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Extract from the Register of European Patents

EP About this file: EP0172525

EP0172525 - Process for reducing side lighting during the exposure of reproduction layers [Right-click to bookmark this link]
StatusThe application has been withdrawn
Status updated on  26.07.1991
Database last updated on 14.09.2024
Most recent event   Tooltip07.07.2007Change - inventorpublished on 08.08.2007  [2007/32]
Applicant(s)For all designated states
HOECHST AKTIENGESELLSCHAFT
65926 Frankfurt am Main / DE
[N/P]
Former [1986/09]For all designated states
HOECHST AKTIENGESELLSCHAFT
D-65926 Frankfurt am Main / DE
Inventor(s)01 / Frass, Werner, Dr. Dipl.-Chem.
Erbsenacker 37
D-6200 Wiesbaden-Naurod / DE
02 / Pliefke, Engelbert, Dr. Dipl.-Chem.
Fritz-Kalle-Strasse 34
D-6200 Wiesbaden / DE
[1986/09]
Application number, filing date85110174.114.08.1985
[1986/09]
Priority number, dateDE1984343071221.08.1984         Original published format: DE 3430712
[1986/09]
Filing languageDE
Procedural languageDE
PublicationType: A2 Application without search report 
No.:EP0172525
Date:26.02.1986
Language:DE
[1986/09]
Type: A3 Search report 
No.:EP0172525
Date:07.10.1987
Language:DE
[1987/41]
Search report(s)(Supplementary) European search report - dispatched on:EP20.08.1987
ClassificationIPC:G03F1/00, G03F7/02
[1986/09]
CPC:
G03F7/092 (EP,US); Y10S430/151 (EP,US)
Designated contracting statesDE,   GB [1990/35]
Former [1986/09]DE,  FR,  GB,  NL 
TitleGerman:Verfahren zur Reduzierung von Unterstrahlungen bei der Bestrahlung von Reproduktionsschichten[1986/09]
English:Process for reducing side lighting during the exposure of reproduction layers[1986/09]
French:Procédé pour réduire la diffusion latérale au cours de l'exposition des couches de reproduction[1986/09]
File destroyed:02.03.1998
Examination procedure27.01.1988Examination requested  [1988/13]
16.01.1991Despatch of a communication from the examining division (Time limit: M06)
17.07.1991Application withdrawn by applicant  [1991/38]
Fees paidRenewal fee
14.07.1987Renewal fee patent year 03
15.07.1988Renewal fee patent year 04
11.07.1989Renewal fee patent year 05
12.07.1990Renewal fee patent year 06
21.12.1990Renewal fee patent year 07
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[X]JP57165848  ;
 [X]US3203805  (MARION BURG);
 [X]FR2090380  (OCE VAN DER GRINTEN NV);
 [X]EP0068599  (NIPPON PAINT CO LTD [JP]);
 [A]US4199649  (YUNDT ALBERT P [US])
 [X]  - J. ELECTROCHEM. SOC.: SOLID-STATE SCIENCE AND TECHNOLOGY, Band 124, Nr. 10, Oktober 1977, Seiten 1608-1612, Washington, US; D.L. FLOWERS: "Lubrication in photolithography"
 [X]  - J. ELECTROCHEM. SOC.: SOLID-STATE SCIENCE AND TECHNOLOGY, Band 127, Nr. 7, Juli 1980, Seiten 1579-1582, Washington, US; D.L. FLOWERS et al.: ""Lubrication and pattern improvement in photolithography"
 [X]  - IBM TECHNICAL DISCLOSURE BULLETIN, Band 13, Nr. 4, September 1970, Seite 893, New York, US; R.O. LUSSOW et al.: "Protective coatings for photomask"
 [X]  - IBM TECHNICAL DISCLOSURE BULLETIN, Band 12, Nr. 11, April 1970, Seite 1765, New York, US; C.B. HUMPHREYS: "Photographic plates"
 [X]  - PATENT ABSTRACTS OF JAPAN, Band 7, Nr. 6 (P-167)[1157] 11. Januar 1983; & JP-A-57 165 848 (CANON K.K.) 13-10-1982, & JP57165848 A 00000000
 [A]  - IBM TECHNICAL DISCLOSURE BULLETIN, Band 18, Nr. 10, März 1976, Seite 3379, New York, US; J.T. GIBNEY et al.: "Release agent method for artwork glass"
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.