| EP0253764 - Method and device for increasing system security in a laser writing process [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 09.01.1992 Database last updated on 14.03.2026 | Most recent event Tooltip | 11.12.1999 | Lapse of the patent in a contracting state | published on 26.01.2000 [2000/04] | Applicant(s) | For all designated states LASARRAY HOLDING AG CH-8512 Thundorf / CH | [1988/03] | Inventor(s) | 01 /
Kempter, Meinrad Tulpenweg 16 CH-3250 Lyss / CH | 02 /
Glauser, Paul Grendelbachstrasse 13 CH-8307 Effretikon / CH | [1988/03] | Representative(s) | Frauenknecht, Alois J., et al PPS Polyvalent Patent Service AG Waldrütistrasse 21 8954 Geroldswil / CH | [N/P] |
| Former [1988/03] | Frauenknecht, Alois J., et al c/o PPS Polyvalent Patent Service AG, Mellingerstrasse 1 CH-5400 Baden / CH | Application number, filing date | 87810355.5 | 23.06.1987 | [1988/03] | Priority number, date | CH19860002565 | 25.06.1986 Original published format: CH 256586 | [1988/03] | Filing language | DE | Procedural language | DE | Publication | Type: | A1 Application with search report | No.: | EP0253764 | Date: | 20.01.1988 | Language: | DE | [1988/03] | Type: | B1 Patent specification | No.: | EP0253764 | Date: | 06.03.1991 | Language: | DE | [1991/10] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 23.11.1987 | Classification | IPC: | B23K26/04, H01L23/00 | [1991/10] | CPC: |
H10W46/00 (EP,KR,US);
B23K26/04 (EP,US);
B23K2101/007 (EP,US)
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| Former IPC [1988/03] | B23K26/04, H01L23/54 | Designated contracting states | AT, BE, CH, DE, ES, FR, GB, GR, IT, LI, LU, NL, SE [1988/03] | Title | German: | Verfahren und Vorrichtung zur Erhöhung der Systemsicherheit bei einem Laser-Schreibverfahren | [1988/03] | English: | Method and device for increasing system security in a laser writing process | [1988/03] | French: | Méthode et dispositif pour augmenter la sécurité d'un système relatif à un procédé d'écriture par laser | [1988/03] | Examination procedure | 07.08.1978 | Despatch of a communication from the examining division (Time limit: M04) | 09.06.1988 | Examination requested [1988/32] | 07.08.1989 | Despatch of a communication from the examining division (Time limit: M04) | 04.12.1989 | Reply to a communication from the examining division | 23.05.1990 | Despatch of communication of intention to grant (Approval: Yes) | 06.08.1990 | Communication of intention to grant the patent | 24.10.1990 | Fee for grant paid | 24.10.1990 | Fee for publishing/printing paid | Opposition(s) | 07.12.1991 | No opposition filed within time limit [1992/09] | Fees paid | Renewal fee | 21.06.1989 | Renewal fee patent year 03 | 16.06.1990 | Renewal fee patent year 04 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | GR | 06.03.1991 | [2000/04] | Documents cited: | Search | [A] INTERNATIONAL ELECTRON DEVICES MEETING, San Francisco, 13.-15. Dezember 1982, Seiten 407-410; T. MATSUDA et al.: "High precision lithography for submicron VLSI fabrication" [A] |