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Extract from the Register of European Patents

EP About this file: EP4321658

EP4321658 - METHOD FOR PRODUCING NITRIDE SEMICONDUCTOR WAFER [Right-click to bookmark this link]
StatusRequest for examination was made
Status updated on  12.01.2024
Database last updated on 26.06.2024
FormerThe international publication has been made
Status updated on  14.10.2022
Most recent event   Tooltip14.06.2024Change: Validation statespublished on 17.07.2024 [2024/29]
14.06.2024Change - extension statespublished on 17.07.2024 [2024/29]
Applicant(s)For all designated states
Shin-Etsu Handotai Co., Ltd.
2-1, Ohtemachi 2-chome
Chiyoda-ku
Tokyo 100-0004 / JP
[2024/07]
Inventor(s)01 / HAGIMOTO, Kazunori
Annaka-shi, Gunma 379-0196 / JP
02 / ISHIZAKI, Junya
Annaka-shi, Gunma 379-0196 / JP
03 / OHTSUKI, Tsuyoshi
Annaka-shi, Gunma 379-0196 / JP
 [2024/07]
Representative(s)Sonnenhauser, Thomas Martin
Wuesthoff & Wuesthoff
Patentanwälte und Rechtsanwalt PartG mbB
Schweigerstraße 2
81541 München / DE
[N/P]
Former [2024/07]Sonnenhauser, Thomas Martin
Wuesthoff & Wuesthoff
Patentanwälte PartG mbB
Schweigerstraße 2
81541 München / DE
Application number, filing date22784449.516.03.2022
[2024/07]
WO2022JP11764
Priority number, dateJP2021006602208.04.2021         Original published format: JP 2021066022
[2024/07]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2022215464
Date:13.10.2022
Language:JA
[2022/41]
Type: A1 Application with search report 
No.:EP4321658
Date:14.02.2024
Language:EN
[2024/07]
Search report(s)International search report - published on:JP13.10.2022
ClassificationIPC:C30B25/18, H01L21/205, C30B29/38
[2024/07]
CPC:
H01L21/02381 (EP,US); H01L21/263 (US); C30B25/183 (EP);
C30B29/406 (EP); C30B29/68 (EP); C30B33/00 (EP);
H01L21/02458 (EP,US); H01L21/02507 (EP); H01L21/0254 (EP,US);
H01L21/02658 (EP,US); H01L21/02664 (EP) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2024/07]
TitleGerman:VERFAHREN ZUR HERSTELLUNG EINES NITRIDHALBLEITERWAFERS[2024/07]
English:METHOD FOR PRODUCING NITRIDE SEMICONDUCTOR WAFER[2024/07]
French:PROCÉDÉ DE PRODUCTION DE TRANCHE DE SEMI-CONDUCTEUR AU NITRURE[2024/07]
Entry into regional phase26.09.2023Translation filed 
26.09.2023National basic fee paid 
26.09.2023Search fee paid 
26.09.2023Designation fee(s) paid 
26.09.2023Examination fee paid 
Examination procedure26.09.2023Examination requested  [2024/07]
Fees paidRenewal fee
27.02.2024Renewal fee patent year 03
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Cited inInternational search[AX]JP2006351649  (SHOWA DENKO KK) [A] 4-5 [X] 1-3;
 [AX]JP2015523712  (SILICON GENESIS CORP.) [A] 5 [X] 1-4;
 [AX]US2017069723  (LINTHICUM KEVIN J [US]) [A] 3 [X] 1-2, 4-5;
 [AX]JP2018113358  (MITSUBISHI ELECTRIC CORP) [A] 3 [X] 1-2, 4-5;
 [AX]JP2020098839  (SHINETSU HANDOTAI KK) [A] 4-5 [X] 1-3;
 [EX]JP2022050886  (SHINETSU HANDOTAI KK) [EX] 1-5* claims, paragraphs [0020]-[0022] *
by applicantWO2005020320
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.