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Extract from the Register of European Patents

EP About this file: EP0233333

EP0233333 - Method of treating photoresists [Right-click to bookmark this link]
StatusOpposition rejected
Status updated on  06.12.1996
Database last updated on 29.03.2025
Most recent event   Tooltip19.09.2008Change - representativepublished on 22.10.2008  [2008/43]
Applicant(s)For all designated states
USHIO DENKI
Asahi-Tokai Building 19 No. 6-1, 2-chome Ote-machi Chiyoda-ku
Tokyo, 100 / JP
[1987/35]
Inventor(s)01 / Tanaka, Kazuya
USHIO DENKI 6409 motoishikawa-cho Midori-ku
Yokohama-shi Kanagawa / JP
02 / Ueki, Kazuyoshi
USHIO DENKI 6409 motoishikawa-cho Midori-ku
Yokohama-shi Kanagawa / JP
03 / Suzuki, Hiroko
USHIO DENKI 6409 motoishikawa-cho Midori-ku
Yokohama-shi Kanagawa / JP
04 / Mimura, Yoshiki
USHIO DENKI 6409 motoishikawa-cho Midori-ku
Yokohama-shi Kanagawa / JP
05 / Suzuki, Shinji
USHIO DENKI 6409 motoishikawa-cho Midori-ku
Yokohama-shi Kanagawa / JP
06 / Sugioka, Shinji
USHIO DENKI 6409 motoishikawa-cho Midori-ku
Yokohama-shi Kanagawa / JP
[1987/35]
Representative(s)Lang, Friedrich, et al
Lang & Tomerius
Patentanwaltspartnerschaft mbB
Rosa-Bavarese-Strasse 5
80639 München / DE
[N/P]
Former [2008/43]Lang, Friedrich, et al
Lang & Tomerius Patentanwälte Landsberger Strasse 300
80687 München / DE
Former [1995/34]Lang, Friedrich, Dipl.-Ing., et al
Patentanwälte Weber & Heim Irmgardstrasse 3
D-81479 München / DE
Former [1995/33]Lang, Friedrich, Dipl.-Ing.
Patentanwälte Weber & Heim Hofbrunnstrasse 36
D-81479 München / DE
Former [1988/28]Betten, Jürgen, Dipl.-Ing.
Betten & Resch Patentanwälte Reichenbachstrasse 19
D-80469 München / DE
Former [1987/35]Betten, Jürgen Dipl.-Ing.
Betten & Gleiss Patentanwälte Reichenbachstrasse 19
D-8000 München 5 / DE
Application number, filing date86116308.725.11.1986
[1987/35]
Priority number, dateJP1986002877414.02.1986         Original published format: JP 2877486
[1987/35]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0233333
Date:26.08.1987
Language:EN
[1987/35]
Type: A3 Search report 
No.:EP0233333
Date:24.02.1988
Language:EN
[1988/08]
Type: B1 Patent specification 
No.:EP0233333
Date:10.02.1993
Language:EN
[1993/06]
Search report(s)(Supplementary) European search report - dispatched on:EP06.01.1988
ClassificationIPC:G03F7/26
[1987/35]
CPC:
G03F7/2022 (EP)
Designated contracting statesDE,   GB,   NL [1987/35]
TitleGerman:Photolack-Behandlungsverfahren[1987/35]
English:Method of treating photoresists[1987/35]
French:Procédé de traitement de photoréserves[1987/35]
Examination procedure24.07.1988Examination requested  [1988/42]
25.09.1990Despatch of a communication from the examining division (Time limit: M06)
21.03.1991Reply to a communication from the examining division
16.07.1991Despatch of a communication from the examining division (Time limit: M04)
21.11.1991Reply to a communication from the examining division
28.04.1992Despatch of communication of intention to grant (Approval: Yes)
12.08.1992Communication of intention to grant the patent
28.09.1992Fee for grant paid
28.09.1992Fee for publishing/printing paid
Opposition(s)Opponent(s)01  08.11.1993  17.12.1993  ADMISSIBLE
FUSION SYSTEM CORPORATION
7600 Standish Place
Rockville, Maryland 20855 / US
Opponent's representative
Prinz, Egon
Prinz & Partner Manzingerweg 7
81241 München / DE
 [N/P]
Former [1994/02]
Opponent(s)01  08.11.1993  17.12.1993  ADMISSIBLE
FUSION SYSTEM CORPORATION
7600 Standish Place
Rockville, Maryland 20855 / US
Opponent's representative
Prinz, Egon
Prinz & Partner Manzingerweg 7
D-81241 München / DE
17.01.1994Invitation to proprietor to file observations on the notice of opposition
09.03.1995Date of oral proceedings
24.03.1995Despatch of minutes of oral proceedings
05.11.1996Date of despatch of rejection of opposition
23.11.1996Legal effect of rejection of opposition [1997/04]
Appeal following opposition26.05.1995Appeal received No.  T0480/95
27.07.1995Statement of grounds filed
05.11.1996Result of appeal procedure: maintenance in unamended form
Fees paidRenewal fee
18.11.1988Renewal fee patent year 03
27.11.1989Renewal fee patent year 04
30.11.1990Renewal fee patent year 05
28.11.1991Renewal fee patent year 06
27.11.1992Renewal fee patent year 07
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Patent Court
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipGB25.11.1995
NL01.06.1996
[1997/51]
Former [1996/47]GB25.11.1995
Documents cited:Search[Y]GB2143961
 [Y]  - MICROELECTRONIC ENGINEERING, vol. 3, no. 1/4, December 1985, pages 329-337, Elsevier Science Publishers B.V., North-Holland, Amsterdam, NL; A. GUTMANN et al.: "Thermal stability and etching resistance of formaldehyde- and deep UV-hardened photoresists"
 [Y]  - SOLID STATE TECHNOLOGY, vol. 27, no. 7, July 1984, pages 45-46, Port Washington, New York, US; "Photoresist stabilization system"
 [A]  - IBM TECHNICAL DISCLOSURE BULLETIN, vol. 26, no. 2, July 1983, pages 656-657, New York, US; F. MARTINET: "Control of resist-hardening process in a barrel plasma etcher system"
 [A]  - JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 29, no. 6, June 1982, pages 1379-1382, Princeton, New Jersey, US; R. ALLEN et al.: "Deep U.V. hardening of positive photoresist patterns"
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.