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Extract from the Register of European Patents

EP About this file: EP4300591

EP4300591 - SIGE:GAB SOURCE OR DRAIN STRUCTURES WITH LOW RESISTIVITY [Right-click to bookmark this link]
StatusRequest for examination was made
Status updated on  05.07.2024
Database last updated on 11.09.2024
FormerThe application has been published
Status updated on  01.12.2023
Most recent event   Tooltip05.07.2024The date on which the examining division becomes responsible, has been established 
05.07.2024Request for examination filedpublished on 07.08.2024  [2024/32]
05.07.2024Change - designated statespublished on 07.08.2024  [2024/32]
Applicant(s)For all designated states
INTEL Corporation
2200 Mission College Blvd.
Santa Clara, CA 95054 / US
[2024/01]
Inventor(s)01 / NANDI, Debaleena
Hillsboro, 97124 / US
02 / ZIGONEANU, Imola
Portland, 97229 / US
03 / DEWEY, Gilbert
Beaverton, 97006 / US
04 / JAHAGIRDAR, Anant H.
Portland, 97229 / US
05 / KENNEL, Harold W.
Portland, 97223 / US
06 / PATEL, Pratik
Portland, 97229 / US
07 / MURTHY, Anand
Portland, 97229 / US
08 / CHOI, Chi-Hing
Portland, 97229 / US
09 / KOBRINSKY, Mauro J.
Portland, 97229 / US
10 / GHANI, Tahir
Portland, 97229 / US
 [2024/01]
Representative(s)2SPL Patentanwälte PartG mbB
Landaubogen 3
81373 München / DE
[2024/01]
Application number, filing date23173199.312.05.2023
[2024/01]
Priority number, dateUS20221785078227.06.2022         Original published format: US202217850782
[2024/01]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP4300591
Date:03.01.2024
Language:EN
[2024/01]
Search report(s)(Supplementary) European search report - dispatched on:EP17.11.2023
ClassificationIPC:H01L29/78, H01L29/08, H01L29/66
[2024/01]
CPC:
H01L29/785 (EP); H01L27/0886 (US); H01L21/26513 (EP);
H01L21/268 (EP); H01L21/28518 (EP); H01L29/0847 (EP,US);
H01L29/161 (EP,US); H01L29/165 (EP); H01L29/167 (EP,US);
H01L29/41791 (US); H01L29/45 (EP); H01L29/66795 (EP,US);
H01L29/7848 (EP); H01L29/7851 (US); H01L29/665 (EP);
H01L29/66545 (EP) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   ME,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2024/32]
Former [2024/01]AL,  AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  ME,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  RS,  SE,  SI,  SK,  SM,  TR 
Extension statesBANot yet paid
Validation statesKHNot yet paid
MANot yet paid
MDNot yet paid
TNNot yet paid
TitleGerman:SIGE:GAB-QUELLEN- ODER -DRAIN-STRUKTUREN MIT NIEDRIGEM WIDERSTAND[2024/01]
English:SIGE:GAB SOURCE OR DRAIN STRUCTURES WITH LOW RESISTIVITY[2024/01]
French:STRUCTURES SOURCE OU DRAIN SIGE:GAB A FAIBLE RESISTIVITE[2024/01]
Examination procedure01.07.2024Amendment by applicant (claims and/or description)
03.07.2024Examination requested  [2024/32]
03.07.2024Date on which the examining division has become responsible
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Documents cited:Search[I]US2017352762  (YANG CHENG-YU [TW], et al) [I] 1-15 * paragraph [0043] * * paragraph [0045] * * paragraph [0047] - paragraph [0048] * * paragraph [0065] *;
 [I]US2018261597  (ADUSUMILLI PRANEET [US], et al) [I] 1-15 * paragraph [0025] * * paragraph [0020] * * paragraph [0036] - paragraph [0037] * * paragraph [0047] - paragraph [0051] * * paragraph [0057] * * paragraph [0032] *;
 [I]US2019097051  (TSAI CHUN-HSIUNG [TW], et al) [I] 1-15 * paragraph [0050] * * paragraph [0055] * * paragraph [0063] - paragraph [0064] *;
 [I]US2019157269  (KOH SHAO-MING [TW], et al) [I] 1-15 * paragraph [0036] * * paragraph [0038]; figure 16A *;
 [I]US2019165124  (MORE SHAHAJI B [TW], et al) [I] 1-15 * paragraph [0027] * * paragraph [0029] - paragraph [0030] * * paragraph [0037] *;
 [A]US2019221565  (GLUSCHENKOV OLEG [US], et al) [A] 1-15* paragraph [0028] *;
 [A]US2020312959  (BOMBERGER CORY [US], et al) [A] 9 * paragraph [0047] * * paragraph [0050] - paragraph [0051] *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.