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EP0272142
European procedure
Extract from the Register of European Patents
EP About this file: EP0272142
| EP0272142 - Magnetic field enhanced plasma etch reactor [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 08.07.1995 Database last updated on 11.05.2024 | Most recent event Tooltip | 11.12.1999 | Lapse of the patent in a contracting state | published on 26.01.2000 [2000/04] | Applicant(s) | For all designated states Applied Materials, Inc. 3050 Bowers Avenue Santa Clara, California 95051 / US | [N/P] |
| Former [1988/25] | For all designated states APPLIED MATERIALS, INC. 3050 Bowers Avenue Santa Clara California 95051 / US | Inventor(s) | 01 /
Cheng, David 974 Sherman Oaks Drive San Jose California 95128 / US | 02 /
Maydan, Dan 1200 Murietta Lane Los Altos Hills California 94022 / US | 03 /
Somekh, Sasson 524 Compass Drive Redwood City California 94065 / US | 04 /
Stalder, Kenneth R. 515 King Street Redwood City California 94062 / US | 05 /
Andrews, Dana L. 2541 Betlo Avenue Mountain View California 94043 / US | 06 /
Chang, Mei 3366 Isadora Drive San Josa California 95132 / US | 07 /
White, John M. 2811 Colony View Place Hayward California 94541 / US | 08 /
Wong, Jerry Yuen Kui 32729 Orick Street Union City California 94587 / US | 09 /
Zeitlin, Vladimir J. 146 Muir Avenue Santa Clara California 95051 / US | 10 /
Wang, David Nin-Kou 10931 Santa Teresa Drive Cupertino California 95014 / US | [1988/25] | Representative(s) | Bayliss, Geoffrey Cyril, et al BOULT WADE TENNANT Verulam Gardens 70 Gray's Inn Road London WC1X 8BT / GB | [N/P] |
| Former [1988/25] | Bayliss, Geoffrey Cyril, et al BOULT, WADE & TENNANT 27 Furnival Street London EC4A 1PQ / GB | Application number, filing date | 87311195.9 | 18.12.1987 | [1988/25] | Priority number, date | US19860944843 | 19.12.1986 Original published format: US 944843 | [1988/25] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0272142 | Date: | 22.06.1988 | Language: | EN | [1988/25] | Type: | A3 Search report | No.: | EP0272142 | Date: | 05.09.1990 | Language: | EN | [1990/36] | Type: | B1 Patent specification | No.: | EP0272142 | Date: | 07.09.1994 | Language: | EN | [1994/36] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 16.07.1990 | Classification | IPC: | H01J37/32, H01L21/306, C23C16/50 | [1990/22] | CPC: |
H01L21/67069 (EP);
H01J37/32477 (EP);
H01J37/32623 (EP);
H01J37/32743 (EP);
H01J37/32788 (EP);
H01J37/32862 (EP)
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| Former IPC [1988/25] | H01L21/306, C23C16/50, H01J37/32 | Designated contracting states | AT, BE, CH, DE, ES, FR, GB, GR, IT, LI, LU, NL, SE [1988/25] | Title | German: | Plasmaätzvorrichtung mit Magnetfeldverstärkung | [1988/25] | English: | Magnetic field enhanced plasma etch reactor | [1988/25] | French: | Dispositif de décapage au plasma à amplification par champ magnétique | [1988/25] | Examination procedure | 18.12.1990 | Examination requested [1991/07] | 26.02.1993 | Despatch of a communication from the examining division (Time limit: M06) | 19.07.1993 | Reply to a communication from the examining division | 11.11.1993 | Despatch of communication of intention to grant (Approval: No) | 16.02.1994 | Despatch of communication of intention to grant (Approval: later approval) | 24.02.1994 | Communication of intention to grant the patent | 25.05.1994 | Fee for grant paid | 25.05.1994 | Fee for publishing/printing paid | Divisional application(s) | EP93201991.2 / EP0566220 | Opposition(s) | 08.06.1995 | No opposition filed within time limit [1995/35] | Fees paid | Renewal fee | 04.12.1989 | Renewal fee patent year 03 | 17.12.1990 | Renewal fee patent year 04 | 25.11.1991 | Renewal fee patent year 05 | 14.12.1992 | Renewal fee patent year 06 | 29.11.1993 | Renewal fee patent year 07 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | GR | 07.09.1994 | [2000/04] | Documents cited: | Search | [A]US4159799 (ALLES DAVID S, et al); | [X]US4431473 (OKANO HARUO [JP], et al); | [Y]EP0115970 (COMMISSARIAT ENERGIE ATOMIQUE [FR]); | [X]EP0173583 (ANELVA CORP [JP]); | [Y]US4615755 (TRACY DAVID H [US], et al); | [X]EP0205142 (TEGAL CORP [US]); | [XP]DE3535900 (AIGO SEIICHIRO); | [XPD]US4668338 (MAYDAN DAN [US], et al); | [XP]EP0242065 (VARIAN ASSOCIATES [US]) |