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EP0337258
European procedure
Extract from the Register of European Patents
EP About this file: EP0337258
| EP0337258 - Light sensitive compositions for light sensitive coating materials and processes for obtaining relief patterns and images [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 23.04.1994 Database last updated on 09.07.2024 | Most recent event Tooltip | 23.04.1994 | No opposition filed within time limit | published on 15.06.1994 [1994/24] | Applicant(s) | For all designated states BASF Aktiengesellschaft Carl-Bosch-Strasse 38 67063 Ludwigshafen / DE | [N/P] |
| Former [1989/42] | For all designated states BASF Aktiengesellschaft Carl-Bosch-Strasse 38 D-67063 Ludwigshafen / DE | Inventor(s) | 01 /
Schwalm, Reinhold Am Huettenwingert 53 D-6706 Wachenheim / DE | [1989/42] | Application number, filing date | 89105919.8 | 05.04.1989 | [1989/42] | Priority number, date | DE19883812325 | 14.04.1988 Original published format: DE 3812325 | [1989/42] | Filing language | DE | Procedural language | DE | Publication | Type: | A2 Application without search report | No.: | EP0337258 | Date: | 18.10.1989 | Language: | DE | [1989/42] | Type: | A3 Search report | No.: | EP0337258 | Date: | 29.08.1990 | Language: | DE | [1990/35] | Type: | B1 Patent specification | No.: | EP0337258 | Date: | 23.06.1993 | Language: | DE | [1993/25] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 10.07.1990 | Classification | IPC: | G03F7/004 | [1993/25] | CPC: |
G03F7/0045 (EP,US);
Y10S430/111 (EP,US);
Y10S430/122 (EP,US);
Y10S430/123 (EP,US);
Y10S430/143 (EP,US)
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| Former IPC [1989/42] | G03F7/10 | Designated contracting states | BE, DE, FR, GB, NL [1989/42] | Title | German: | Strahlungsempfindliches Gemisch für lichtempfindliche Beschichtungsmaterialien und Verfahren zur Herstellung von Reliefmustern und Reliefbildern | [1989/42] | English: | Light sensitive compositions for light sensitive coating materials and processes for obtaining relief patterns and images | [1989/42] | French: | Compositions photosensibles pour matériaux de revêtement photosensibles et procédé de fabrication d'images et de modèles formant relief | [1989/42] | Examination procedure | 14.07.1990 | Examination requested [1990/36] | 29.10.1992 | Despatch of communication of intention to grant (Approval: Yes) | 27.11.1992 | Communication of intention to grant the patent | 02.01.1993 | Fee for grant paid | 02.01.1993 | Fee for publishing/printing paid | Opposition(s) | 24.03.1994 | No opposition filed within time limit [1994/24] | Fees paid | Renewal fee | 02.01.1991 | Renewal fee patent year 03 | 16.04.1992 | Renewal fee patent year 04 | 20.04.1993 | Renewal fee patent year 05 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]EP0132710 (BASF AG [DE]); | [XP]EP0297443 (BASF AG [DE]); | [XP]EP0271010 (BASF AG [DE]); | [A]DE3628046 (FUJI PHOTO FILM CO LTD [JP]) | [A] - JOURNAL OF IMAGING TECHNOLOGY. vol. 11, no. 4, August 1985, SPRINGFIELD US Seiten 146 - 157; S.Papas: "Photogeneration of Acid: Part 6 -A Review of Basic Principles for Resist" |