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EP0107004
European procedure
Extract from the Register of European Patents
EP About this file: EP0107004
| EP0107004 - Mask for corpuscular lithography, method for its manufacture and of using it [Right-click to bookmark this link] | |||
| Former [1984/18] | Mask for electron lithography using the tunneling effect, method for its manufacture and of using it | ||
| [1987/06] | Status | No opposition filed within time limit Status updated on 11.12.1987 Database last updated on 24.08.2024 | Most recent event Tooltip | 11.12.1987 | No opposition filed within time limit | published on 27.01.1988 [1988/04] | Applicant(s) | For all designated states SIEMENS AKTIENGESELLSCHAFT Werner-von-Siemens-Str. 1 DE-80333 München / DE | [N/P] |
| Former [1984/18] | For all designated states SIEMENS AKTIENGESELLSCHAFT Wittelsbacherplatz 2 D-80333 München / DE | Inventor(s) | 01 /
Lischke, Burkhard, Prof. Dr. In der Heuluss 13 D-8000 München 82 / DE | [1984/18] | Application number, filing date | 83109000.6 | 12.09.1983 | [1984/18] | Priority number, date | DE19823235064 | 22.09.1982 Original published format: DE 3235064 | [1984/18] | Filing language | DE | Procedural language | DE | Publication | Type: | A1 Application with search report | No.: | EP0107004 | Date: | 02.05.1984 | Language: | DE | [1984/18] | Type: | B1 Patent specification | No.: | EP0107004 | Date: | 04.02.1987 | Language: | DE | [1987/06] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 16.01.1984 | Classification | IPC: | G03F7/02 | [1984/18] | CPC: |
B82Y10/00 (EP,US);
H01J1/312 (EP,US);
B82Y40/00 (EP,US);
H01J37/073 (EP,US);
H01J37/3175 (EP,US);
H01J2237/31783 (EP,US);
Y10S430/143 (EP,US)
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| Designated contracting states | DE, FR, GB, NL [1984/18] | Title | German: | Maske für die Korpuskularlithografie, Verfahren zu ihrer Herstellung und Verfahren zu ihrem Betrieb | [1987/06] | English: | Mask for corpuscular lithography, method for its manufacture and of using it | [1987/06] | French: | Masque pour la litographie corpusculaire, procédé pour sa fabrication et son utilisation | [1987/06] |
| Former [1984/18] | Tunnelkathodenmaske für die Elektronenlithogrofie, Verfahren zu ihrer Herstellung und Verfahren zu ihrem Betrieb | ||
| Former [1984/18] | Mask for electron lithography using the tunneling effect, method for its manufacture and of using it | ||
| Former [1984/18] | Masque utilisant l'effet tunnel pour la litographie électronique, procédé pour sa fabrication et son utilisation | File destroyed: | 18.07.1996 | Examination procedure | 24.05.1984 | Examination requested [1984/31] | 19.09.1985 | Despatch of a communication from the examining division (Time limit: M04) | 20.01.1986 | Reply to a communication from the examining division | 11.04.1986 | Despatch of communication of intention to grant (Approval: ) | 29.07.1986 | Communication of intention to grant the patent | 06.08.1986 | Fee for grant paid | 06.08.1986 | Fee for publishing/printing paid | Opposition(s) | 05.11.1987 | No opposition filed within time limit [1988/04] | Fees paid | Renewal fee | 25.09.1985 | Renewal fee patent year 03 | 23.09.1986 | Renewal fee patent year 04 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]US3056073 (MEAD CARVER A); | [A]US3356864 (IVAR GIAEVER); | [A]US3445733 (ESAKI LEO, et al) | [AD] - ELECTRONICS, November 1981, New York R. WARD "Electron-beam projector suits up for submicrometer race" | [AD] - VACUUM, Band 31, Nr. 7, 1981, Oxford R. HRACH "Modelling of electron emission from sandwich cathodes" |