blank Quick help
blank Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability

2022.02.11

More...
blank News flashes

News Flashes

New version of the European Patent Register – SPC proceedings information in the Unitary Patent Register.

2024-07-24

More...
blank Related links

Release notes
European Patent Register Assistant
European Patent Register Resource Book
European Patent Register – pocket guide
FAQ - European Patent Register
Federated Register (Flyer)
Global Dossier (Flyer)
Register events
Deep link coverage
Federated Register content
The Patent Information Tour
Fair use charter

Extract from the Register of European Patents

EP About this file: EP0215626

EP0215626 - Systems and methods for ion source control in ion implanters [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  16.04.1992
Database last updated on 07.10.2024
Most recent event   Tooltip23.11.2007Lapse of the patent in a contracting state
Updated state(s): FR		published on 26.12.2007  [2007/52]
Applicant(s)For all designated states
Applied Materials, Inc.
3050 Bowers Avenue
Santa Clara, California 95051 / US
[N/P]
Former [1987/13]For all designated states
APPLIED MATERIALS, INC.
3050 Bowers Avenue
Santa Clara California 95051 / US
Inventor(s)01 / Plumb, Frederick
2 Dickens Way
Horsham West Sussex / GB
02 / Wright, Christopher
3 Holmcroft Gardens
Findon, West Sussex / GB
03 / Bright, Nicholas John
25 Acorn Avenue
Cowfold, West Sussex / GB
04 / Aitken, Derek
The Coach House, Capel Leyse, Moorhurst Lane
South Holmwood, Dorking, Surrey / GB
05 / Harrison, Bernard
3 Beechey Close
Crawley / GB
[1987/13]
Representative(s)Bayliss, Geoffrey Cyril, et al
BOULT WADE TENNANT
Verulam Gardens
70 Gray's Inn Road
London WC1X 8BT / GB
[N/P]
Former [1987/13]Bayliss, Geoffrey Cyril, et al
BOULT, WADE & TENNANT 27 Furnival Street
London EC4A 1PQ / GB
Application number, filing date86306924.108.09.1986
[1987/13]
Priority number, dateUS1985077411009.09.1985         Original published format: US 774110
[1987/13]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0215626
Date:25.03.1987
Language:EN
[1987/13]
Type: A3 Search report 
No.:EP0215626
Date:27.07.1988
Language:EN
[1988/30]
Type: B1 Patent specification 
No.:EP0215626
Date:12.06.1991
Language:EN
[1991/24]
Search report(s)(Supplementary) European search report - dispatched on:EP08.06.1988
ClassificationIPC:H01J37/317, H01J37/08, H01J37/24, H01J27/14
[1987/13]
CPC:
H01J37/24 (EP,US); H01J27/022 (EP,US); H01J27/14 (EP,US);
H01J37/08 (EP,US); H01J37/3171 (EP,US)
Designated contracting statesAT,   BE,   CH,   DE,   FR,   GB,   IT,   LI,   LU,   NL,   SE [1987/13]
TitleGerman:Vorrichtungen und Verfahren zur Steuerung der Ionenquelle in Ionen-Implantierungsgeräten[1987/13]
English:Systems and methods for ion source control in ion implanters[1987/13]
French:Dispositifs et procédés de contrôle de la source d'ions dans les implanteurs ioniques[1987/13]
File destroyed:15.01.2000
Examination procedure27.01.1989Examination requested  [1989/13]
24.08.1990Despatch of communication of intention to grant (Approval: Yes)
17.12.1990Communication of intention to grant the patent
27.03.1991Fee for grant paid
27.03.1991Fee for publishing/printing paid
Opposition(s)13.03.1992No opposition filed within time limit [1992/23]
Fees paidRenewal fee
22.08.1988Renewal fee patent year 03
11.09.1989Renewal fee patent year 04
13.08.1990Renewal fee patent year 05
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT12.06.1991
BE12.06.1991
CH12.06.1991
FR12.06.1991
IT12.06.1991
LI12.06.1991
NL12.06.1991
SE12.06.1991
GB12.09.1991
LU30.09.1991
[2006/14]
Former [1999/52]AT12.06.1991
BE12.06.1991
CH12.06.1991
IT12.06.1991
LI12.06.1991
NL12.06.1991
SE12.06.1991
GB12.09.1991
LU30.09.1991
FR31.10.1991
Former [1999/42]AT12.06.1991
BE12.06.1991
CH12.06.1991
IT12.06.1991
LI12.06.1991
NL12.06.1991
SE12.06.1991
GB12.09.1991
FR31.10.1991
Former [1993/13]AT12.06.1991
BE12.06.1991
CH12.06.1991
LI12.06.1991
NL12.06.1991
SE12.06.1991
GB12.09.1991
FR31.10.1991
Former [1992/25]AT12.06.1991
BE12.06.1991
CH12.06.1991
LI12.06.1991
NL12.06.1991
SE12.06.1991
FR31.10.1991
Former [1992/18]AT12.06.1991
BE12.06.1991
CH12.06.1991
LI12.06.1991
NL12.06.1991
SE12.06.1991
Former [1992/15]AT12.06.1991
CH12.06.1991
LI12.06.1991
NL12.06.1991
SE12.06.1991
Former [1992/06]CH12.06.1991
LI12.06.1991
NL12.06.1991
SE12.06.1991
Former [1992/05]NL12.06.1991
SE12.06.1991
Former [1992/03]SE12.06.1991
Documents cited:Search[A]US4424448  (TAKIGAWA TADAHIRO [JP], et al)
 [A]  - INSTRUMENTS AND EXPERIMENTAL TECHNIQUES, vol. 25, no. 3, part 2, May/June 1982, pages 673-677, Plenum Publishing Corp., New York, US; A.N. BRYUKHANOV et al.: "Power supply for gas-discharge ion source"
 [A]  - NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH, Section B, vol. B6, no. 1/2, January 1985, pages 146-153, Elsevier Science Publishers B.V., Amsterdam, NL; O. WOODARD et al.: "Computer automation of high current ion implanters"
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.