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Extract from the Register of European Patents

EP About this file: EP0501638

EP0501638 - Reduced path ion beam implanter [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  21.11.1997
Database last updated on 20.07.2024
Most recent event   Tooltip21.11.1997No opposition filed within time limitpublished on 07.01.1998 [1998/02]
Applicant(s)For all designated states
EATON CORPORATION
Eaton Center, 1111 Superior Avenue Cleveland
Ohio 44114 / US
[N/P]
Former [1992/36]For all designated states
EATON CORPORATION
Eaton Center, 1111 Superior Avenue
Cleveland Ohio 44114 / US
Inventor(s)01 / Dykstra, Jerald Paul
6611 Argentia Road
Austin, Texas 78731 / US
02 / Ray, Andrew Marlow
6009 Salton Drive
Austin, Texas 78759 / US
03 / King, Monroe Lee
9824 Childress Drive
Austin, Texas 78753 / US
[1992/36]
Representative(s)Musker, David Charles, et al
RGC Jenkins & Co.
26 Caxton Street
London SW1H 0RJ / GB
[N/P]
Former [1997/03]Musker, David Charles, et al
R.G.C. Jenkins & Co. 26 Caxton Street
London SW1H 0RJ / GB
Former [1992/36]Wright, Peter David John, et al
R.G.C. Jenkins & Co. 26 Caxton Street
London SW1H 0RJ / GB
Application number, filing date92301231.414.02.1992
[1992/36]
Priority number, dateUS1991066073825.02.1991         Original published format: US 660738
[1992/36]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0501638
Date:02.09.1992
Language:EN
[1992/36]
Type: B1 Patent specification 
No.:EP0501638
Date:15.01.1997
Language:EN
[1997/03]
Search report(s)(Supplementary) European search report - dispatched on:EP19.06.1992
ClassificationIPC:H01J37/317, H01J37/30, H01J37/12
[1997/03]
CPC:
H01J37/12 (EP,US); H01J37/3007 (EP,US); H01J37/3171 (EP,US);
H01J2237/04735 (EP,US); H01J2237/1215 (EP,US); H01J2237/151 (EP,US)
Former IPC [1992/36]H01J37/317, H01J37/30
Designated contracting statesDE,   FR,   GB [1992/36]
TitleGerman:Ionenimplantierungsgerät mit verringertem Weg[1992/36]
English:Reduced path ion beam implanter[1992/36]
French:Implanteur ionique à chemin réduit[1992/36]
Examination procedure16.09.1992Examination requested  [1992/46]
27.10.1994Despatch of a communication from the examining division (Time limit: M06)
05.05.1995Reply to a communication from the examining division
18.03.1996Despatch of communication of intention to grant (Approval: No)
02.07.1996Despatch of communication of intention to grant (Approval: later approval)
10.07.1996Communication of intention to grant the patent
14.10.1996Fee for grant paid
14.10.1996Fee for publishing/printing paid
Opposition(s)16.10.1997No opposition filed within time limit [1998/02]
Fees paidRenewal fee
14.04.1994Renewal fee patent year 03
15.02.1995Renewal fee patent year 04
05.02.1996Renewal fee patent year 05
Penalty fee
Additional fee for renewal fee
28.02.199403   M06   Fee paid on   14.04.1994
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Documents cited:Search[A]JP62285354  ;
 [A]WO8607189  (VARIAN ASSOCIATES [US]);
 [A]US4330708  (MEISBURGER WILLIAM D);
 [AD]WO8706391  (ECLIPSE ION TECHNOLOGY INC [US])
 [A]  - PATENT ABSTRACTS OF JAPAN vol. 12, no. 177 (E-613)25 May 1988 & JP-A-62 285 354 ( TOKYO ELECTRON LTD. ) 11 December 1987, & JP62285354 A 19871211
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.