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Extract from the Register of European Patents

EP About this file: EP0220410

EP0220410 - A dynamic random access memory device having a single-crystal transistor on a trench capacitor structure and a fabrication method therefor [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  10.02.1994
Database last updated on 06.07.2024
Most recent event   Tooltip10.02.1994No opposition filed within time limitpublished on 30.03.1994 [1994/13]
Applicant(s)For all designated states
International Business Machines Corporation
New Orchard Road
Armonk, NY 10504 / US
[N/P]
Former [1987/19]For all designated states
International Business Machines Corporation
Old Orchard Road
Armonk, N.Y. 10504 / US
Inventor(s)01 / Lu, Nicky Chau-Chun
1424 Trout Brook Street
Yorktown Heights New York 10598 / US
[1987/19]
Representative(s)Burt, Roger James
IBM United Kingdom Limited Intellectual Property Department Hursley Park Winchester
Hampshire SO21 2JN / GB
[N/P]
Former [1993/39]Burt, Roger James, Dr.
IBM United Kingdom Limited Intellectual Property Department Hursley Park
Winchester Hampshire SO21 2JN / GB
Former [1992/07]Blakemore, Frederick Norman
IBM United Kingdom Limited Intellectual Property Department Hursley Park
Winchester Hampshire SO21 2JN / GB
Former [1987/19]Grant, Iain Murray
IBM United Kingdom Limited Intellectual Property Department Hursley Park
Winchester Hampshire SO21 2JN / GB
Application number, filing date86111645.722.08.1986
[1987/19]
Priority number, dateUS1985078967521.10.1985         Original published format: US 789675
[1987/19]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0220410
Date:06.05.1987
Language:EN
[1987/19]
Type: A3 Search report 
No.:EP0220410
Date:10.05.1989
Language:EN
[1989/19]
Type: B1 Patent specification 
No.:EP0220410
Date:07.04.1993
Language:EN
[1993/14]
Search report(s)(Supplementary) European search report - dispatched on:EP22.03.1989
ClassificationIPC:H01L27/10, H01L21/82
[1987/19]
CPC:
H01L21/743 (EP,US); H01L27/00 (KR); H10B12/038 (EP,US);
H01L21/8221 (EP,US); H10B12/373 (EP,US)
Designated contracting statesCH,   DE,   FR,   GB,   IT,   LI,   NL,   SE [1987/19]
TitleGerman:Dynamische Speichervorrichtung mit wahlfreiem Zugriff mit einem monokristallinen Transistor auf einer rillenartigen Kondensatorstruktur und Herstellungsverfahren dafür[1987/19]
English:A dynamic random access memory device having a single-crystal transistor on a trench capacitor structure and a fabrication method therefor[1987/19]
French:Dispositif de mémoire dynamique à accès aléatoire comprenant un transistor monocristallin sur une structure de condensateur à sillon et son procédé de fabrication[1987/19]
Examination procedure21.08.1987Examination requested  [1987/42]
28.11.1991Despatch of a communication from the examining division (Time limit: M04)
19.02.1992Reply to a communication from the examining division
10.07.1992Despatch of communication of intention to grant (Approval: Yes)
07.10.1992Communication of intention to grant the patent
17.10.1992Fee for grant paid
17.10.1992Fee for publishing/printing paid
Opposition(s)08.01.1994No opposition filed within time limit [1994/13]
Fees paidRenewal fee
23.08.1988Renewal fee patent year 03
21.08.1989Renewal fee patent year 04
20.08.1990Renewal fee patent year 05
22.08.1991Renewal fee patent year 06
17.08.1992Renewal fee patent year 07
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Documents cited:Search[A]EP0108390  (HITACHI LTD [JP]);
 [AP]EP0167764  (IBM [US])
 [A]  - SOLID STATE TECHNOLOGY, vol. 27, no. 9, September 1984, pages 239-243, Port Washington, New York, US; L. JASTRZEBSKI: "Silicon CVD for SOI: principles and possible applications"
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.