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Extract from the Register of European Patents

EP About this file: EP0372438

EP0372438 - UV and plasma stable high-reflectance multilayer dielectric mirror [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  26.07.1991
Database last updated on 02.07.2024
Most recent event   Tooltip12.06.2009Change - representativepublished on 15.07.2009  [2009/29]
Applicant(s)For all designated states
HONEYWELL INC.
Honeywell Plaza
Minneapolis, MN 55408 / US
[N/P]
Former [1990/24]For all designated states
HONEYWELL INC.
Honeywell Plaza
Minneapolis Minnesota 55408 / US
Inventor(s)01 / Cole, Barrett E.
3010 W. 12th Street
Bloomington Minnesota 55344 / US
[1990/24]
Representative(s)Rentzsch, Heinz, et al
Honeywell Holding AG Patent- und Lizenzabteilung Postfach 10 08 65
63008 Offenbach / DE
[2009/29]
Former [1990/24]Rentzsch, Heinz, Dipl.-Ing., et al
Honeywell Holding AG Patent- und Lizenzabteilung Kaiserleistrasse 39 Postfach 10 08 65
D-63008 Offenbach / DE
Application number, filing date89122262.202.12.1989
[1990/24]
Priority number, dateUS1988028004305.12.1988         Original published format: US 280043
[1990/24]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0372438
Date:13.06.1990
Language:EN
[1990/24]
Type: A3 Search report 
No.:EP0372438
Date:01.08.1990
Language:EN
[1990/31]
Search report(s)(Supplementary) European search report - dispatched on:EP13.06.1990
ClassificationIPC:G02B5/08, G02B1/10
[1990/24]
CPC:
G02B5/26 (EP); G02B5/0833 (EP); G02B5/0891 (EP)
Designated contracting statesDE,   FR,   GB [1990/24]
TitleGerman:UV- und plasmastabiler vielschichtiger, hochreflektierender dielektrischer Spiegel[1990/24]
English:UV and plasma stable high-reflectance multilayer dielectric mirror[1990/24]
French:Miroir multicouche diélectrique à haut pouvoir de réflexion résistant aux rayons UV et au plasma[1990/24]
File destroyed:08.03.1999
Examination procedure02.02.1991Application deemed to be withdrawn, date of legal effect  [1991/38]
19.04.1991Despatch of communication that the application is deemed to be withdrawn, reason: examination fee not paid in time  [1991/38]
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Documents cited:Search[A]DE3731501  ;
 [A]FR2158017
 [A]  - NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, vol. A250, no. 1/2, September 1986, pages 289-292, Elsevier Science Publishers B.V. (North-Holland Physics Publishing Division)NL; M. AMBROSIO et al.: "Preliminary results on dielectric mirror damage due to the radiation of a high K undulator"
 [A]  - NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH/SECTION B24/25, part 1, 3rd April 1987, pages 603-607, Elsevier Science Publishers B.V. (North-Holland Physics Publishing Division), AmsterdamNL; J.G. BEERY: "Ion beam characterization of laser mirrors"
 [A]  - THIN SOLID FILMS, vol. 129, no. 3/4, July 1985, pages L71-L73, Elsevier Sequioa, LausanneCH; K.V.S.R. APPARAO et al.: "Low loss ZrO2 films for optical applications in the UV region"
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.