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EP0322258
European procedure
Extract from the Register of European Patents
EP About this file: EP0322258
| EP0322258 - Method for producing thin film patterns on substrates [Right-click to bookmark this link] | |||
| Former [1989/26] | Method and apparatus for producing thin film patterns on substrates | ||
| [1993/18] | Status | No opposition filed within time limit Status updated on 10.03.1994 Database last updated on 19.10.2024 | Most recent event Tooltip | 10.03.1994 | No opposition filed within time limit | published on 27.04.1994 [1994/17] | Applicant(s) | For all designated states Semiconductor Energy Laboratory Co., Ltd. 398 Hase Atsugi-shi, Kanagawa-ken 243-0036 / JP | [N/P] |
| Former [1989/26] | For all designated states SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 398 Hase Atsugi-shi Kanagawa-ken, 243 / JP | Inventor(s) | 01 /
Shinohara, Hisato 5-5-18 Seishin Sagamihara-shi Kanagawa-ken / JP | 02 /
Sugawara, Akira Flat SEL 101 304-1 Hase Atsugi-shi Kanagawa-ken / JP | [1989/26] | Representative(s) | Milhench, Howard Leslie, et al R.G.C. Jenkins & Co. 26 Caxton Street London SW1H 0RJ / GB | [N/P] |
| Former [1989/26] | Milhench, Howard Leslie, et al R.G.C. Jenkins & Co. 26 Caxton Street London SW1H 0RJ / GB | Application number, filing date | 88312326.7 | 23.12.1988 | [1989/26] | Priority number, date | JP19870327663 | 23.12.1987 Original published format: JP 32766387 | [1989/26] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0322258 | Date: | 28.06.1989 | Language: | EN | [1989/26] | Type: | A3 Search report | No.: | EP0322258 | Date: | 19.07.1989 | Language: | EN | [1989/29] | Type: | B1 Patent specification | No.: | EP0322258 | Date: | 05.05.1993 | Language: | EN | [1993/18] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 30.05.1989 | Classification | IPC: | B41M5/24, G02F1/13 | [1989/26] | CPC: |
B23K26/066 (EP);
B41M5/24 (EP);
C03C17/23 (KR);
C03C17/34 (KR);
G02F1/13439 (EP);
H05K3/027 (EP);
| Designated contracting states | DE, FR, GB [1989/26] | Title | German: | Verfahren für die Herstellung von dünnen Filmmustern auf Substraten | [1993/18] | English: | Method for producing thin film patterns on substrates | [1993/18] | French: | Méthode pour la production de dessins à couches minces sur des supports | [1993/18] |
| Former [1989/26] | Verfahren und Vorrichtung für die Herstellung von dünnen Filmmustern auf Substraten | ||
| Former [1989/26] | Method and apparatus for producing thin film patterns on substrates | ||
| Former [1989/26] | Méthode et dispositif pour la production de dessins à couches minces sur des supports | Examination procedure | 08.09.1989 | Examination requested [1989/45] | 13.05.1991 | Despatch of a communication from the examining division (Time limit: M06) | 02.01.1992 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time | 10.02.1992 | Reply to a communication from the examining division | 09.07.1992 | Despatch of communication of intention to grant (Approval: No) | 30.10.1992 | Despatch of communication of intention to grant (Approval: later approval) | 05.11.1992 | Communication of intention to grant the patent | 20.01.1993 | Fee for grant paid | 20.01.1993 | Fee for publishing/printing paid | Opposition(s) | 08.02.1994 | No opposition filed within time limit [1994/17] | Request for further processing for: | 10.02.1992 | Request for further processing filed | 10.02.1992 | Full payment received (date of receipt of payment) Request granted | 06.03.1992 | Decision despatched | Fees paid | Renewal fee | 11.12.1990 | Renewal fee patent year 03 | 09.12.1991 | Renewal fee patent year 04 | 09.10.1992 | Renewal fee patent year 05 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]JP61031288 ; | [A]JP62143847 ; | [A]JP60260393 ; | [A]JP60052390 ; | [X]US4568409 (CAPLAN SANDOR [US]); | [X]US4314256 (PETROV VYACHESLAV V, et al); | [X]DE2812868 (RCA CORP) | [X] - PATENT ABSTRACTS OF JAPAN, vol. 10, no. 187 (M-493)[2243], 2nd July 1986; & JP-A-61 031 288 (ASAHI GLASS CO., LTD) 13-02-1986, & JP61031288 A 00000000 | [A] - PATENT ABSTRACTS OF JAPAN, vol. 11, no. 371 (C-462)[2318], 3rd December 1987; & JP-A-62 143 847 (TOSHIBA CORP.) 27-06-1987, & JP62143847 A 00000000 | [A] - PATENT ABSTRACTS OF JAPAN, vol. 10, no. 138 (M-480)[2195], 21st May 1986; & JP-A-60 260 393 (HANDOUTAI ENERUGII KENKYUSHO K.K.) 23-12-1985, & JP60260393 A 00000000 | [A] - PATENT ABSTRACTS OF JAPAN, vol. 9, no. 183 (M-400)[1906], 30th July 1985; & JP-A-60 052 390 (DAINIPPON INSATSU K.K.) 25-03-1985, & JP60052390 A 00000000 | [A] - IBM TECHNICAL DISCLOSURE BULLETIN, vol. 15, no. 2, July 1972, pages 437-438, IBM Corp., Armonk, New York, US; G.L. GLADSTONE et al.: "Liquid crystal display device configuration" | [A] - MOLECULAR CRYSTALS AND LIQUID CRYSTALS, vol. 109, no. 1, 1984, pages 24-26, New York, US; B. BAHADUR: "Transparent and electrically conducting electrode patterns" |