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Extract from the Register of European Patents

EP About this file: EP0175933

EP0175933 - Scanning lens system without deflection defects for corpuscular beam treatment of material [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  10.07.1990
Database last updated on 15.06.2024
Most recent event   Tooltip07.07.2007Change - inventorpublished on 08.08.2007  [2007/32]
Applicant(s)For all designated states
SIEMENS AKTIENGESELLSCHAFT
Werner-von-Siemens-Str. 1
DE-80333 München / DE
[N/P]
Former [1986/14]For all designated states
SIEMENS AKTIENGESELLSCHAFT
Wittelsbacherplatz 2
D-80333 München / DE
Inventor(s)01 / Plies, Erich, Dr. Dipl.Phys.
Deisenhofenerstrasse 79 c
D-8000 München 90 / DE
02 / Kuck, Gerd, Dr. Dipl.-Phys.
Alfred-Schmidt-Strasse 37/IV
D-8000 München 70 / DE
[1986/14]
Application number, filing date85110602.123.08.1985
[1986/14]
Priority number, dateDE1984343477621.09.1984         Original published format: DE 3434776
[1986/14]
Filing languageDE
Procedural languageDE
PublicationType: A1 Application with search report 
No.:EP0175933
Date:02.04.1986
Language:DE
[1986/14]
Search report(s)(Supplementary) European search report - dispatched on:EP06.02.1986
ClassificationIPC:H01J37/153, H01J37/04, H01J37/30
[1986/14]
CPC:
H01J37/147 (EP,US); H01J37/153 (EP,US); H01J37/3007 (EP,US)
Designated contracting statesDE,   FR,   GB,   NL [1986/14]
TitleGerman:Rasterlinsen-System ohne Ablenkfarbfehler zur Materialbearbeitung mit Korpuskularstrahlen[1986/14]
English:Scanning lens system without deflection defects for corpuscular beam treatment of material[1986/14]
French:Système de lentilles à balayage sans défauts de déviation pour traitement de matériaux par faisceaux corpusculaires[1986/14]
File destroyed:13.06.1996
Examination procedure05.09.1985Examination requested  [1986/14]
17.03.1988Despatch of a communication from the examining division (Time limit: M06)
26.09.1988Reply to a communication from the examining division
02.01.1989Despatch of a communication from the examining division (Time limit: M02)
06.03.1989Reply to a communication from the examining division
26.04.1989Despatch of communication of intention to grant (Approval: Yes)
07.11.1989Communication of intention to grant the patent
20.02.1990Application deemed to be withdrawn, date of legal effect  [1990/35]
28.03.1990Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time  [1990/35]
Fees paidRenewal fee
26.08.1987Renewal fee patent year 03
30.08.1988Renewal fee patent year 04
Penalty fee
Additional fee for renewal fee
31.08.198905   M06   Not yet paid
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Documents cited:Search[A]JP56078051  ;
 [A]DD126382  ;
 [A]FR2415348  (ZEISS JENA VEB CARL [DD]);
 [A]DE2937004  (FRAUNHOFER GES FORSCHUNG);
 [YP]US4475044  (KURODA KATSUHIRO [JP], et al)
 [Y]  - PROCEEDINGS OF THE SYMPOSIUM ON ELECTRON AND ION BEAM SCIENCE AND TECHNOLOGY, 8th international conference, Band 78, Nr. 5, Seiten 32-43, Princeton, New Jersey, US; W. STICKEL et al.: "Optics of a variable shaped electron beam column"
 [A]  - PATENTS ABSTRACTS OF JAPAN, Band 5, Nr. 141 (E-73)[813], 5. September 1981; & JP-A-56 078051 (NIPPON DENSHI K.K.) 26.6.1981, & JP56078051 A 00000000
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.