Deutsch English Français

Contact

EP0087151

European procedure

Quick help

Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability

2022.02.11

More...

News flashes

News Flashes

New version of the European Patent Register – SPC proceedings information in the Unitary Patent Register.

2024-07-24

More...

Extract from the Register of European Patents

EP About this file: EP0087151

EP0087151 - Process for producing layers of refractory metals or metallic compounds by chemical vapour deposition [Right-click to bookmark this link]
Status	The application is deemed to be withdrawn Status updated on 06.09.1985 Database last updated on 14.09.2024
Most recent event Tooltip	07.07.2007	Change - inventor	published on 08.08.2007 [2007/32]
Applicant(s)	For all designated states SIEMENS AKTIENGESELLSCHAFT Werner-von-Siemens-Str. 1 DE-80333 München / DE
	[N/P]
Former [1983/35]	For all designated states SIEMENS AKTIENGESELLSCHAFT Wittelsbacherplatz 2 D-80333 München / DE
Inventor(s)	01 / Wieczorek, Claudia, Ing. grad. Ostpreussenstrasse 2 D-8012 Ottobrunn / DE
	[1983/35]
Application number, filing date	83101649.8	21.02.1983
	[1983/35]
Priority number, date	DE19823206421	23.02.1982 Original published format: DE 3206421
	[1983/35]
Filing language	DE
Procedural language	DE
Publication	Type:	A2 Application without search report
	No.:	EP0087151
	Date:	31.08.1983
	Language:	DE
	[1983/35]
	Type:	A3 Search report
	No.:	EP0087151
	Date:	25.07.1984
	Language:	DE
	[1984/30]
Search report(s)	(Supplementary) European search report - dispatched on:	EP	21.05.1984
Classification	IPC:	C23C11/00	[1983/35]
	CPC:	C23C16/507 (EP); H05K3/146 (EP)
Designated contracting states	AT, CH, FR, GB, LI, NL [1983/35]
Title	German:	Verfahren zum Herstellen von Schichten aus hochschmelzenden Metallen bzw. Metallverbindungen durch Abscheidung aus der Dampfphase	[1983/35]
	English:	Process for producing layers of refractory metals or metallic compounds by chemical vapour deposition	[1983/35]
	French:	Procédé de production de couches de métaux réfractaires ou de composés métalliques par dépot chimique à partir de la phase vapeur	[1983/35]
File destroyed:	13.07.1991
Examination procedure	26.03.1985	Application deemed to be withdrawn, date of legal effect [1985/45]
	28.05.1985	Despatch of communication that the application is deemed to be withdrawn, reason: examination fee not paid in time [1985/45]
Fees paid	Penalty fee
	Penalty fee Rule 85b EPC 1973
	26.02.1985	M02 Not yet paid
	Additional fee for renewal fee
	28.02.1985	03 M06 Not yet paid
Opt-out from the exclusive Tooltip competence of the Unified Patent Court	See the Register of the Unified Patent Court for opt-out data
	Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:	Search	[A]DE2312774 ;
		[A]US3329601 ;
		[A]EP0036780 ;
		[A]EP0032788 ;
		[A]US3668095 ;
		[P]JPS5773175 ;
		[A]JPS5521515
		[P] - PATENTS ABSTRACTS OF JAPAN, Band 6, Nr. 154(C-119)(1032)14. August 1982 & JP - A - 57 73175 (KOBE SEIKOSHO K.K.) 07.05.1982
		[A] - PATENTS ABSTRACTS OF JAPAN, Band 4, Nr. 50(C-7)(532), 1980Seite 36C7 & JP - A - 55 21515 (OUYOU KAGAKU KENKYUSHO) 15.02.1980
		[A] - JAPANESE JOURNAL OF APPLIED PHYSICS, Band 19, Suppl. 19-2, 1980, Seiten 49-53, TokyoJP.

The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.

Legal notice
Terms of use
24.2.25; 35p