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Extract from the Register of European Patents

EP About this file: EP0196087

EP0196087 - Schottky-gate field effect transistor and method for its production [Right-click to bookmark this link]
StatusThe application has been refused
Status updated on  05.04.1991
Database last updated on 14.09.2024
Most recent event   Tooltip19.06.2009Change - representativepublished on 22.07.2009  [2009/30]
Applicant(s)For all designated states
SUMITOMO ELECTRIC INDUSTRIES LIMITED
No. 15, Kitahama 5-chome, Higashi-ku Osaka-shi
Osaka 541 / JP
[N/P]
Former [1986/40]For all designated states
SUMITOMO ELECTRIC INDUSTRIES LIMITED
No. 15, Kitahama 5-chome, Higashi-ku
Osaka-shi, Osaka 541 / JP
Inventor(s)01 / Nakajima, Shigeru c/o Osaka Works
SUMITOMO ELECTRIC IND. Ltd. 1-3, Shimaya 1-chome
Konohana-ku Osaka / JP
02 / Ebata, Toshiki c/o Osaka Works
SUMITOMO ELECTRIC IND. Ltd. 1-3, Shimaya 1-chome
Konohana-ku Osaka / JP
[1986/40]
Representative(s)Barz, Peter, et al
Schmied-Kowarzik & Partner
Patentanwälte
Siegfriedstrasse 8
80803 München / DE
[N/P]
Former [2009/30]Barz, Peter, et al
Schmied-Kowarzik & Partner Patentanwälte Siegfriedstrasse 8
80803 München / DE
Former [1986/40]Barz, Peter, Dr., et al
Patentanwälte Dipl.-Ing. G. Dannenberg Dr. P. Weinhold, Dr. D. Gudel Dipl.-Ing. S. Schubert, Dr. P. Barz Siegfriedstrasse 8
D-80803 München / DE
Application number, filing date86104159.826.03.1986
[1986/40]
Priority number, dateJP1985006309626.03.1985         Original published format: JP 6309685
[1986/40]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0196087
Date:01.10.1986
Language:EN
[1986/40]
Type: A3 Search report 
No.:EP0196087
Date:17.12.1986
Language:EN
[1986/51]
Search report(s)(Supplementary) European search report - dispatched on:EP27.10.1986
ClassificationIPC:H01L29/80, H01L21/28
[1986/40]
CPC:
H01L29/66878 (EP,US); H01L21/28587 (EP,US); H01L29/42316 (EP,US)
Designated contracting statesDE,   FR,   GB,   NL [1986/40]
TitleGerman:Feldeffekttransistor mit einem Schottky-Gate und Verfahren zu seiner Herstellung[1986/40]
English:Schottky-gate field effect transistor and method for its production[1986/40]
French:Transistor à effet de champ à grille Schottky et sa méthode de fabrication[1986/40]
File destroyed:02.03.1998
Examination procedure22.01.1987Examination requested  [1987/13]
02.05.1989Despatch of a communication from the examining division (Time limit: M06)
13.11.1989Reply to a communication from the examining division
15.12.1989Despatch of a communication from the examining division (Time limit: M06)
11.06.1990Reply to a communication from the examining division
17.10.1990Date of oral proceedings
19.12.1990Despatch of communication that the application is refused, reason: substantive examination [1991/22]
19.12.1990Minutes of oral proceedings despatched
29.12.1990Application refused, date of legal effect [1991/22]
Fees paidRenewal fee
04.03.1988Renewal fee patent year 03
08.03.1989Renewal fee patent year 04
22.02.1990Renewal fee patent year 05
28.12.1990Renewal fee patent year 06
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Documents cited:Search[Y]JP57208128  ;
 [A]JP59193069  ;
 [Y]EP0057558  (FUJITSU LTD [JP]);
 [A]EP0027903  (IBM [US])
 [Y]  - PATENTS ABSTRACTS OF JAPAN, vol. 7, no. 62, (E-164)[1207], 15th March 1983; & JP - A - 57 208 128 (FUJITSU K.K.) 21-12-1982, & JP57208128 A 00000000
 [A]  - PATENTS ABSTRACTS OF JAPAN, vol. 9, no. 53 (E-301)[1776], 7th March 1985; & JP - A - 59 193 069 (NIPPON DENKI K.K.) 01-11-1984, & JP59193069 A 00000000
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.