-
EP0156683
European procedure
Extract from the Register of European Patents
EP About this file: EP0156683
| EP0156683 - Apparatus for optical micro-lithography with a local alignment system [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 30.08.1990 Database last updated on 17.08.2024 | Most recent event Tooltip | 30.08.1990 | No opposition filed within time limit | published on 17.10.1990 [1990/42] | Applicant(s) | For all designated states COMMISSARIAT A L'ENERGIE ATOMIQUE 31/33, rue de la Fédération 75015 Paris Cédex 15 / FR | [N/P] |
| Former [1988/02] | For all designated states COMMISSARIAT A L'ENERGIE ATOMIQUE 31/33, rue de la Fédération F-75015 Paris Cédex 15 / FR | ||
| Former [1985/40] | For all designated states COMMISSARIAT A L'ENERGIE ATOMIQUE Etablissement de Caractère Scientifique Technique et Industriel 31/33, rue de la Fédération F-75015 Paris / FR | Inventor(s) | 01 /
Picard, Bernard 8, rue Georges Bizet F-38400 Saint Martin d'Heres / FR | [1985/40] | Representative(s) | Mongrédien, André, et al c/o BREVATOME 25, rue de Ponthieu F-75008 Paris / FR | [1985/40] | Application number, filing date | 85400335.7 | 22.02.1985 | [1985/40] | Priority number, date | FR19840003027 | 28.02.1984 Original published format: FR 8403027 | [1985/40] | Filing language | FR | Procedural language | FR | Publication | Type: | A1 Application with search report | No.: | EP0156683 | Date: | 02.10.1985 | Language: | FR | [1985/40] | Type: | B1 Patent specification | No.: | EP0156683 | Date: | 08.11.1989 | Language: | FR | [1989/45] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 17.07.1985 | Classification | IPC: | G03B41/00 | [1985/40] | CPC: |
G03F9/70 (EP,US)
| Designated contracting states | CH, DE, GB, LI, NL [1985/40] | Title | German: | Gerät für optische Microlithografie mit lokalem Ausrichtungssystem | [1985/40] | English: | Apparatus for optical micro-lithography with a local alignment system | [1985/40] | French: | Appareil de microlithographie optique à système d'alignement local | [1985/40] | File destroyed: | 12.06.1999 | Examination procedure | 08.03.1986 | Examination requested [1986/19] | 09.03.1987 | Despatch of a communication from the examining division (Time limit: M06) | 26.08.1987 | Reply to a communication from the examining division | 21.04.1988 | Despatch of a communication from the examining division (Time limit: M04) | 25.08.1988 | Reply to a communication from the examining division | 18.01.1989 | Despatch of communication of intention to grant (Approval: Yes) | 03.05.1989 | Communication of intention to grant the patent | 06.07.1989 | Fee for grant paid | 06.07.1989 | Fee for publishing/printing paid | Opposition(s) | 09.08.1990 | No opposition filed within time limit [1990/42] | Fees paid | Renewal fee | 18.02.1987 | Renewal fee patent year 03 | 12.02.1988 | Renewal fee patent year 04 | 23.02.1989 | Renewal fee patent year 05 |
| Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]DE1597431 (TELEFUNKEN PATENT); | [A]FR2082213 (DELMAS JEAN RAYMOND); | [Y]FR2128822 (ASAHI OPTICAL CO LTD); | [A]US3718396 (HENNINGS K); | [Y]US3844655 (JOHANNSMEIER K) | Examination | - Bauelemente der Optik, H. Naumann/G. Schröder, pp. 186,187 |