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EP0108299

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Extract from the Register of European Patents

EP About this file: EP0108299

EP0108299 - Excitation system for the generation of a fast, pulsed, high tension discharge, in particular for a high performance laser [Right-click to bookmark this link]
Status	No opposition filed within time limit Status updated on 24.01.1990 Database last updated on 11.04.2026
Most recent event Tooltip	24.01.1990	No opposition filed within time limit	published on 14.03.1990 [1990/11]
Applicant(s)	For all designated states SIEMENS AKTIENGESELLSCHAFT Werner-von-Siemens-Str. 1 DE-80333 München / DE
	[N/P]
Former [1989/35]	For all designated states SIEMENS AKTIENGESELLSCHAFT Wittelsbacherplatz 2 D-80333 München / DE
Former [1987/40]	For all designated states Siemens Aktiengesellschaft Paul-Gossen-Strasse 100 D-91052 Erlangen / DE
Former [1984/20]	For all designated states KRAFTWERK UNION AKTIENGESELLSCHAFT Wiesenstrasse 35 D-4330 Mülheim (Ruhr) / DE
Inventor(s)	01 / Cirkel, Hans-Jürgen, Dr. Anderlohrstrasse 9 D-8520 Erlangen / DE
	02 / Bette, Willi Pappelgasse 7c D-8520 Erlangen / DE
	[1984/20]
Representative(s)	(deleted)
	[1987/40]
Former [1984/20]	Mehl, Ernst, Dipl.-Ing., et al Postfach 22 13 17 D-80503 München / DE
Application number, filing date	83110383.3	18.10.1983
	[1984/20]
Priority number, date	DE19823240372	02.11.1982 Original published format: DE 3240372
	[1984/20]
Filing language	DE
Procedural language	DE
Publication	Type:	A2 Application without search report
	No.:	EP0108299
	Date:	16.05.1984
	Language:	DE
	[1984/20]
	Type:	A3 Search report
	No.:	EP0108299
	Date:	01.04.1987
	Language:	DE
	[1987/14]
	Type:	B1 Patent specification
	No.:	EP0108299
	Date:	29.03.1989
	Language:	DE
	[1989/13]
Search report(s)	(Supplementary) European search report - dispatched on:	EP	10.02.1987
Classification	IPC:	H01S3/097	[1984/20]
	CPC:	H01S3/0971 (EP,US); H01S3/0973 (EP,US); H03K3/53 (EP,US)
Designated contracting states	AT, CH, DE, FR, GB, IT, LI [1984/20]
Title	German:	Anregungssystem zur Erzeugung einer schnellen, gepulsten Hochspannungsentladung, insbesondere zur Anregung eines Hochleistungslasers	[1984/20]
	English:	Excitation system for the generation of a fast, pulsed, high tension discharge, in particular for a high performance laser	[1984/20]
	French:	Système d'excitation pour créer une décharge impulsionnelle rapide à haute tension en particulier pour exciter un laser à haute performance	[1984/20]
Examination procedure	17.12.1984	Examination requested [1985/10]
	29.06.1988	Despatch of communication of intention to grant (Approval: Yes)
	26.09.1988	Communication of intention to grant the patent
	10.10.1988	Fee for grant paid
	10.10.1988	Fee for publishing/printing paid
Opposition(s)	30.12.1989	No opposition filed within time limit [1990/11]
Fees paid	Renewal fee
	24.10.1985	Renewal fee patent year 03
	27.10.1986	Renewal fee patent year 04
	27.10.1987	Renewal fee patent year 05
	26.10.1988	Renewal fee patent year 06
Opt-out from the exclusive Tooltip competence of the Unified Patent Court	See the Register of the Unified Patent Court for opt-out data
	Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:	Search	[Y] IEEE JOURNAL OF QUANTUM ELECTRONICS, Band QE-17, Nr. 1, Januar 1981, Seiten 81-91, IEEE, New York, US; R.C. SZE et al.: "Operating characteristics of a high repetition rate miniature rare-gas halide laser" [Y]

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