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Extract from the Register of European Patents

EP About this file: EP0248668

EP0248668 - Process for fabricating multilevel metal integrated circuits and structures produced thereby [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  02.03.1993
Database last updated on 15.06.2024
Most recent event   Tooltip15.08.2008Change - applicantpublished on 17.09.2008  [2008/38]
Applicant(s)For all designated states
Hewlett-Packard Company
3000 Hanover Street
Palo Alto, CA 94304-1112 / US
[N/P]
Former [2008/38]For all designated states
Hewlett-Packard Company
3000 Hanover Street
Palo Alto CA 94304-1112 / US
Former [1987/50]For all designated states
Hewlett-Packard Company
Mail Stop 20 B-O, 3000 Hanover Street
Palo Alto, California 94304 / US
Inventor(s)01 / Koch, Tim Roger
2470 Rolling Green Drive Apt. No. 32
Corvallis, OR 97330 / US
[1987/50]
Representative(s)Colgan, Stephen James, et al
CARPMAELS & RANSFORD 43 Bloomsbury Square
London WC1A 2RA / GB
[N/P]
Former [1987/50]Colgan, Stephen James, et al
CARPMAELS & RANSFORD 43 Bloomsbury Square
London WC1A 2RA / GB
Application number, filing date87304955.504.06.1987
[1987/50]
Priority number, dateUS1986087166006.06.1986         Original published format: US 871660
[1987/50]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0248668
Date:09.12.1987
Language:EN
[1987/50]
Type: A3 Search report 
No.:EP0248668
Date:06.07.1988
Language:EN
[1988/27]
Search report(s)(Supplementary) European search report - dispatched on:EP19.05.1988
ClassificationIPC:H01L21/90, H01L23/52
[1987/50]
CPC:
H01L21/76885 (EP,US); H01L21/7684 (EP,US); H01L23/53223 (EP,US);
H01L2924/0002 (EP,US); Y10S438/937 (EP,US)
C-Set:
H01L2924/0002, H01L2924/00 (EP,US)
Designated contracting statesDE,   FR,   GB,   IT [1987/50]
TitleGerman:Verfahren zum Herstellen von integrierten metallischen Mehrschicht-Schaltungen und gemäss diesem Verfahren hergestellte Strukturen[1987/50]
English:Process for fabricating multilevel metal integrated circuits and structures produced thereby[1987/50]
French:Procédé pour la fabrication de circuits métalliques intégrés à multicouche et structures ainsi fabriquées[1987/50]
File destroyed:12.06.1999
Examination procedure29.12.1988Examination requested  [1989/09]
05.04.1991Despatch of a communication from the examining division (Time limit: M06)
10.10.1991Reply to a communication from the examining division
11.06.1992Despatch of a communication from the examining division (Time limit: M04)
22.10.1992Application deemed to be withdrawn, date of legal effect  [1993/16]
25.11.1992Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [1993/16]
Fees paidRenewal fee
28.06.1989Renewal fee patent year 03
28.05.1990Renewal fee patent year 04
27.05.1991Renewal fee patent year 05
18.05.1992Renewal fee patent year 06
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Documents cited:SearchEP0147247  [ ] (MONOLITHIC MEMORIES INC [US]);
 EP0014727  [ ] (HEPTING & CO CARL);
 EP0002185  [ ] (IBM [US]);
 EP0129389  [ ] (PLESSEY OVERSEAS [GB])
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.