EP0119162 - Photopolymerisable composition, material coated therewith, and process for obtaining relief images [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 18.01.1989 Database last updated on 19.10.2024 | Most recent event Tooltip | 18.01.1989 | No opposition filed within time limit | published on 08.03.1989 [1989/10] | Applicant(s) | For all designated states CIBA-GEIGY AG Klybeckstrasse 141 4002 Basel / CH | [N/P] |
Former [1984/38] | For all designated states CIBA-GEIGY AG Klybeckstrasse 141 CH-4002 Basel / CH | Inventor(s) | 01 /
Riediker, Martin, Dr. Gstaltenrainweg 75 CH-4125 Riehen / CH | 02 /
Rohde, Ottmar, Dr. Bärenfelserstrasse 34 CH-4057 Basel / CH | 03 /
Roth, Martin, Dr. Oberdorf CH-1711 Giffers / CH | 04 /
Bühler, Niklaus, Dr. Route du Pâquier 8 CH-1723 Marly / CH | [1984/38] | Application number, filing date | 84810070.7 | 06.02.1984 | [1984/38] | Priority number, date | CH19830000785 | 11.02.1983 Original published format: CH 78583 | [1984/38] | Filing language | DE | Procedural language | DE | Publication | Type: | A2 Application without search report | No.: | EP0119162 | Date: | 19.09.1984 | Language: | DE | [1984/38] | Type: | A3 Search report | No.: | EP0119162 | Date: | 18.09.1985 | Language: | DE | [1985/38] | Type: | B1 Patent specification | No.: | EP0119162 | Date: | 23.03.1988 | Language: | DE | [1988/12] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 17.07.1985 | Classification | IPC: | G03C1/68, G03F7/10 | [1984/38] | CPC: |
G03F7/037 (EP,US);
G03F7/029 (EP,US);
G03F7/0387 (EP,US);
Y10S430/117 (EP,US);
Y10S430/126 (EP,US);
Y10S430/148 (EP,US)
| Designated contracting states | BE, CH, DE, FR, GB, IT, LI, NL, SE [1984/38] | Title | German: | Photopolymerisierbare Zusammensetzung, damit beschichtetes Material und Verfahren zur Herstellung von Reliefabbildungen | [1984/38] | English: | Photopolymerisable composition, material coated therewith, and process for obtaining relief images | [1984/38] | French: | Composition photopolymérisable, matériel revêtu avec cette composition et procédé pour la préparation d'images en relief | [1984/38] | Examination procedure | 08.02.1984 | Examination requested [1984/38] | 27.11.1986 | Despatch of a communication from the examining division (Time limit: M04) | 12.03.1987 | Reply to a communication from the examining division | 16.06.1987 | Despatch of communication of intention to grant (Approval: ) | 22.09.1987 | Communication of intention to grant the patent | 07.11.1987 | Fee for grant paid | 07.11.1987 | Fee for publishing/printing paid | Opposition(s) | 24.12.1988 | No opposition filed within time limit [1989/10] | Fees paid | Renewal fee | 07.01.1986 | Renewal fee patent year 03 | 22.12.1986 | Renewal fee patent year 04 | 16.12.1987 | Renewal fee patent year 05 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [AD]US4329419 (GOFF DAVID L, et al) | [A] - JOURNAL OF POLYMER SCIENCE: POLYMER CHEMISTRY EDITION, Band 10, 1972, Seiten 2833-2840, John Wiley & Sons, Inc., New York, US; KYOJI KAERIYAMA u.a.: "Photopolymerization with the use of titanocene dichoride as sensitizer" |