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Extract from the Register of European Patents

EP About this file: EP0392499

EP0392499 - Apparatus for generating high-quality character pattern [Right-click to bookmark this link]
Former [1990/42]Method and apparatus for generating high-quality character pattern
[1995/25]
StatusNo opposition filed within time limit
Status updated on  26.04.1996
Database last updated on 07.10.2024
Most recent event   Tooltip26.04.1996No opposition filed within time limitpublished on 12.06.1996 [1996/24]
Applicant(s)For all designated states
Kabushiki Kaisha Toshiba
72, Horikawa-cho, Saiwai-ku Kawasaki-shi
Kanagawa-ken 210-8572 / JP
[N/P]
Former [1995/01]For all designated states
KABUSHIKI KAISHA TOSHIBA
72, Horikawa-cho, Saiwai-ku
Kawasaki-shi, Kanagawa-ken 210, Tokyo / JP
Former [1990/42]For all designated states
Kabushiki Kaisha Toshiba
72, Horikawa-cho Saiwai-ku
Kawasaki-shi / JP
Inventor(s)01 / Sato, Fumitaka, c/o Intellectual Property Division
K.K. Toshiba, 1-1 Shibaura 1-chome
Minato-ku, Tokyo 105 / JP
[1990/42]
Representative(s)Henkel & Partner mbB
Patentanwaltskanzlei, Rechtsanwaltskanzlei
Maximiliansplatz 21
80333 München / DE
[N/P]
Former [1990/42]Henkel, Feiler, Hänzel & Partner
Möhlstrasse 37
D-81675 München / DE
Application number, filing date90106939.311.04.1990
[1990/42]
Priority number, dateJP1989009249312.04.1989         Original published format: JP 9249389
[1990/42]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0392499
Date:17.10.1990
Language:EN
[1990/42]
Type: A3 Search report 
No.:EP0392499
Date:12.08.1992
Language:EN
[1992/33]
Type: B1 Patent specification 
No.:EP0392499
Date:21.06.1995
Language:EN
[1995/25]
Search report(s)(Supplementary) European search report - dispatched on:EP25.06.1992
ClassificationIPC:G09G1/00
[1990/42]
CPC:
G09G5/24 (EP,US); G06V10/46 (KR)
Designated contracting statesDE,   GB [1995/25]
Former [1990/42]DE,  FR,  GB,  IT 
TitleGerman:Einrichtung zur Erzeugung eines Zeichenmusters hoher Qualität[1995/25]
English:Apparatus for generating high-quality character pattern[1995/25]
French:Dispositif de génération d'un motif de caractères de haute qualité[1995/25]
Former [1990/42]Verfahren und Einrichtung zur Erzeugung eines Zeichenmusters hoher Qualität
Former [1990/42]Method and apparatus for generating high-quality character pattern
Former [1990/42]Méthode et dispositif de génération d'un motif de caractères de haute qualité
Examination procedure08.05.1990Examination requested  [1990/42]
23.12.1993Despatch of a communication from the examining division (Time limit: M06)
27.06.1994Reply to a communication from the examining division
15.09.1994Despatch of communication of intention to grant (Approval: Yes)
31.10.1994Communication of intention to grant the patent
25.01.1995Fee for grant paid
25.01.1995Fee for publishing/printing paid
Opposition(s)22.03.1996No opposition filed within time limit [1996/24]
Fees paidRenewal fee
10.04.1992Renewal fee patent year 03
13.04.1993Renewal fee patent year 04
11.04.1994Renewal fee patent year 05
04.04.1995Renewal fee patent year 06
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Documents cited:Search[A]EP0200885  (DAINIPPON SCREEN MFG [JP]);
 [AP]EP0327002  (TOSHIBA KK [JP])
 [A]  - IEEE TRANSACTIONS ON COMPUTERS vol. C-34, no. 7, 1 July 1985, NEW YORK, USA pages 666 - 673; M. CHLAMTAC ET AL: 'THE SHIFT X PARITY WATCH ALGORITHM FOR RASTER SCAN DISPLAYS'
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.