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Extract from the Register of European Patents

EP About this file: EP0206016

EP0206016 - Apparatus and method for displaying hole-electron pair distributions induced by electron bombardment [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  13.07.1991
Database last updated on 17.05.2024
Most recent event   Tooltip23.11.2007Lapse of the patent in a contracting statepublished on 26.12.2007  [2007/52]
Applicant(s)For all designated states
International Business Machines Corporation
New Orchard Road
Armonk, NY 10504 / US
[N/P]
Former [1986/52]For all designated states
International Business Machines Corporation
Old Orchard Road
Armonk, N.Y. 10504 / US
Inventor(s)01 / Wells, Oliver Craig
1324 Leland Drive
Yorktown Heights N.Y. 10598 / US
[1990/37]
Former [1986/52]01 / Wells, Oliver Craig
1324 Leland Drive
Yorktown Heights N:Y: 10598 / US
Representative(s)Rudack, Günter Otto
IBM Corporation Säumerstrasse 4
CH-8803 Rüschlikon / CH
[N/P]
Former [1986/52]Rudack, Günter O., Dipl.-Ing.
IBM Corporation Säumerstrasse 4
CH-8803 Rüschlikon / CH
Application number, filing date86107543.003.06.1986
[1986/52]
Priority number, dateUS1985075062428.06.1985         Original published format: US 750624
[1986/52]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0206016
Date:30.12.1986
Language:EN
[1986/52]
Type: A3 Search report 
No.:EP0206016
Date:20.07.1988
Language:EN
[1988/29]
Type: B1 Patent specification 
No.:EP0206016
Date:12.09.1990
Language:EN
[1990/37]
Search report(s)(Supplementary) European search report - dispatched on:EP02.06.1988
ClassificationIPC:H01J37/28, G01R31/28
[1986/52]
CPC:
G01R31/2653 (EP,US); G01R31/305 (EP,US); H01J37/268 (EP,US);
Y10S977/852 (EP,US)
Designated contracting statesDE,   FR,   GB,   IT [1986/52]
TitleGerman:Gerät und Verfahren zur Abbildung der durch Elektronenbeschuss induzierten Verteilung von Elektron-Loch-Paaren[1986/52]
English:Apparatus and method for displaying hole-electron pair distributions induced by electron bombardment[1986/52]
French:Appareil et méthode de mise en évidence de la distribution de paires électron-trou induites par bombardement électronique[1986/52]
Examination procedure22.04.1987Examination requested  [1987/26]
11.10.1989Despatch of communication of intention to grant (Approval: Yes)
10.01.1990Communication of intention to grant the patent
15.01.1990Fee for grant paid
15.01.1990Fee for publishing/printing paid
Opposition(s)13.06.1991No opposition filed within time limit [1991/36]
Fees paidRenewal fee
21.06.1988Renewal fee patent year 03
27.06.1989Renewal fee patent year 04
25.06.1990Renewal fee patent year 05
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipIT12.09.1990
[2007/52]
Former [1999/42]IT12.09.1990
Documents cited:Search[A]EP0027517  (IBM [US]);
 [A]EP0122563  (SIEMENS AG [DE])
 [A]  - JOURNAL OF VACUUM SCIENCE & TECHNOLOGY/B, vol. 3, no. 1, second series, January-February 1985, pages 198-200, American Vacuum Society, Woodbury, US; M.A.McCord et al.: "High resolution, low-voltage probes from a field emission source close to the target plane"
 [A]  - IBM TECHNICAL DISCLOSURE BULLETIN, vol. 24, no. 6, November 1981, pages 2855-2856, IBM Corp., Armonk, N.Y., US; W.A. THOMPSON; "Mechanical scanning microscope"
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.