-
EP0036061
European procedure
Extract from the Register of European Patents
EP About this file: EP0036061
| EP0036061 - Process and tubular reactor for vapour-phase deposition and for plasma etching [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 10.06.1985 Database last updated on 03.09.2024 | Most recent event Tooltip | 10.06.1985 | No opposition filed within time limit | published on 14.08.1985 [1985/33] | Applicant(s) | For all designated states VEB Zentrum für Forschung und Technologie Mikroelektronik Karl-Marx-Strasse DDR-8080 Dresden / DE | [N/P] |
| Former [1981/38] | For all designated states VEB Zentrum für Forschung und Technologie Mikroelektronik Karl-Marx-Strasse DDR-8080 Dresden / DD | Inventor(s) | 01 /
Möller, Rainer, Dr.-Ing. Stephanstrasse 55 DDR-8023 Dresden / DD | 02 /
Voigt, Reinhard, Dipl.-Phys. Gerh.-Hauptmann-Strasse 18 DDR-8102 Langebrück / DD | 03 /
Kleinert, Michael, Dipl.-Chem. Dörnichtweg 37 DDR-8080 Dresden / DD | [1981/38] | Representative(s) | de Bruijn, Leendert C., et al Nederlandsch Octrooibureau P.O. Box 29720 2502 LS Den Haag / NL | [N/P] |
| Former [1981/38] | de Bruijn, Leendert C., et al Nederlandsch Octrooibureau P.O. Box 29720 NL-2502 LS Den Haag / NL | Application number, filing date | 81100007.4 | 02.01.1981 | [1981/38] | Priority number, date | DD19550002189 | 08.02.1980 Original published format: DD 218955 | [1981/38] | Filing language | DE | Procedural language | DE | Publication | Type: | A1 Application with search report | No.: | EP0036061 | Date: | 23.09.1981 | Language: | DE | [1981/38] | Type: | B1 Patent specification | No.: | EP0036061 | Date: | 18.07.1984 | Language: | DE | [1984/29] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 03.07.1981 | Classification | IPC: | C23C11/00, C23F1/00, C23C15/00 | [1981/38] | CPC: |
H01L21/67069 (EP);
C23C16/505 (EP);
H01J37/32532 (EP);
H01J37/32623 (EP)
| Designated contracting states | AT, DE, GB, NL [1981/38] | Title | German: | Verfahren und Rohrreaktor zur Dampfphasenabscheidung und zum Plasmaätzen | [1981/38] | English: | Process and tubular reactor for vapour-phase deposition and for plasma etching | [1981/38] | French: | Procédé et réacteur tubulaire pour le dépôt à partir de la phase vapeur ainsi que pour le décapage par un plasma | [1981/38] | File destroyed: | 06.04.1993 | Examination procedure | 15.01.1982 | Examination requested [1982/14] | 29.12.1982 | Despatch of a communication from the examining division (Time limit: M04) | 08.04.1983 | Reply to a communication from the examining division | 04.10.1983 | Despatch of communication of intention to grant (Approval: ) | 22.12.1983 | Communication of intention to grant the patent | 22.03.1984 | Fee for grant paid | 22.03.1984 | Fee for publishing/printing paid | Opposition(s) | 19.04.1985 | No opposition filed within time limit [1985/33] | Fees paid | Renewal fee | 05.01.1983 | Renewal fee patent year 03 | 19.01.1984 | Renewal fee patent year 04 |
| Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | DE2738891 [ ] (SIEMENS AG) | Examination | DE2536871 | FR2408913 | WO7900776 | DE2810554 | DE2951453 | WO8100420 |