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Extract from the Register of European Patents

EP About this file: EP0512572

EP0512572 - Optical isolator and method for fabricating the same [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  01.11.1996
Database last updated on 18.05.2024
Most recent event   Tooltip01.11.1996No opposition filed within time limitpublished on 18.12.1996 [1996/51]
Applicant(s)For all designated states
NEC Corporation
7-1, Shiba 5-chome Minato-ku
Tokyo 108-8001 / JP
[N/P]
Former [1992/46]For all designated states
NEC CORPORATION
7-1, Shiba 5-chome Minato-ku
Tokyo / JP
Inventor(s)01 / Ohkawara, Kazuhide
c/o NEC Corporation, 7-1, Shiba 5-chome
Minato-ku, Tokyo / JP
[1992/46]
Representative(s)Vossius & Partner Patentanwälte Rechtsanwälte mbB
Siebertstrasse 3
81675 München / DE
[N/P]
Former [1992/46]VOSSIUS & PARTNER
Postfach 86 07 67
D-81634 München / DE
Application number, filing date92107893.711.05.1992
[1992/46]
Priority number, dateJP1991010584210.05.1991         Original published format: JP 10584291
[1992/46]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0512572
Date:11.11.1992
Language:EN
[1992/46]
Type: A3 Search report 
No.:EP0512572
Date:24.03.1993
Language:EN
[1993/12]
Type: B1 Patent specification 
No.:EP0512572
Date:27.12.1995
Language:EN
[1995/52]
Search report(s)(Supplementary) European search report - dispatched on:EP03.02.1993
ClassificationIPC:G02F1/09
[1992/46]
CPC:
G02F1/093 (EP,US); Y10S359/90 (EP,US); Y10S372/703 (EP,US)
Designated contracting statesDE,   FR,   GB [1992/46]
TitleGerman:Optischer Isolator und Verfahren zu seiner Herstellung[1992/46]
English:Optical isolator and method for fabricating the same[1992/46]
French:Isolateur optique et son procédé de fabrication[1992/46]
Examination procedure17.02.1993Examination requested  [1993/15]
13.01.1995Despatch of communication of intention to grant (Approval: No)
27.06.1995Despatch of communication of intention to grant (Approval: later approval)
03.07.1995Communication of intention to grant the patent
04.10.1995Fee for grant paid
04.10.1995Fee for publishing/printing paid
Opposition(s)28.09.1996No opposition filed within time limit [1996/51]
Fees paidRenewal fee
30.05.1994Renewal fee patent year 03
28.04.1995Renewal fee patent year 04
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[A]JP01200223  ;
 [XP]JP04000410  ;
 [A]GB2217508  (HITACHI METALS LTD [JP])
 [A]  - PATENT ABSTRACTS OF JAPAN vol. 13, no. 499 (P-957)10 November 1989 & JP-A-01 200 223 ( FUJI ELECTROCHEM. ) 11 August 1989, & JP01200223 A 19890811
 [A]  - APPLIED OPTICS vol. 25, no. 2, January 1986, NEW YORK pages 311 - 314 K. SHIRAISHI: 'Microisolator'
 [XP]  - PATENT ABSTRACTS OF JAPAN vol. 16, no. 139 (P-1334)8 April 1992 & JP-A-04 000 410 ( SHIN ETSU CHEM. ) 6 January 1992, & JP04000410 A 19920106
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.