Extract from the Register of European Patents

EP About this file: EP0253764

EP0253764 - Method and device for increasing system security in a laser writing process [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  09.01.1992
Database last updated on 14.03.2026
Most recent event   Tooltip11.12.1999Lapse of the patent in a contracting statepublished on 26.01.2000 [2000/04]
Applicant(s)For all designated states
LASARRAY HOLDING AG
CH-8512 Thundorf / CH
[1988/03]
Inventor(s)01 / Kempter, Meinrad
Tulpenweg 16
CH-3250 Lyss / CH
02 / Glauser, Paul
Grendelbachstrasse 13
CH-8307 Effretikon / CH
[1988/03]
Representative(s)Frauenknecht, Alois J., et al
PPS Polyvalent Patent Service AG Waldrütistrasse 21
8954 Geroldswil / CH
[N/P]
Former [1988/03]Frauenknecht, Alois J., et al
c/o PPS Polyvalent Patent Service AG, Mellingerstrasse 1
CH-5400 Baden / CH
Application number, filing date87810355.523.06.1987
[1988/03]
Priority number, dateCH1986000256525.06.1986         Original published format: CH 256586
[1988/03]
Filing languageDE
Procedural languageDE
PublicationType: A1 Application with search report 
No.:EP0253764
Date:20.01.1988
Language:DE
[1988/03]
Type: B1 Patent specification 
No.:EP0253764
Date:06.03.1991
Language:DE
[1991/10]
Search report(s)(Supplementary) European search report - dispatched on:EP23.11.1987
ClassificationIPC:B23K26/04, H01L23/00
[1991/10]
CPC:
H10W46/00 (EP,KR,US); B23K26/04 (EP,US); B23K2101/007 (EP,US)
Former IPC [1988/03]B23K26/04, H01L23/54
Designated contracting statesAT,   BE,   CH,   DE,   ES,   FR,   GB,   GR,   IT,   LI,   LU,   NL,   SE [1988/03]
TitleGerman:Verfahren und Vorrichtung zur Erhöhung der Systemsicherheit bei einem Laser-Schreibverfahren[1988/03]
English:Method and device for increasing system security in a laser writing process[1988/03]
French:Méthode et dispositif pour augmenter la sécurité d'un système relatif à un procédé d'écriture par laser[1988/03]
Examination procedure07.08.1978Despatch of a communication from the examining division (Time limit: M04)
09.06.1988Examination requested  [1988/32]
07.08.1989Despatch of a communication from the examining division (Time limit: M04)
04.12.1989Reply to a communication from the examining division
23.05.1990Despatch of communication of intention to grant (Approval: Yes)
06.08.1990Communication of intention to grant the patent
24.10.1990Fee for grant paid
24.10.1990Fee for publishing/printing paid
Opposition(s)07.12.1991No opposition filed within time limit [1992/09]
Fees paidRenewal fee
21.06.1989Renewal fee patent year 03
16.06.1990Renewal fee patent year 04
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Lapses during opposition  TooltipGR06.03.1991
[2000/04]
Documents cited:Search[A]   INTERNATIONAL ELECTRON DEVICES MEETING, San Francisco, 13.-15. Dezember 1982, Seiten 407-410; T. MATSUDA et al.: "High precision lithography for submicron VLSI fabrication" [A]
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