EP0206016 - Apparatus and method for displaying hole-electron pair distributions induced by electron bombardment [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 13.07.1991 Database last updated on 17.05.2024 | Most recent event Tooltip | 23.11.2007 | Lapse of the patent in a contracting state | published on 26.12.2007 [2007/52] | Applicant(s) | For all designated states International Business Machines Corporation New Orchard Road Armonk, NY 10504 / US | [N/P] |
Former [1986/52] | For all designated states International Business Machines Corporation Old Orchard Road Armonk, N.Y. 10504 / US | Inventor(s) | 01 /
Wells, Oliver Craig 1324 Leland Drive Yorktown Heights N.Y. 10598 / US | [1990/37] |
Former [1986/52] | 01 /
Wells, Oliver Craig 1324 Leland Drive Yorktown Heights N:Y: 10598 / US | Representative(s) | Rudack, Günter Otto IBM Corporation Säumerstrasse 4 CH-8803 Rüschlikon / CH | [N/P] |
Former [1986/52] | Rudack, Günter O., Dipl.-Ing. IBM Corporation Säumerstrasse 4 CH-8803 Rüschlikon / CH | Application number, filing date | 86107543.0 | 03.06.1986 | [1986/52] | Priority number, date | US19850750624 | 28.06.1985 Original published format: US 750624 | [1986/52] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0206016 | Date: | 30.12.1986 | Language: | EN | [1986/52] | Type: | A3 Search report | No.: | EP0206016 | Date: | 20.07.1988 | Language: | EN | [1988/29] | Type: | B1 Patent specification | No.: | EP0206016 | Date: | 12.09.1990 | Language: | EN | [1990/37] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 02.06.1988 | Classification | IPC: | H01J37/28, G01R31/28 | [1986/52] | CPC: |
G01R31/2653 (EP,US);
G01R31/305 (EP,US);
H01J37/268 (EP,US);
Y10S977/852 (EP,US)
| Designated contracting states | DE, FR, GB, IT [1986/52] | Title | German: | Gerät und Verfahren zur Abbildung der durch Elektronenbeschuss induzierten Verteilung von Elektron-Loch-Paaren | [1986/52] | English: | Apparatus and method for displaying hole-electron pair distributions induced by electron bombardment | [1986/52] | French: | Appareil et méthode de mise en évidence de la distribution de paires électron-trou induites par bombardement électronique | [1986/52] | Examination procedure | 22.04.1987 | Examination requested [1987/26] | 11.10.1989 | Despatch of communication of intention to grant (Approval: Yes) | 10.01.1990 | Communication of intention to grant the patent | 15.01.1990 | Fee for grant paid | 15.01.1990 | Fee for publishing/printing paid | Opposition(s) | 13.06.1991 | No opposition filed within time limit [1991/36] | Fees paid | Renewal fee | 21.06.1988 | Renewal fee patent year 03 | 27.06.1989 | Renewal fee patent year 04 | 25.06.1990 | Renewal fee patent year 05 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | IT | 12.09.1990 | [2007/52] |
Former [1999/42] | IT | 12.09.1990 | Documents cited: | Search | [A]EP0027517 (IBM [US]); | [A]EP0122563 (SIEMENS AG [DE]) | [A] - JOURNAL OF VACUUM SCIENCE & TECHNOLOGY/B, vol. 3, no. 1, second series, January-February 1985, pages 198-200, American Vacuum Society, Woodbury, US; M.A.McCord et al.: "High resolution, low-voltage probes from a field emission source close to the target plane" | [A] - IBM TECHNICAL DISCLOSURE BULLETIN, vol. 24, no. 6, November 1981, pages 2855-2856, IBM Corp., Armonk, N.Y., US; W.A. THOMPSON; "Mechanical scanning microscope" |