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Extract from the Register of European Patents

EP About this file: EP0164737

EP0164737 - A method of fabricating self-aligned regions in a substrate [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  23.07.1992
Database last updated on 13.09.2024
Most recent event   Tooltip23.07.1992No opposition filed within time limitpublished on 09.09.1992 [1992/37]
Applicant(s)For all designated states
HARRIS CORPORATION
P.O. Box 37
Melbourne, FL 32919 / US
[1985/51]
Inventor(s)01 / Gasner, John T.
634 Ford Circle West
Melbourne Florida 32935 / US
02 / Hause, Frederick N.
3769 Jupiter Boulevard, S.E.
Palm Bay Florida 32905 / US
[1985/51]
Representative(s)Dauster, Hanjörg
Patentanwälte Ruff, Wilhelm, Beier, Dauster & Partner Postfach 10 40 36
70035 Stuttgart / DE
[N/P]
Former [1986/46]Dauster, Hanjörg, Dipl.-Ing.
WILHELM & DAUSTER Patentanwälte Hospitalstrasse 8
D-70174 Stuttgart / DE
Former [1985/51]Dauster, Hanjörg, Dipl.-Ing.
Wilhelm & Dauster Patentanwälte Hospitalstrasse 8
D-7000 Stuttgart 1 / DE
Application number, filing date85107216.512.06.1985
[1985/51]
Priority number, dateUS1984062083515.06.1984         Original published format: US 620835
US1984064336222.08.1984         Original published format: US 643362
[1985/51]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0164737
Date:18.12.1985
Language:EN
[1985/51]
Type: A3 Search report 
No.:EP0164737
Date:13.05.1987
Language:EN
[1987/20]
Type: B1 Patent specification 
No.:EP0164737
Date:18.09.1991
Language:EN
[1991/38]
Search report(s)(Supplementary) European search report - dispatched on:EP24.03.1987
ClassificationIPC:H01L21/31, H01L21/82, H01L21/28, H01L29/08
[1985/51]
CPC:
H01L21/033 (EP); H01L21/823892 (EP); H01L27/0928 (EP)
Designated contracting statesDE,   FR,   GB,   IT,   NL [1985/51]
TitleGerman:Verfahren zum Herstellen selbstjustierter Bereiche in einem Substrat[1985/51]
English:A method of fabricating self-aligned regions in a substrate[1985/51]
French:Procédé de fabrication de régions auto-alignées dans un substrat[1985/51]
Examination procedure01.09.1987Examination requested  [1987/45]
10.07.1989Despatch of a communication from the examining division (Time limit: M04)
07.11.1989Reply to a communication from the examining division
22.12.1989Despatch of a communication from the examining division (Time limit: M03)
27.03.1990Reply to a communication from the examining division
15.05.1990Despatch of a communication from the examining division (Time limit: M04)
07.09.1990Reply to a communication from the examining division
06.11.1990Despatch of communication of intention to grant (Approval: No)
08.03.1991Despatch of communication of intention to grant (Approval: later approval)
25.03.1991Communication of intention to grant the patent
06.06.1991Fee for grant paid
06.06.1991Fee for publishing/printing paid
Opposition(s)20.06.1992No opposition filed within time limit [1992/37]
Fees paidRenewal fee
24.06.1987Renewal fee patent year 03
13.06.1988Renewal fee patent year 04
28.06.1989Renewal fee patent year 05
28.05.1990Renewal fee patent year 06
27.05.1991Renewal fee patent year 07
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Documents cited:Search[A]EP0074215  ;
 [A]US4435896  (PARRILLO LOUIS C [US], et al);
 [A]EP0054259
 [A]  - IBM TECHNICAL DISCLOSURE BULLETIN, vol. 25, no. 6, page 2730, November 1982, New York, US; J. GRESCHNER et al.: "Process for image reversal"
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.