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EP0114229
European procedure
Extract from the Register of European Patents
EP About this file: EP0114229
| EP0114229 - Method of forming a lift-off mask with improved oxygen barrier layer [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 16.04.1994 Database last updated on 26.07.2024 | Most recent event Tooltip | 05.10.2005 | Change: Appeal number | Applicant(s) | For all designated states International Business Machines Corporation New Orchard Road Armonk, NY 10504 / US | [N/P] |
| Former [1984/31] | For all designated states International Business Machines Corporation Old Orchard Road Armonk, N.Y. 10504 / US | Inventor(s) | 01 /
Sachdev, Harbans Singh 14 Englewood Drive Wappingers Falls New York 12590 / US | 02 /
Sachdev, Krishna Gandhi 14 Englewood Drive Wappingers Falls New York 12590 / US | [1984/31] | Representative(s) | Mönig, Anton, et al IBM Deutschland Informationssysteme GmbH, Patentwesen und Urheberrecht 70548 Stuttgart / DE | [N/P] |
| Former [1993/22] | Mönig, Anton, Dipl.-Ing., et al IBM Deutschland Informationssysteme GmbH, Patentwesen und Urheberrecht D-70548 Stuttgart / DE | ||
| Former [1989/15] | Kreidler, Eva-Maria, Dr. rer. nat. Schönaicher Strasse 220 D-7030 Böblingen / DE | ||
| Former [1984/31] | Kreidler, Eva-Maria, Dr. rer. nat. Schönaicher Strasse 220 D-7030 Böblingen / DE | Application number, filing date | 83111411.1 | 15.11.1983 | [1984/31] | Priority number, date | US19820452549 | 23.12.1982 Original published format: US 452549 | [1984/31] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0114229 | Date: | 01.08.1984 | Language: | EN | [1984/31] | Type: | A3 Search report | No.: | EP0114229 | Date: | 06.08.1986 | Language: | EN | [1986/32] | Type: | B1 Patent specification | No.: | EP0114229 | Date: | 16.06.1993 | Language: | EN | [1993/24] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 17.06.1986 | Classification | IPC: | G03F7/00 | [1993/24] | CPC: |
G03F7/094 (EP,US)
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| Former IPC [1986/22] | G03F7/02 | ||
| Former IPC [1984/31] | G03F1/00 | Designated contracting states | DE, FR, GB [1984/31] | Title | German: | Verfahren zur Herstellung einer Abhebemaske mit Sauerstoffsperrschicht | [1984/31] | English: | Method of forming a lift-off mask with improved oxygen barrier layer | [1984/31] | French: | Procédé pour la fabrication d'un masque par décollage comportant une couche barrière contre l'oxygène | [1984/31] | File destroyed: | 15.01.2000 | Examination procedure | 29.10.1984 | Examination requested [1985/02] | 21.12.1987 | Despatch of a communication from the examining division (Time limit: M04) | 15.04.1988 | Reply to a communication from the examining division | 25.08.1988 | Despatch of a communication from the examining division (Time limit: M08) | 22.03.1989 | Reply to a communication from the examining division | 31.07.1989 | Despatch of communication that the application is refused, reason: substantive examination {1} | 19.10.1992 | Despatch of communication of intention to grant (Approval: Yes) | 20.11.1992 | Communication of intention to grant the patent | 21.01.1993 | Fee for grant paid | 21.01.1993 | Fee for publishing/printing paid | Appeal following examination | 27.09.1989 | Appeal received No. T0787/90 | 27.11.1989 | Statement of grounds filed | 17.02.1992 | Invitation to file observations in an appeal (Time limit: M02) [1992/08] | 06.04.1992 | Date of receipt of observations in an appeal [1992/15] | 20.07.1992 | Invitation to file observations in an appeal (Time limit: M02) [1992/30] | 19.10.1992 | Result of appeal procedure: remittal for grant | Opposition(s) | 17.03.1994 | No opposition filed within time limit [1994/23] | Fees paid | Renewal fee | 26.11.1985 | Renewal fee patent year 03 | 25.11.1986 | Renewal fee patent year 04 | 24.11.1987 | Renewal fee patent year 05 | 26.11.1988 | Renewal fee patent year 06 | 17.11.1989 | Renewal fee patent year 07 | 13.11.1990 | Renewal fee patent year 08 | 12.11.1991 | Renewal fee patent year 09 | 19.11.1992 | Renewal fee patent year 10 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | DE | 16.06.1993 | GB | 15.11.1993 | [1994/49] |
| Former [1994/22] | DE | 16.06.1993 | Documents cited: | Search | [Y]US3310424 (WEHNER GOTTFRIED K, et al); | [Y]US3822928 (SMOLINSKY G, et al) | [Y] - PROCEEDINGS ON THE INTERNATIONAL ELECTRON DEVICES MEETING, San Francisco, California, US, 13th - 15th December 1982, pages 395-398, IEEE, New York, US; S. MATSUI et al.: "New tri-level structures for submicron photolithography" | [A] - IBM TECHNICAL DISCLOSURE BULLETIN, vol. 24, no. 11A, April 1982, pages 5538-5539, New York, US; L.V. GREGOR et al.: "Multilayer resist structure for ultraviolet patterning" | Examination | US3598710 |