Extract from the Register of European Patents

EP About this file: EP0340649

EP0340649 - Method of formulating and operating an electroless plating bath solution for forming copper deposits which are essentially free of fissures [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  04.12.1993
Database last updated on 11.04.2026
Most recent event   Tooltip04.12.1993No opposition filed within time limitpublished on 26.01.1994 [1994/04]
Applicant(s)For all designated states
AMP-Akzo Corporation (a Delaware corp.)
710 Dawson Drive Newark
Delaware 197113 / US
[N/P]
Former [1992/06]For all designated states
AMP-AKZO CORPORATION (a Delaware corp.)
710 Dawson Drive
Newark, Delaware 197113 / US
Former [1991/49]For all designated states
AMP-Akzo Corporation (a Delaware corp.)
322 South Service Road
Melville, NY 11747 / US
Former [1989/45]For all designated states
KOLLMORGEN CORPORATION
10 Mill Pond Lane
Simsbury, CT 06070 / US
Inventor(s)01 / Hughes, Rowan
22800 Rockside Road Appt. 406
bedford, OH 44146 / UA
02 / Paunovic, Milan
78 Shadyside Avenue
Port Washington NY 11050 / US
03 / Zeblisky, Rudolph J.
41 Glenwood Drive
Hauppauge, NY 11787 / US
[1989/45]
Representative(s)Königseder, geb. Egerer, Claudia
Kreuzbichl 1
82491 Grainau / DE
[N/P]
Former [1993/45]Königseder-Egerer, Claudia D.
Kreuzbichl 1
D-82491 Grainau / DE
Former [1991/49]Königseder-Egerer, Claudia D.
Kreuzbichl 1
D-82491 Grainau / DE
Former [1989/45]Königseder, geb. Egerer, Claudia (DE)
Kreuzbichl 1
D-82491 Grainau / DE
Application number, filing date89107716.628.04.1989
[1989/45]
Priority number, dateUS1988018782229.04.1988         Original published format: US 187822
[1989/45]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0340649
Date:08.11.1989
Language:EN
[1989/45]
Type: B1 Patent specification 
No.:EP0340649
Date:03.02.1993
Language:EN
[1993/05]
Search report(s)(Supplementary) European search report - dispatched on:EP19.09.1989
ClassificationIPC:C23C18/16, C23C18/40
[1989/45]
CPC:
C23C18/38 (KR); C23C18/40 (EP)
Designated contracting statesFR,   GB,   NL [1993/01]
Former [1989/45]DE,  FR,  GB,  NL 
TitleGerman:Verfahren zur Formulierung und zum Betrieb eines stromlosen Plattierungsbades zur Abscheidung von im wesentlichen rissfreien Kupferschichten[1989/45]
English:Method of formulating and operating an electroless plating bath solution for forming copper deposits which are essentially free of fissures[1989/45]
French:Procédé et bain pour effectuer un dépôt chimique de cuivre exempt de fissures[1989/45]
Examination procedure24.04.1990Examination requested  [1990/26]
15.03.1991Despatch of a communication from the examining division (Time limit: M04)
03.07.1991Reply to a communication from the examining division
06.11.1991Despatch of a communication from the examining division (Time limit: M04)
04.02.1992Reply to a communication from the examining division
27.05.1992Despatch of communication of intention to grant (Approval: No)
20.07.1992Despatch of communication of intention to grant (Approval: later approval)
03.08.1992Communication of intention to grant the patent
25.09.1992Fee for grant paid
25.09.1992Fee for publishing/printing paid
Opposition(s)04.11.1993No opposition filed within time limit [1994/04]
Fees paidRenewal fee
23.04.1991Renewal fee patent year 03
23.04.1992Renewal fee patent year 04
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Documents cited:Search[A]   JOURNAL OF ELECTROCHEMICAL STY, vol. 127, no. 2, February 1980, pages 365-369, Princeton, US; M. PAUNOVIC: "An electrochemical control system for electroless copper bath"
Examination  Journal of Electrochemical Society, Vol 104, No.1, pages 56-63
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