | 29.02.2024 | Despatch of a communication from the examining division (Time limit: M04) | 22.04.2024 | Reply to a communication from the examining division | Fees paid | Renewal fee | 12.09.2024 | Renewal fee patent year 03 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]US2013177848 (KANTO YUSUKE [JP], et al) [A] 1-15 * Examples 5 and 6 *; | [A]WO2015022779 (TOYO GOSEI CO LTD [JP]) [A] 1-15* para. [0075]-[0094] *; | [XY]US2015072292 (CHO SANGHO [US], et al) [X] 1-10,13-15 * the whole document * * claims 1-10 * * para. [0005]-[0006], [0021]-[0022], [0038]-[0042], [0050], [0074], [0083] * * examples 2, 7-14 * [Y] 11,12; | [A]US9104110 (OHASHI MASAKI [JP], et al) [A] 1-15 * Table 1 *; | [YA]US9581901 (JAIN VIPUL [US], et al) [Y] 11 * claims 1-16 * * col. 15, lines 45-55 * [A] 1-10,13-15; | [YA]US2020081341 (FUJIWARA TAKAYUKI [JP], et al) [Y] 11,12 * para. [0082], [0101], [0159] * [A] 1-10,13-15; | [YA]US2021223692 (SONG HYUNJI [KR], et al) [Y] 11 * para. [0040]-[0052] * [A] 1-10,13-15 |