EP0501638 - Reduced path ion beam implanter [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 21.11.1997 Database last updated on 20.07.2024 | Most recent event Tooltip | 21.11.1997 | No opposition filed within time limit | published on 07.01.1998 [1998/02] | Applicant(s) | For all designated states EATON CORPORATION Eaton Center, 1111 Superior Avenue Cleveland Ohio 44114 / US | [N/P] |
Former [1992/36] | For all designated states EATON CORPORATION Eaton Center, 1111 Superior Avenue Cleveland Ohio 44114 / US | Inventor(s) | 01 /
Dykstra, Jerald Paul 6611 Argentia Road Austin, Texas 78731 / US | 02 /
Ray, Andrew Marlow 6009 Salton Drive Austin, Texas 78759 / US | 03 /
King, Monroe Lee 9824 Childress Drive Austin, Texas 78753 / US | [1992/36] | Representative(s) | Musker, David Charles, et al RGC Jenkins & Co. 26 Caxton Street London SW1H 0RJ / GB | [N/P] |
Former [1997/03] | Musker, David Charles, et al R.G.C. Jenkins & Co. 26 Caxton Street London SW1H 0RJ / GB | ||
Former [1992/36] | Wright, Peter David John, et al R.G.C. Jenkins & Co. 26 Caxton Street London SW1H 0RJ / GB | Application number, filing date | 92301231.4 | 14.02.1992 | [1992/36] | Priority number, date | US19910660738 | 25.02.1991 Original published format: US 660738 | [1992/36] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP0501638 | Date: | 02.09.1992 | Language: | EN | [1992/36] | Type: | B1 Patent specification | No.: | EP0501638 | Date: | 15.01.1997 | Language: | EN | [1997/03] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 19.06.1992 | Classification | IPC: | H01J37/317, H01J37/30, H01J37/12 | [1997/03] | CPC: |
H01J37/12 (EP,US);
H01J37/3007 (EP,US);
H01J37/3171 (EP,US);
H01J2237/04735 (EP,US);
H01J2237/1215 (EP,US);
H01J2237/151 (EP,US)
|
Former IPC [1992/36] | H01J37/317, H01J37/30 | Designated contracting states | DE, FR, GB [1992/36] | Title | German: | Ionenimplantierungsgerät mit verringertem Weg | [1992/36] | English: | Reduced path ion beam implanter | [1992/36] | French: | Implanteur ionique à chemin réduit | [1992/36] | Examination procedure | 16.09.1992 | Examination requested [1992/46] | 27.10.1994 | Despatch of a communication from the examining division (Time limit: M06) | 05.05.1995 | Reply to a communication from the examining division | 18.03.1996 | Despatch of communication of intention to grant (Approval: No) | 02.07.1996 | Despatch of communication of intention to grant (Approval: later approval) | 10.07.1996 | Communication of intention to grant the patent | 14.10.1996 | Fee for grant paid | 14.10.1996 | Fee for publishing/printing paid | Opposition(s) | 16.10.1997 | No opposition filed within time limit [1998/02] | Fees paid | Renewal fee | 14.04.1994 | Renewal fee patent year 03 | 15.02.1995 | Renewal fee patent year 04 | 05.02.1996 | Renewal fee patent year 05 | Penalty fee | Additional fee for renewal fee | 28.02.1994 | 03   M06   Fee paid on   14.04.1994 |
Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]JP62285354 ; | [A]WO8607189 (VARIAN ASSOCIATES [US]); | [A]US4330708 (MEISBURGER WILLIAM D); | [AD]WO8706391 (ECLIPSE ION TECHNOLOGY INC [US]) | [A] - PATENT ABSTRACTS OF JAPAN vol. 12, no. 177 (E-613)25 May 1988 & JP-A-62 285 354 ( TOKYO ELECTRON LTD. ) 11 December 1987, & JP62285354 A 19871211 |