EP0144115 - An ellipsometer [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 22.11.1990 Database last updated on 19.10.2024 | Most recent event Tooltip | 06.11.2009 | Change - representative | published on 09.12.2009 [2009/50] | Applicant(s) | For all designated states TOHOKU UNIVERSITY 1-1, Katahira 2-chome Sendai City, Miyagi Prefecture / JP | [N/P] |
Former [1985/24] | For all designated states TOHOKU UNIVERSITY 1-1, Katahira 2-chome Sendai City Miyagi Prefecture / JP | Inventor(s) | 01 /
Yamamoto, Masaki 3-9-42, Maruyama 1-chome Tagajyo City Miyagi Pref. / JP | [1985/24] | Representative(s) | Senior, Alan Murray, et al J A Kemp 14 South Square Gray's Inn London WC1R 5JJ / GB | [N/P] |
Former [2009/50] | Senior, Alan Murray, et al J.A. Kemp & Co. 14 South Square Gray's Inn London WC1R 5JJ / GB | ||
Former [1985/24] | Senior, Alan Murray, et al J.A. KEMP & CO., 14 South Square, Gray's Inn London WC1R 5LX / GB | Application number, filing date | 84303871.2 | 07.06.1984 | [1985/24] | Priority number, date | JP19830229864 | 07.12.1983 Original published format: JP 22986483 | [1985/24] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0144115 | Date: | 12.06.1985 | Language: | EN | [1985/24] | Type: | A3 Search report | No.: | EP0144115 | Date: | 07.05.1986 | Language: | EN | [1986/19] | Type: | B1 Patent specification | No.: | EP0144115 | Date: | 31.01.1990 | Language: | EN | [1990/05] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 19.03.1986 | Classification | IPC: | G01N21/21, G01B11/06 | [1985/24] | CPC: |
G01N21/211 (EP)
| Designated contracting states | DE, FR, GB [1985/24] | Title | German: | Ellipsometer | [1985/31] | English: | An ellipsometer | [1985/24] | French: | Ellipsomètre | [1985/31] | Examination procedure | 19.07.1986 | Examination requested [1986/38] | 12.01.1988 | Despatch of a communication from the examining division (Time limit: M06) | 22.07.1988 | Reply to a communication from the examining division | 05.10.1988 | Despatch of communication of intention to grant (Approval: No) | 24.02.1989 | Despatch of a communication from the examining division (Time limit: M04) | 28.06.1989 | Reply to a communication from the examining division | 12.07.1989 | Despatch of communication of intention to grant (Approval: later approval) | 01.08.1989 | Communication of intention to grant the patent | 31.10.1989 | Fee for grant paid | 31.10.1989 | Fee for publishing/printing paid | Opposition(s) | 01.11.1990 | No opposition filed within time limit [1991/02] | Fees paid | Renewal fee | 11.06.1986 | Renewal fee patent year 03 | 25.06.1987 | Renewal fee patent year 04 | 24.06.1988 | Renewal fee patent year 05 | 26.06.1989 | Renewal fee patent year 06 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X] - REVIEW OF SCIENTIFIC INSTRUMENTS, vol. 53, no. 7, July 1982, pages 969-977, New York, US; B. DREVILLON et al.: "Fast polarization modulated ellipsometer using a microprocessor system for digital fourier analysis" | [Y] - APPLIED OPTICS, vol. 18, no. 22, November 1979, pages 3851-3856, New York, US; B. VIDAL et al.: "Wideband optical monitoring of nonquarterwave multilayer filters" | [Y] - MICROELECTRONICS JOURNAL, vol. 9, no. 3, January-February 1979, pages 27-30, Luton, GB; D. DAVIES et al.: "Ellipsometry - a versatile and non-destructive testing technique" | [A] - IBM TECHNICAL DISCLOSURE BULLETIN, vol. 21, no. 2, July 1978, pages 855-856, New York, US; E.P. HARRIS et al.: "Signal level regulation and dark current compensation for wavelength-scanning ellipsometer" | [A] - SOLID STATE TECHNOLOGY, vol. 21, no. 2, February 1978, pages 43-47, New York, US; R.J. KUTKO: "Ellipsometry for semiconductor process control" | [ ] - REVUE DE PHYSIQUE APPLIQUEE, vol. 18, no. 11, November 1983, pages 709-717, Orsay, FR; C. ALIBERT et al.: "Electroréflexion et ellipsométrie spectroscopique d'hétérostructures In GaAsP/InP et GaA1As/GaAs" |