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Extract from the Register of European Patents

EP About this file: EP4299320

EP4299320 - CLEANING PROCEDURE FOR ANILOX BY OVERLAYING LASER SPOTS [Right-click to bookmark this link]
StatusThe patent has been granted
Status updated on  08.08.2024
Database last updated on 14.09.2024
FormerGrant of patent is intended
Status updated on  03.07.2024
FormerRequest for examination was made
Status updated on  07.06.2024
FormerThe application has been published
Status updated on  01.12.2023
Most recent event   Tooltip08.08.2024(Expected) grantpublished on 11.09.2024  [2024/37]
Applicant(s)For all designated states
TEG TECHNOLOGIES RESEARCH AND DEVELOPMENT, S.L.
Riu Güell, 34
17180 Vilablareix / ES
[2024/01]
Inventor(s)01 / Guixeras Nogué, Lluis
17180 Vilablareix / ES
02 / Guixeras Llora, Rafael
17180 Liablareix / ES
 [2024/01]
Representative(s)Torras Toll, Jorge, et al
Marqués de Campo Sagrado 8 Ático 2
08015 Barcelona / ES
[2024/01]
Application number, filing date23382505.830.05.2023
[2024/01]
Priority number, dateES2022003055622.06.2022         Original published format: ES 202230556
[2024/01]
Filing languageES
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP4299320
Date:03.01.2024
Language:EN
[2024/01]
Type: A3 Search report 
No.:EP4299320
Date:14.02.2024
Language:EN
[2024/07]
Type: B1 Patent specification 
No.:EP4299320
Date:11.09.2024
Language:EN
[2024/37]
Search report(s)(Supplementary) European search report - dispatched on:EP17.01.2024
ClassificationIPC:B41F35/04
[2024/01]
CPC:
B41F35/04 (EP,ES); B08B7/0042 (EP,US); B23K26/0622 (US);
B23K26/073 (US); B23K26/0884 (US); B23K26/352 (US);
B41F13/193 (EP,ES); H01S3/10 (ES); B41F35/001 (EP) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   ME,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2024/28]
Former [2024/01]AL,  AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  ME,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  RS,  SE,  SI,  SK,  SM,  TR 
TitleGerman:REINIGUNGSVERFAHREN FÜR ANILOX DURCH ÜBERLAGERUNG VON LASERPUNKTEN[2024/01]
English:CLEANING PROCEDURE FOR ANILOX BY OVERLAYING LASER SPOTS[2024/01]
French:PROCÉDURE DE NETTOYAGE DE L'ANILOX PAR SUPERPOSITION DE SPOTS LASER[2024/01]
Examination procedure04.04.2024Amendment by applicant (claims and/or description)
04.06.2024Examination requested  [2024/28]
04.06.2024Date on which the examining division has become responsible
04.07.2024Communication of intention to grant the patent
31.07.2024Fee for grant paid
31.07.2024Fee for publishing/printing paid
31.07.2024Receipt of the translation of the claim(s)
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[XA]FR2760403  (LASERALP IND [FR]);
 [XA]JP2011062650  (HITACHI HIGH TECH CORP);
 [XA]CN112676267  (INST SEMICONDUCTORS CAS)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.