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EP4235305
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EP About this file: EP4235305
| EP4235305 - A METHOD IN THE MANUFACTURING PROCESS OF A DEVICE, A NON-TRANSITORY COMPUTER-READABLE MEDIUM AND A SYSTEM CONFIGURED TO PERFORM THE METHOD [Right-click to bookmark this link] | Status | Request for examination was made Status updated on 01.03.2024 Database last updated on 14.06.2024 | |
| Former | The application has been published Status updated on 28.07.2023 | Most recent event Tooltip | 01.03.2024 | The date on which the examining division becomes responsible, has been established | 01.03.2024 | Request for examination filed | published on 03.04.2024 [2024/14] | 01.03.2024 | Change - designated states | published on 03.04.2024 [2024/14] | Applicant(s) | For all designated states ASML Netherlands B.V. P.O. Box 324 5500 AH Veldhoven / NL | [2023/35] | Inventor(s) | 01 /
ANUNCIADO, Roy 5500 AH Veldhoven / NL | 02 /
JOCHEMSEN, Marinus 5500 AH Veldhoven / NL | 03 /
MASLOW, Mark, John 5500 AH Veldhoven / NL | 04 /
SLACHTER, Abraham 5500 AH Veldhoven / NL | 05 /
STAALS, Frank 5500 AH Veldhoven / NL | 06 /
TEL, Wim, Tjibbo 5500 AH Veldhoven / NL | 07 /
VAN GORP, Simon, Hendrik, Celine 5500 AH Veldhoven / NL | 08 /
VAN INGEN SCHENAU, Koenraad 5500 AH Veldhoven / NL | 09 /
WARNAAR, Patrick 5500 AH Veldhoven / NL | [2023/35] | Representative(s) | ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL | [2023/35] | Application number, filing date | 23171216.7 | 22.08.2018 | [2023/35] | Priority number, date | EP20170193430 | 27.09.2017 Original published format: EP 17193430 | EP20170200255 | 07.11.2017 Original published format: EP 17200255 | EP20180155070 | 05.02.2018 Original published format: EP 18155070 | [2023/35] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP4235305 | Date: | 30.08.2023 | Language: | EN | [2023/35] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 27.07.2023 | Classification | IPC: | G03F7/20 | [2023/35] | CPC: |
G03F7/70525 (EP,CN,KR);
G03F7/70625 (EP,CN,KR,US);
G03F7/70558 (EP,CN,KR);
G03F7/70633 (EP,CN,KR);
G06F30/20 (US);
G06T7/0004 (CN,US);
H01L22/20 (CN,US);
G03F1/00 (US);
G06F2119/18 (US);
G06F30/33 (US);
G06F30/398 (US);
G21K5/00 (US);
H01L21/00 (US)
(-)
| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2024/14] |
| Former [2023/35] | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR | Title | German: | VERFAHREN IN DEM HERSTELLUNGSVERFAHREN EINER VORRICHTUNG, COMPUTERLESBARES MEDIUM UND ZUR DURCHFÜHRUNG DES VERFAHRENS KONFIGURIERTES SYSTEM | [2023/35] | English: | A METHOD IN THE MANUFACTURING PROCESS OF A DEVICE, A NON-TRANSITORY COMPUTER-READABLE MEDIUM AND A SYSTEM CONFIGURED TO PERFORM THE METHOD | [2023/35] | French: | PROCÉDÉ DANS LE PROCESSUS DE FABRICATION D'UN DISPOSITIF, SUPPORT LISIBLE PAR ORDINATEUR NON TRANSITOIRE ET SYSTÈME CONFIGURÉ POUR EXÉCUTER LE PROCÉDÉ | [2023/35] | Examination procedure | 23.02.2024 | Amendment by applicant (claims and/or description) | 23.02.2024 | Examination requested [2024/14] | 23.02.2024 | Date on which the examining division has become responsible | Parent application(s) Tooltip | EP18759092.2 / EP3688529 | Fees paid | Renewal fee | 03.05.2023 | Renewal fee patent year 03 | 03.05.2023 | Renewal fee patent year 04 | 03.05.2023 | Renewal fee patent year 05 | 29.09.2023 | Renewal fee patent year 06 | Penalty fee | Additional fee for renewal fee | 31.08.2023 | 06 M06 Fee paid on 29.09.2023 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]US2009039263 (MATSUOKA RYOICHI [JP], et al) [A] 1-15 * paragraphs [0033] - [0036]; figures 1,2 *; | [A] - GUO MORAN ET AL, "Efficient source mask optimization method for reduction of computational lithography cycles and enhancement of process-window predictability", JOURNAL OF MICRO/NANOLITHOGRAPHY, MEMS, AND MOEMS, SPIE - INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, US, vol. 14, no. 4, doi:10.1117/1.JMM.14.4.043507, ISSN 1932-5150, (20151001), page 43507, (20151123), XP060072343 [A] 1-15 * section 2.1 * DOI: http://dx.doi.org/10.1117/1.JMM.14.4.043507 | [A] - HALDER SANDIP ET AL, "Design-based metrology: beyond CD/EPE metrics to evaluate printability performance", PROCEEDINGS OPTICAL DIAGNOSTICS OF LIVING CELLS II, SPIE, US, (20160324), vol. 9778, doi:10.1117/12.2221894, ISSN 0277-786X, ISBN 978-1-5106-1324-9, pages 97780W - 97780W, XP060065271 [A] 1-15 * pages 6-11; figures 9, 10, 16, 18 * DOI: http://dx.doi.org/10.1117/12.2221894 | [A] - SHINODA SHINICHI ET AL, "Focus measurement using SEM image analysis of circuit pattern", PROCEEDINGS OPTICAL DIAGNOSTICS OF LIVING CELLS II, SPIE, US, (20160324), vol. 9778, doi:10.1117/12.2229089, ISSN 0277-786X, ISBN 978-1-5106-1324-9, pages 97783K - 97783K, XP060065357 [A] 1-15 * sections 3.2 and 4;; figure 5 * DOI: http://dx.doi.org/10.1117/12.2229089 | by applicant | US5229872 | US5296891 | US5523193 | US5969441 | US6046792 | US2005076322 | US2009157360 | US7587704 | US2010315614 | US2011230999 | US2013179847 | - "Full-Chip Lithography Simulation and Design Analysis - How OPC Is Changing IC Design", C. Spence, Proc. SPIE, (20050000), vol. 5751, pages 1 - 14 | - Y. CAO et al., "Optimized Hardware and Software For Fast, Full Chip Simulation", Proc. SPIE, (20050000), vol. 5754, page 405 | - ROSENBLUTH et al., "Optimum Mask and Source Patterns to Print a Given Shape", Journal of Microlithography, Microfabrication, Microsystems, (20020000), vol. 1, no. 1, pages 13 - 20 | - GRANIK, "Source Optimization for Image Fidelity and Throughput", Journal of Microlithography, Microfabrication, Microsystems, (20040000), vol. 3, no. 4, doi:10.1117/1.1794708, pages 509 - 522, XP055147052 DOI: http://dx.doi.org/10.1117/1.1794708 | - SOCHA, Proc. SPIE, (20050000), vol. 5853, page 180 | - JORGE NOCEDALSTEPHEN J. WRIGHT, Numerical Optimization, Cambridge University Press |