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Extract from the Register of European Patents

EP About this file: EP0213826

EP0213826 - Semiconductor laser device and method of fabricating the same [Right-click to bookmark this link]
StatusThe application has been withdrawn
Status updated on  10.06.1991
Database last updated on 03.10.2024
Most recent event   Tooltip31.07.2009Change - representativepublished on 02.09.2009  [2009/36]
Applicant(s)For all designated states
Hitachi, Ltd.
6, Kanda Surugadai 4-chome
Chiyoda-ku
Tokyo / JP
[N/P]
Former [1987/11]For all designated states
HITACHI, LTD.
6, Kanda Surugadai 4-chome
Chiyoda-ku, Tokyo 100 / JP
Inventor(s)01 / Fukuzawa, Tadashi
23-2, Kyodo-3-chome Setagaya-ku
Tokyo / JP
02 / Chinone, Naoki
47-3, Akatsukicho-1-chome
Hachioji-shi / JP
03 / Nakatsuka, Shin'Ichi
14-6, Nishikoigakubo-4-chome
Kokubunji-shi / JP
04 / Saito, Katsutoshi
19-14, Nangai-2-chome
Higashiyamoto-shi / JP
05 / Kajimura, Takashi
2196-251, Hirai Hinodemachi
Nishitama-gun Tokyo / JP
06 / Ono, Yuuichi
2196-288, Hirai Hinodemachi
Nishitama-gun Tokyo / JP
[1987/11]
Representative(s)Calderbank, Thomas Roger, et al
Mewburn Ellis LLP
City Tower
40 Basinghall Street
London EC2V 5DE / GB
[N/P]
Former [2009/36]Calderbank, Thomas Roger, et al
Mewburn Ellis LLP 33 Gutter Lane London
EC2V 8AS / GB
Former [1987/11]Calderbank, Thomas Roger, et al
MEWBURN ELLIS York House 23 Kingsway
London WC2B 6HP / GB
Application number, filing date86306177.611.08.1986
[1987/11]
Priority number, dateJP1985017582312.08.1985         Original published format: JP 17582385
JP1985019941711.09.1985         Original published format: JP 19941785
JP1985022672014.10.1985         Original published format: JP 22672085
JP1985024701806.11.1985         Original published format: JP 24701885
[1987/11]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0213826
Date:11.03.1987
Language:EN
[1987/11]
Type: A3 Search report 
No.:EP0213826
Date:16.03.1988
Language:EN
[1988/11]
Search report(s)(Supplementary) European search report - dispatched on:EP25.01.1988
ClassificationIPC:H01S3/19, H01L33/00
[1987/11]
CPC:
B82Y20/00 (EP,US); H01S5/16 (EP,US); H01S5/20 (EP,US);
H01S5/34 (EP,US); H01S5/1064 (EP,US); H01S5/2059 (EP,US);
H01S5/2063 (EP,US); H01S5/3432 (EP,US) (-)
Designated contracting statesDE,   FR,   GB [1987/11]
TitleGerman:Halbleiterlaservorrichtung und Verfahren zu deren Herstellung[1987/11]
English:Semiconductor laser device and method of fabricating the same[1987/11]
French:Dispositif laser à semi-conducteur et son procédé de fabrication[1987/11]
File destroyed:02.03.1998
Examination procedure19.08.1986Examination requested  [1987/11]
15.01.1991Despatch of a communication from the examining division (Time limit: M06)
24.05.1991Application withdrawn by applicant  [1991/31]
Fees paidRenewal fee
19.08.1988Renewal fee patent year 03
21.08.1989Renewal fee patent year 04
23.08.1990Renewal fee patent year 05
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Documents cited:Search[A]JP59202677  ;
 [A]FR2534078  (SONY CORP [JP]);
 [A]EP0115390  (XEROX CORP [US]);
 [A]JPS6079785  (KOGYO GIJUTSUIN)
 [AD]  - JAPANESE JOURNAL OF APPLIED PHYSICS, vol. 24, no. 7, July 1985, pages L548-L550, Tokyo, JP; S. SEMURA et al.: "AlGaAs/GaAs multiquantum well lasers with buried multiquantum well optical guide"
 [A]  - PATENT ABSTRACTS OF JAPAN, vol. 9, no. 65 (E-304) [1788], 26th March 1985; & JP-A-59 202 677 (KOGYO GIJUTSUIN (JAPAN)) 16-11-84, & JP59202677 A 00000000
 [A]  - APPLIED PHYSICS LETTERS, vol. 46, no. 9, 1st May 1985, pages 849,850, American Institute of Physics, Woodbury, New York, US; M. KAWABE et al.: "Effects of Be and Si on disordering of the AlAs/GaAs superlattice"
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.