Extract from the Register of European Patents

EP About this file: EP0087573

EP0087573 - Method of making complementary field effect transistors [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  14.02.1990
Database last updated on 09.04.2026
Most recent event   Tooltip07.03.1997Lapse of the patent in a contracting statepublished on 23.04.1997 [1997/17]
Applicant(s)For all designated states
International Business Machines Corporation
New Orchard Road
Armonk, NY 10504 / US
[N/P]
Former [1983/36]For all designated states
International Business Machines Corporation
Old Orchard Road
Armonk, N.Y. 10504 / US
Inventor(s)01 / Dash, Somanath
4 Twin Brook Court
South Burlington, VT 05452 / US
02 / Garnache, Richard Raymond
1400 Spear Street
South Burlington, VT 05452 / US
03 / Troutman, Ronald Roy
7 Rustic Drive
Essex Junction, VT 05452 / US
[1983/36]
Representative(s)Gaugel, Heinz
Schönaicher Strasse 220
D-7030 Böblingen / DE
[N/P]
Former [1983/36]Gaugel, Heinz, Dipl.-Ing.
Schönaicher Strasse 220
D-7030 Böblingen / DE
Application number, filing date83100523.621.01.1983
[1983/36]
Priority number, dateUS1982035299026.02.1982         Original published format: US 352990
[1983/36]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0087573
Date:07.09.1983
Language:EN
[1983/36]
Type: A3 Search report 
No.:EP0087573
Date:17.09.1986
Language:EN
[1986/38]
Type: B1 Patent specification 
No.:EP0087573
Date:12.04.1989
Language:EN
[1989/15]
Search report(s)(Supplementary) European search report - dispatched on:EP30.07.1986
ClassificationIPC:H01L21/82
[1983/36]
CPC:
H10D84/0177 (EP,US); H10D84/038 (EP,US); H10D30/6739 (EP,US);
H10D64/668 (EP,US); H10D86/00 (EP,US)
Designated contracting statesDE,   FR,   GB [1983/36]
TitleGerman:Verfahren zum Herstellen komplementärer Feldeffekttransistoren[1983/36]
English:Method of making complementary field effect transistors[1983/36]
French:Procédé de fabrication des transistors à effet de champ complémentaires[1983/36]
Examination procedure15.12.1983Examination requested  [1984/08]
07.03.1988Despatch of a communication from the examining division (Time limit: M04)
07.05.1988Reply to a communication from the examining division
15.07.1988Despatch of communication of intention to grant (Approval: Yes)
30.09.1988Communication of intention to grant the patent
10.10.1988Fee for grant paid
10.10.1988Fee for publishing/printing paid
Opposition(s)13.01.1990No opposition filed within time limit [1990/14]
Fees paidRenewal fee
29.01.1985Renewal fee patent year 03
24.01.1986Renewal fee patent year 04
16.01.1987Renewal fee patent year 05
26.01.1988Renewal fee patent year 06
27.01.1989Renewal fee patent year 07
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Documents cited:Search[X] JP52070779  
 [X]   PATENTS ABSTRACTS OF JAPAN, vol. 1, no. 135, 9th November 1977, page 6295 E 77; & JP-A-52 070 779 (FUJITSU K.K.) 06-13-1977 [X]
 [A]   IBM TECHNICAL DISCLOSURE BULLETIN, vol. 23, no. 12, May 1981, pages 5283-5286, New York, US; S. DASH et al.: "CMOS field-effect transistors with P channel devices using silicides" [A]
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