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EP0046154
European procedure
Extract from the Register of European Patents
EP About this file: EP0046154
| EP0046154 - Apparatus for coating substrates by high-rate cathodic sputtering, as well as sputtering cathode for such apparatus [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 03.10.1985 Database last updated on 31.03.2026 | Most recent event Tooltip | 03.10.1985 | No opposition filed within time limit | published on 04.12.1985 [1985/49] | Applicant(s) | For all designated states BATTELLE DEVELOPMENT CORPORATION 505 King Avenue Columbus Ohio 43201 / US | [N/P] |
| Former [1982/08] | For all designated states BATTELLE DEVELOPMENT CORPORATION 505 King Avenue Columbus Ohio 43201 / US | Inventor(s) | 01 /
Zega, Bogdan 67, rue de Lyon CH-1203 Geneva / CH | [1982/08] | Representative(s) | Dousse, Blasco, et al 73, Avenue de Mategin 1217 Meyrin-Genève / CH | [N/P] |
| Former [1984/48] | Dousse, Blasco, et al 7, route de Drize CH-1227 Carouge/Genève / CH | ||
| Former [1982/08] | Dousse, Blasco 7, route de Drize CH-1227 Carouge/Genève / CH | Application number, filing date | 80200752.6 | 08.08.1980 | [1982/08] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP0046154 | Date: | 24.02.1982 | Language: | EN | [1982/08] | Type: | B1 Patent specification | No.: | EP0046154 | Date: | 28.11.1984 | Language: | EN | [1984/48] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 03.04.1981 | Classification | IPC: | C23C15/00, H01J37/34 | [1982/08] | CPC: |
H01J37/3479 (EP,US);
C23C14/3407 (EP,US);
H01J37/34 (EP,US)
| Designated contracting states | AT, BE, CH, DE, FR, GB, IT, LI, LU, NL, SE [1982/08] | Title | German: | Vorrichtung zur Beschichtung von Substraten mittels Hochleistungskathodenzerstäubung sowie Zerstäuberkathode für diese Vorrichtung | [1982/08] | English: | Apparatus for coating substrates by high-rate cathodic sputtering, as well as sputtering cathode for such apparatus | [1982/08] | French: | Appareil pour le revêtement de substrats par pulvérisation cathodique à grande vitesse, ainsi que cathode de pulvérisation pour un tel appareil | [1982/08] | Examination procedure | 16.06.1982 | Examination requested [1982/34] | 19.07.1983 | Despatch of a communication from the examining division (Time limit: M04) | 12.10.1983 | Reply to a communication from the examining division | 12.01.1984 | Despatch of communication of intention to grant (Approval: ) | 17.04.1984 | Communication of intention to grant the patent | 04.07.1984 | Fee for grant paid | 04.07.1984 | Fee for publishing/printing paid | Opposition(s) | 29.08.1985 | No opposition filed within time limit [1985/49] | Fees paid | Renewal fee | 24.08.1982 | Renewal fee patent year 03 | 16.08.1983 | Renewal fee patent year 04 | 18.08.1984 | Renewal fee patent year 05 |
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