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EP0335267
European procedure
Extract from the Register of European Patents
EP About this file: EP0335267
| EP0335267 - Molecular beam epitaxy apparatus [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 29.04.1995 Database last updated on 10.03.2026 | Most recent event Tooltip | 29.04.1995 | No opposition filed within time limit | published on 21.06.1995 [1995/25] | Applicant(s) | For all designated states ROHM CO., LTD. 21, Saiin Mizosaki-cho Ukyo-ku Kyoto / JP | [N/P] |
| Former [1989/40] | For all designated states ROHM CO., LTD. 21, Saiin Mizosaki-cho Ukyo-ku Kyoto / JP | Inventor(s) | 01 /
Tanaka, Haruo c/o Rohm Co., Ltd. 21, Saiin Mizosaki-cho Ukyo-ku Kyoto / JP | 02 /
Mushiage, Masato c/o Rohm Co., Ltd. 21, Saiin Mizosaki-cho Ukyo-ku Kyoto / JP | 03 /
Ishida, Yuhji c/o Rohm Co., Ltd. 21, Saiin Mizosaki-cho Ukyo-ku Kyoto / JP | [1989/40] | Representative(s) | Isarpatent Patent- und Rechtsanwälte Barth Charles Hassa Peckmann & Partner mbB Postfach 44 01 51 80750 München / DE | [N/P] |
| Former [1989/40] | Reinhard - Skuhra - Weise & Partner Postfach 44 01 51 D-80750 München / DE | Application number, filing date | 89105248.2 | 23.03.1989 | [1989/40] | Priority number, date | JP19880077798 | 30.03.1988 Original published format: JP 7779888 | JP19880042830 | 30.03.1988 Original published format: JP 4283088 | JP19880087918 | 08.04.1988 Original published format: JP 8791888 | [1989/40] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0335267 | Date: | 04.10.1989 | Language: | EN | [1989/40] | Type: | A3 Search report | No.: | EP0335267 | Date: | 31.10.1990 | Language: | EN | [1990/44] | Type: | B1 Patent specification | No.: | EP0335267 | Date: | 29.06.1994 | Language: | EN | [1994/26] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 11.09.1990 | Classification | IPC: | C23C14/56, C23C14/24, C30B23/02, H01L21/00 | [1989/40] | CPC: |
H10P72/3306 (EP,KR,US);
C23C14/566 (EP,KR,US);
C23C14/221 (KR);
C30B23/02 (EP,US);
H10P72/0421 (EP,KR,US);
H10P72/0441 (EP,KR,US);
H10P72/3308 (EP,KR,US)
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| Designated contracting states | DE, FR, GB, NL [1989/40] | Title | German: | Einrichtung zur Molekularstrahlepitaxie | [1989/40] | English: | Molecular beam epitaxy apparatus | [1989/40] | French: | Appareillage d'épitaxie par jets moléculaires | [1989/40] | Examination procedure | 19.11.1990 | Examination requested [1991/04] | 26.06.1992 | Despatch of a communication from the examining division (Time limit: M04) | 05.11.1992 | Reply to a communication from the examining division | 05.02.1993 | Despatch of a communication from the examining division (Time limit: M06) | 28.07.1993 | Reply to a communication from the examining division | 07.10.1993 | Despatch of communication of intention to grant (Approval: Yes) | 27.12.1993 | Communication of intention to grant the patent | 27.01.1994 | Fee for grant paid | 27.01.1994 | Fee for publishing/printing paid | Divisional application(s) | EP92117113.8 / EP0529687 | Opposition(s) | 30.03.1995 | No opposition filed within time limit [1995/25] | Fees paid | Renewal fee | 07.12.1990 | Renewal fee patent year 03 | 05.03.1992 | Renewal fee patent year 04 | 16.03.1993 | Renewal fee patent year 05 | 16.03.1994 | Renewal fee patent year 06 |
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