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Extract from the Register of European Patents

EP About this file: EP0446768

EP0446768 - Apparatus for processing photo-sensitive material [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  02.09.1995
Database last updated on 21.05.2024
Most recent event   Tooltip02.09.1995No opposition filed within time limitpublished on 25.10.1995 [1995/43]
Applicant(s)For all designated states
Eastman Kodak Company
343 State Street
Rochester, NY 14650-2201 / US
[N/P]
Former [1991/38]For all designated states
EASTMAN KODAK COMPANY
343 State Street
Rochester, New York 14650-2201 / US
Inventor(s)01 / Hall, Douglas Oliver, c/o Eastman Kodak Company
Patent Department, 343 State Street
Rochester, New York 14650 - 2201 / US
02 / Muller, Bruce Robert, c/o Eastman Kodak Company
Patent Department, 343 State Street
Rochester, New York 14650 - 2201 / US
[1991/38]
Representative(s)Blickle, K. Werner, et al
KODAK AKTIENGESELLSCHAFT Patentabteilung
70323 Stuttgart / DE
[N/P]
Former [1991/38]Blickle, K. Werner, Dipl.-Ing., et al
KODAK AKTIENGESELLSCHAFT Patentabteilung
D-70323 Stuttgart / DE
Application number, filing date91103383.506.03.1991
[1991/38]
Priority number, dateUS1990049567116.03.1990         Original published format: US 495671
[1991/38]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0446768
Date:18.09.1991
Language:EN
[1991/38]
Type: A3 Search report 
No.:EP0446768
Date:08.04.1992
Language:EN
[1992/15]
Type: B1 Patent specification 
No.:EP0446768
Date:02.11.1994
Language:EN
[1994/44]
Search report(s)(Supplementary) European search report - dispatched on:EP20.02.1992
ClassificationIPC:G03B5/04, G03D5/04
[1992/15]
CPC:
G03D5/006 (EP,US); G03D3/06 (EP,US); G03D5/04 (EP,US)
Former IPC [1991/38]G03D5/04
Designated contracting statesDE,   FR,   GB,   IT [1991/38]
TitleGerman:Gerät zur Entwicklung von lichtempfindlichem Material[1991/38]
English:Apparatus for processing photo-sensitive material[1991/38]
French:Appareil pour le développement d'un matériau photosensible[1991/38]
Examination procedure16.04.1992Examination requested  [1992/25]
04.08.1993Despatch of a communication from the examining division (Time limit: M04)
12.11.1993Reply to a communication from the examining division
28.03.1994Despatch of communication of intention to grant (Approval: No)
28.04.1994Despatch of communication of intention to grant (Approval: later approval)
06.05.1994Communication of intention to grant the patent
28.07.1994Fee for grant paid
28.07.1994Fee for publishing/printing paid
Opposition(s)03.08.1995No opposition filed within time limit [1995/43]
Fees paidRenewal fee
26.03.1993Renewal fee patent year 03
22.03.1994Renewal fee patent year 04
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Documents cited:Search[A]US3688677  (FRICK HANS-DIETER, et al);
 [A]US3833918  (STIEVENART E, et al);
 [A]US4128326  (SELAK MARTIN M)
ExaminationUS4989028
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.