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Extract from the Register of European Patents

EP About this file: EP4245894

EP4245894 - METHOD FOR GROWING A NITROGEN DOPED SINGLE CRYSTAL SILICON INGOT USING CONTINUOUS CZOCHRALSKI METHOD AND A SINGLE CRYSTAL SILICON INGOT GROWN BY THIS METHOD [Right-click to bookmark this link]
StatusRequest for examination was made
Status updated on  18.08.2023
Database last updated on 09.09.2024
Most recent event   Tooltip28.08.2024New entry: Renewal fee paid 
Applicant(s)For all designated states
GlobalWafers Co., Ltd.
No. 8 Industrial East Road 2
Science-Based Industrial Park
Hsinchu / TW
[2023/38]
Inventor(s)01 / HUDSON, Carissima Marie
St. Peters, Missouri 63376 / US
02 / RYU, Jae-Woo
St. Peters, Missouri 63376 / US
 [2023/38]
Representative(s)Maiwald GmbH
Elisenhof
Elisenstraße 3
80335 München / DE
[2023/38]
Application number, filing date23190873.204.08.2020
[2023/38]
Priority number, dateUS20191656994913.09.2019         Original published format: US201916569949
US20191657001013.09.2019         Original published format: US201916570010
[2023/38]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP4245894
Date:20.09.2023
Language:EN
[2023/38]
Type: A3 Search report 
No.:EP4245894
Date:14.02.2024
Language:EN
[2024/07]
Search report(s)(Supplementary) European search report - dispatched on:EP16.01.2024
ClassificationIPC:C30B15/00, C30B15/04, C30B15/20, C30B15/22, C30B29/06
[2023/44]
CPC:
C30B29/06 (EP,CN,KR); C30B15/002 (EP,CN,KR); C30B15/04 (EP,CN,KR);
C30B15/203 (EP,CN,KR); C30B15/22 (EP,CN,KR)
Former IPC [2023/38]C30B29/06
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2023/38]
TitleGerman:VERFAHREN ZUM ZÜCHTEN EINES STICKSTOFFDOTIERTEN SILIZIUMEINKRISTALLBLOCKS MITTELS DES KONTINUIERLICHEN CZOCHRALSKI-VERFAHRENS[2023/38]
English:METHOD FOR GROWING A NITROGEN DOPED SINGLE CRYSTAL SILICON INGOT USING CONTINUOUS CZOCHRALSKI METHOD AND A SINGLE CRYSTAL SILICON INGOT GROWN BY THIS METHOD[2023/38]
French:PROCÉDÉ DE CROISSANCE D'UN LINGOT DE SILICIUM MONOCRISTALLIN DOPÉ À L'AZOTE UTILISANT UN PROCÉDÉ DE CZOCHRALSKI CONTINU[2023/38]
Examination procedure10.08.2023Examination requested  [2023/38]
09.08.2024Amendment by applicant (claims and/or description)
09.08.2024Date on which the examining division has become responsible
Parent application(s)   TooltipEP20760995.9  / EP4028583
Fees paidRenewal fee
10.08.2023Renewal fee patent year 03
10.08.2023Renewal fee patent year 04
27.08.2024Renewal fee patent year 05
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[I]US2007157870  (HOURAI MASATAKA [JP], et al);
 [A]EP1887110  (SUMCO CORP [JP]);
 [A]WO2009025336  (SUMCO CORP [JP], et al)
by applicantUS5919302
 US6254672
 US6287380
 US6312516
 US6328795
 US2003196587
 US8673248
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.