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Extract from the Register of European Patents

EP About this file: EP0055161

EP0055161 - Multilayer metal silicide interconnections for integrated circuits [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  07.07.1986
Database last updated on 28.06.2024
Most recent event   Tooltip07.03.1997Lapse of the patent in a contracting statepublished on 23.04.1997 [1997/17]
Applicant(s)For all designated states
FAIRCHILD CAMERA & INSTRUMENT CORPORATION
464 Ellis Street Mountain View
California 94042 / US
[N/P]
Former [1982/26]For all designated states
FAIRCHILD CAMERA & INSTRUMENT CORPORATION
464 Ellis Street
Mountain View California 94042 / US
Inventor(s)01 / Lehrer, William I.
1161 Seena Avenue
Los Altos California 94022 / US
[1982/26]
Representative(s)Chareyron, Lucien, et al
Service Brevets Patent Department Etudes et Productions Schlumberger BP 202
92142 Clamart Cédex / FR
[N/P]
Former [1985/04]Chareyron, Lucien, et al
Service Brevets Patent Department Etudes et Productions Schlumberger BP 202
F-92142 Clamart Cédex / FR
Former [1982/26]Chareyron, Lucien
Schlumberger Limited Service Brevets c/o Giers 12, place des Etats Unis B.P. 121
F-92124 Montrouge Cédex / FR
Application number, filing date81401940.207.12.1981
[1982/26]
Priority number, dateUS1980021461509.12.1980         Original published format: US 214615
[1982/26]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0055161
Date:30.06.1982
Language:EN
[1982/26]
Type: B1 Patent specification 
No.:EP0055161
Date:04.09.1985
Language:EN
[1985/36]
Search report(s)(Supplementary) European search report - dispatched on:EP19.05.1982
ClassificationIPC:H01L21/90, H01L23/52
[1982/26]
CPC:
H01L21/76838 (EP,US); H01L21/76889 (EP,US); H01L23/5226 (EP,US);
H01L23/53257 (EP,US); H01L2924/0002 (EP,US)
C-Set:
H01L2924/0002, H01L2924/00 (EP,US)
Designated contracting statesCH,   DE,   FR,   GB,   IT,   LI,   NL [1982/26]
TitleGerman:Mehrschichtige Metallsilizid-Verbindungsleiter für integrierte Schaltungen[1982/26]
English:Multilayer metal silicide interconnections for integrated circuits[1982/26]
French:Interconnexions multicouches à siliciure métallique pour circuits intégrés[1982/26]
Examination procedure09.12.1982Examination requested  [1983/08]
05.01.1984Despatch of a communication from the examining division (Time limit: M06)
22.06.1984Reply to a communication from the examining division
08.11.1984Despatch of communication of intention to grant (Approval: )
05.02.1985Communication of intention to grant the patent
22.04.1985Fee for grant paid
22.04.1985Fee for publishing/printing paid
Opposition(s)05.06.1986No opposition filed within time limit [1986/35]
Fees paidRenewal fee
21.11.1983Renewal fee patent year 03
22.11.1984Renewal fee patent year 04
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Documents cited:Search[Y]FR2445625  (WESTERN ELECTRIC CO [US]);
 [Y]US4152823  (HALL JOHN H)
 [A]  - IBM Technical Disclosure Bulletin, Vol. 22, No. 12, May 1980, New York, US B.L. CROWDER et al.: "Improved Conductivity Polysilicon Lines for MOSFET and Bipolar Technology" pages 5466-5467
ExaminationEP0002165
 EP0017697
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.