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Extract from the Register of European Patents

EP About this file: EP4194949

EP4194949 - PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING A PATTERN USING THE PHOTOACID GENERATOR [Right-click to bookmark this link]
StatusExamination is in progress
Status updated on  01.03.2024
Database last updated on 19.10.2024
FormerRequest for examination was made
Status updated on  12.05.2023
Most recent event   Tooltip13.09.2024New entry: Renewal fee paid 
Applicant(s)For all designated states
Samsung Electronics Co., Ltd.
129, Samsung-ro
Yeongtong-gu
Suwon-si
Gyeonggi-do 16677 / KR
[2023/24]
Inventor(s)01 / KIM, Minsang
16678 Suwon-si / KR
02 / KOH, Haengdeog
16678 Suwon-si / KR
03 / KIM, Hana
16678 Suwon-si / KR
04 / KWAK, Yoonhyun
16678 Suwon-si / KR
05 / KIM, Hyeran
16678 Suwon-si / KR
06 / LEE, Eunkyung
16678 Suwon-si / KR
07 / JEON, Aram
16678 Suwon-si / KR
 [2023/24]
Representative(s)Elkington and Fife LLP
Prospect House
8 Pembroke Road
Sevenoaks, Kent TN13 1XR / GB
[2023/24]
Application number, filing date22200779.111.10.2022
[2023/24]
Priority number, dateKR2021016487125.11.2021         Original published format: KR 20210164871
KR2022012112123.09.2022         Original published format: KR 20220121121
[2023/24]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP4194949
Date:14.06.2023
Language:EN
[2023/24]
Search report(s)(Supplementary) European search report - dispatched on:EP15.05.2023
ClassificationIPC:G03F7/004, G03F7/039, G03F7/075
[2023/24]
CPC:
G03F7/0045 (EP,US); G03F7/004 (CN); C08F220/1807 (CN,US);
C08F220/382 (CN); G03F7/0392 (EP,US); G03F7/0397 (EP);
G03F7/0757 (EP) (-)
C-Set:
C08F220/1807, C08F220/382 (CN);
C08F220/382, C08F220/1807 (CN)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   ME,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2023/24]
Extension statesBANot yet paid
Validation statesKHNot yet paid
MANot yet paid
MDNot yet paid
TNNot yet paid
TitleGerman:FOTOSÄUREGENERATOR, FOTOLACKZUSAMMENSETZUNG DAMIT UND VERFAHREN ZUR BILDUNG EINES MUSTERS MIT DEM FOTOSÄUREGENERATOR[2023/24]
English:PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING A PATTERN USING THE PHOTOACID GENERATOR[2023/24]
French:GÉNÉRATEUR DE PHOTOACIDE, COMPOSITION DE RÉSINE PHOTOSENSIBLE LE COMPRENANT ET PROCÉDÉ DE FORMATION D'UN MOTIF À L'AIDE DU GÉNÉRATEUR DE PHOTOACIDE[2023/24]
Examination procedure29.03.2023Examination requested  [2023/24]
26.09.2023Amendment by applicant (claims and/or description)
26.09.2023Date on which the examining division has become responsible
29.02.2024Despatch of a communication from the examining division (Time limit: M04)
22.04.2024Reply to a communication from the examining division
Fees paidRenewal fee
12.09.2024Renewal fee patent year 03
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Documents cited:Search[A]US2013177848  (KANTO YUSUKE [JP], et al) [A] 1-15 * Examples 5 and 6 *;
 [A]WO2015022779  (TOYO GOSEI CO LTD [JP]) [A] 1-15* para. [0075]-[0094] *;
 [XY]US2015072292  (CHO SANGHO [US], et al) [X] 1-10,13-15 * the whole document * * claims 1-10 * * para. [0005]-[0006], [0021]-[0022], [0038]-[0042], [0050], [0074], [0083] * * examples 2, 7-14 * [Y] 11,12;
 [A]US9104110  (OHASHI MASAKI [JP], et al) [A] 1-15 * Table 1 *;
 [YA]US9581901  (JAIN VIPUL [US], et al) [Y] 11 * claims 1-16 * * col. 15, lines 45-55 * [A] 1-10,13-15;
 [YA]US2020081341  (FUJIWARA TAKAYUKI [JP], et al) [Y] 11,12 * para. [0082], [0101], [0159] * [A] 1-10,13-15;
 [YA]US2021223692  (SONG HYUNJI [KR], et al) [Y] 11 * para. [0040]-[0052] * [A] 1-10,13-15
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.