blank Quick help
blank Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability

2022.02.11

More...
blank News flashes

News Flashes

New version of the European Patent Register – SPC proceedings information in the Unitary Patent Register.

2024-07-24

More...
blank Related links

Extract from the Register of European Patents

EP About this file: EP0144115

EP0144115 - An ellipsometer [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  22.11.1990
Database last updated on 19.10.2024
Most recent event   Tooltip06.11.2009Change - representativepublished on 09.12.2009  [2009/50]
Applicant(s)For all designated states
TOHOKU UNIVERSITY
1-1, Katahira 2-chome
Sendai City, Miyagi Prefecture / JP
[N/P]
Former [1985/24]For all designated states
TOHOKU UNIVERSITY
1-1, Katahira 2-chome
Sendai City Miyagi Prefecture / JP
Inventor(s)01 / Yamamoto, Masaki
3-9-42, Maruyama 1-chome
Tagajyo City Miyagi Pref. / JP
[1985/24]
Representative(s)Senior, Alan Murray, et al
J A Kemp
14 South Square
Gray's Inn
London WC1R 5JJ / GB
[N/P]
Former [2009/50]Senior, Alan Murray, et al
J.A. Kemp & Co. 14 South Square Gray's Inn
London WC1R 5JJ / GB
Former [1985/24]Senior, Alan Murray, et al
J.A. KEMP & CO., 14 South Square, Gray's Inn
London WC1R 5LX / GB
Application number, filing date84303871.207.06.1984
[1985/24]
Priority number, dateJP1983022986407.12.1983         Original published format: JP 22986483
[1985/24]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0144115
Date:12.06.1985
Language:EN
[1985/24]
Type: A3 Search report 
No.:EP0144115
Date:07.05.1986
Language:EN
[1986/19]
Type: B1 Patent specification 
No.:EP0144115
Date:31.01.1990
Language:EN
[1990/05]
Search report(s)(Supplementary) European search report - dispatched on:EP19.03.1986
ClassificationIPC:G01N21/21, G01B11/06
[1985/24]
CPC:
G01N21/211 (EP)
Designated contracting statesDE,   FR,   GB [1985/24]
TitleGerman:Ellipsometer[1985/31]
English:An ellipsometer[1985/24]
French:Ellipsomètre[1985/31]
Examination procedure19.07.1986Examination requested  [1986/38]
12.01.1988Despatch of a communication from the examining division (Time limit: M06)
22.07.1988Reply to a communication from the examining division
05.10.1988Despatch of communication of intention to grant (Approval: No)
24.02.1989Despatch of a communication from the examining division (Time limit: M04)
28.06.1989Reply to a communication from the examining division
12.07.1989Despatch of communication of intention to grant (Approval: later approval)
01.08.1989Communication of intention to grant the patent
31.10.1989Fee for grant paid
31.10.1989Fee for publishing/printing paid
Opposition(s)01.11.1990No opposition filed within time limit [1991/02]
Fees paidRenewal fee
11.06.1986Renewal fee patent year 03
25.06.1987Renewal fee patent year 04
24.06.1988Renewal fee patent year 05
26.06.1989Renewal fee patent year 06
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court
See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[X]  - REVIEW OF SCIENTIFIC INSTRUMENTS, vol. 53, no. 7, July 1982, pages 969-977, New York, US; B. DREVILLON et al.: "Fast polarization modulated ellipsometer using a microprocessor system for digital fourier analysis"
 [Y]  - APPLIED OPTICS, vol. 18, no. 22, November 1979, pages 3851-3856, New York, US; B. VIDAL et al.: "Wideband optical monitoring of nonquarterwave multilayer filters"
 [Y]  - MICROELECTRONICS JOURNAL, vol. 9, no. 3, January-February 1979, pages 27-30, Luton, GB; D. DAVIES et al.: "Ellipsometry - a versatile and non-destructive testing technique"
 [A]  - IBM TECHNICAL DISCLOSURE BULLETIN, vol. 21, no. 2, July 1978, pages 855-856, New York, US; E.P. HARRIS et al.: "Signal level regulation and dark current compensation for wavelength-scanning ellipsometer"
 [A]  - SOLID STATE TECHNOLOGY, vol. 21, no. 2, February 1978, pages 43-47, New York, US; R.J. KUTKO: "Ellipsometry for semiconductor process control"
    [ ] - REVUE DE PHYSIQUE APPLIQUEE, vol. 18, no. 11, November 1983, pages 709-717, Orsay, FR; C. ALIBERT et al.: "Electroréflexion et ellipsométrie spectroscopique d'hétérostructures In GaAsP/InP et GaA1As/GaAs"
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.