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Extract from the Register of European Patents

EP About this file: EP0513634

EP0513634 - High-speed film-forming processes by plasma CVD and Radical CVD under high pressure [Right-click to bookmark this link]
StatusThe application has been withdrawn
Status updated on  11.05.1995
Database last updated on 25.09.2024
Most recent event   Tooltip25.07.2008Change - representativepublished on 27.08.2008  [2008/35]
Applicant(s)For all designated states
Mori, Yuzo
8-16-19, Kisaichi Katano-shi
Osaka / JP
For all designated states
UHA MIKAKUTO PRECISION ENGINEERING RESEARCH INSTITUTE Co., Ltd.
4-12, Kanzaki-cho, Chuo-ku Osaka-shi
Osaka 540 / JP
[N/P]
Former [1992/47]For all designated states
Mori, Yuzo
16-9, 8-chome Kisaichi
Katano-shi Osaka 576 / JP
For all designated states
UHA MIKAKUTO PRECISION ENGINEERING RESEARCH INSTITUTE Co., Ltd.
4-12, Kanzaki-cho, Chuo-ku
Osaka-shi, Osaka 540 / JP
Inventor(s)01 / Mori, Yuzo
16-9 Kisaichi 8-chome
Katano-shi, Osaka 576 / JP
[1992/47]
Representative(s)Vossius & Partner Patentanwälte Rechtsanwälte mbB
Siebertstrasse 3
81675 München / DE
[N/P]
Former [2008/35]Vossius & Partner
Postfach 86 07 67
81634 München / DE
Former [1992/47]VOSSIUS & PARTNER
P.O. Box 86 07 67
D-81634 München / DE
Application number, filing date92107566.905.05.1992
[1992/47]
Priority number, dateJP1991013975014.05.1991         Original published format: JP 13975091
[1992/47]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0513634
Date:19.11.1992
Language:EN
[1992/47]
Type: A3 Search report 
No.:EP0513634
Date:31.08.1994
Language:EN
[1994/35]
Search report(s)(Supplementary) European search report - dispatched on:EP12.07.1994
ClassificationIPC:C23C16/44, C23C16/50, H01J37/34
[1994/34]
CPC:
H01J37/32256 (EP); C23C16/452 (EP); H01J37/32357 (EP);
H01J2237/3326 (EP)
Former IPC [1992/47]C23C16/44, C23C16/50
Designated contracting statesDE,   FR,   GB [1992/47]
TitleGerman:Schnelle Filmbildungsverfahren mittels durch Plasma und Radicale unterstütztes CVD bei hohem Druck[1992/47]
English:High-speed film-forming processes by plasma CVD and Radical CVD under high pressure[1992/47]
French:Procédés à haute vitesse de formation de films par CVD assisté par plasma et radicaux à haute pression[1992/47]
File destroyed:03.03.2001
Examination procedure02.02.1995Examination requested  [1995/13]
15.03.1995Application withdrawn by applicant  [1995/26]
Fees paidRenewal fee
30.05.1994Renewal fee patent year 03
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Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[XAY]JPS6141763  ;
 [XA]US4951602  (KANAI M) [X] 1-5,9 * column 7, line 1 - column 8, line 13; example 3 * [A] 6-8,10-15;
 [YA]JPS61278131  ;
 [YA]JPS62278263  ;
 [A]EP0422243  (CANON KK) [A] 1-15 * figure 3 *;
 [A]JPH0285368  ;
 [A]JPS63243277  ;
 [A]US5010276  (ECHIZEN ET AL) [A] 1-15 * claim 1 *;
 [A]JPH01238020  ;
 [A]EP0237078  (FUJITSU LTD) [A] 1-15 * claim 1 *
 [XAY]  - PATENT ABSTRACTS OF JAPAN, (19860711), vol. 010, no. 199, Database accession no. (C - 359), & JP61041763 A 19860228 (ANELVA CORP) [X] 1-5 * abstract * * abstract * [A] 8-15 [Y] 6,7
 [YA]  - PATENT ABSTRACTS OF JAPAN, (19870502), vol. 011, no. 138, Database accession no. (E - 503), & JP61278131 A 19861209 (AGENCY OF IND SCIENCE & TECHNOL;OTHERS: 01) [Y] 6 * abstract * [A] 1-5,7-15
 [YA]  - PATENT ABSTRACTS OF JAPAN, (19880521), vol. 012, no. 172, Database accession no. (C - 497), & JP62278263 A 19871203 (CANON INC) [Y] 7 * abstract * [A] 1-6,8-15
 [A]  - PATENT ABSTRACTS OF JAPAN, (19900618), vol. 014, no. 280, Database accession no. (C - 0729), & JP02085368 A 19900326 (FUJITSU LTD) [A] 1-15 * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19890203), vol. 013, no. 049, Database accession no. (C - 565), & JP63243277 A 19881011 (HITACHI LTD) [A] 1-15 * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19891215), vol. 013, no. 568, Database accession no. (E - 861), & JP01238020 A 19890922 (HITACHI LTD) [A] 1-15 * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.