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EP0413040
European procedure
Extract from the Register of European Patents
EP About this file: EP0413040
| EP0413040 - Method of producing ultrafine silicon tips for the AFM/STM profilometry [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 21.10.1993 Database last updated on 12.07.2024 | Most recent event Tooltip | 21.10.1993 | No opposition filed within time limit | published on 08.12.1993 [1993/49] | Applicant(s) | For all designated states International Business Machines Corporation New Orchard Road Armonk, NY 10504 / US | [N/P] |
| Former [1991/08] | For all designated states International Business Machines Corporation Old Orchard Road Armonk, N.Y. 10504 / US | Inventor(s) | 01 /
Bayer, Thomas Hinterweiler Strasse 45 D-7032 Sindelfingen / DE | 02 /
Greschner, Johann, Dr. Dipl.-Phys. Tiergartenweg 14 D-7401 Pliezhausen 1 / DE | 03 /
Weiss, Helga Wielandstrasse 7 D-7030 Böblingen / DE | 04 /
Wolter, Olaf, Dr. Dipl.-Phys. Wacholderweg 8 D-7042 Aidlingen 3 / DE | 05 /
Wickramasinghe, Hemantha K., Dr., Dipl.-Phys. 600 King St., Chappaqua New York 10514 / US | 06 /
Martin, Yves, Dr., Dipl.-Phys. 253 Macy Rd., Briarcliff Manor New York 10510 / US | [1991/08] | Representative(s) | Mönig, Anton, et al IBM Deutschland Informationssysteme GmbH, Patentwesen und Urheberrecht 70548 Stuttgart / DE | [N/P] |
| Former [1993/23] | Mönig, Anton, Dipl.-Ing., et al IBM Deutschland Informationssysteme GmbH, Patentwesen und Urheberrecht D-70548 Stuttgart / DE | ||
| Former [1991/08] | Kreidler, Eva-Maria, Dr. rer. nat. IBM Deutschland GmbH Patentwesen und Urheberrecht Schönaicher Strasse 220 D-71032 Böblingen / DE | Application number, filing date | 89115097.1 | 16.08.1989 | [1991/08] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP0413040 | Date: | 20.02.1991 | Language: | EN | [1991/08] | Type: | B1 Patent specification | No.: | EP0413040 | Date: | 16.12.1992 | Language: | EN | [1992/51] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 05.06.1990 | Classification | IPC: | G01N27/00 | [1991/08] | CPC: |
G01Q60/38 (EP,US);
G01Q60/04 (EP,US);
G01Q60/16 (EP,US);
G01Q70/10 (EP,US);
Y10S977/878 (EP,US)
| Designated contracting states | DE, FR, GB [1991/08] | Title | German: | Verfahren für die Herstellung ultrafeiner Siliziumspitzen für AFM/STM-Profilometrie | [1991/08] | English: | Method of producing ultrafine silicon tips for the AFM/STM profilometry | [1991/08] | French: | Méthode de production de pointes ultrafines en silicium pour la profilométrie AFM/STM | [1991/08] | Examination procedure | 13.12.1990 | Examination requested [1991/08] | 24.12.1990 | Request for accelerated examination filed | 19.04.1991 | Despatch of a communication from the examining division (Time limit: M04) | 19.04.1991 | Decision about request for accelerated examination - accepted: Yes | 14.08.1991 | Reply to a communication from the examining division | 05.09.1991 | Despatch of a communication from the examining division (Time limit: M04) | 23.12.1991 | Reply to a communication from the examining division | 24.02.1992 | Despatch of communication of intention to grant (Approval: Yes) | 16.06.1992 | Communication of intention to grant the patent | 07.07.1992 | Fee for grant paid | 07.07.1992 | Fee for publishing/printing paid | Opposition(s) | 17.09.1993 | No opposition filed within time limit [1993/49] | Fees paid | Renewal fee | 13.12.1990 | Renewal fee patent year 03 | 17.08.1992 | Renewal fee patent year 04 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A] - IBM TECHNICAL DISCLOSURE BULLETIN, vol. 24, no. 12, May 1982, pages 6270-6271, New York, US; C.R. GUARNIERI et al.: "Fabrication of an improved membrane substrate" | [A] - JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 130, no. 7, July 1983, pages 1592-1597, Manchester, New Hampshire, US; H.B. POGGE et al.: "Reactive ion etching of silicon with CI2/Ar(1)" | [A] - IEEE TRANSACTIONS ON MAGNETICS, vol. MAG-19, no. 3, part 1, May 1983, pages 507-511, IEEE, New York, US; N.F. RALEY et al.: "Vertical silicon membranes for super-Schottky diodes" | [A] - APPLIED PHYSICS LETTERS, vol. 50, no. 11, 16th March 1987, pages 696-698, American Institute of Physics, New York, NY, US; D.K. BIEGELSEN et al.: "Ion milled tips for scanning tunneling microscopy" | [A] - JOURNAL OF VACUUM SCIENCE & TECHNOLOGY/SECTION A, vol. 6, no. 3, part II, second series, May/June 1988, pages 2089-2092, American Vacuum Society, Woodbury, NY, US; O. MARTI et al.: "Atomic force microscopy and scanning tunneling microscopy with a combination atomic force microscope/scanning tunneling microscope" |