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EP0505161
European procedure
Extract from the Register of European Patents
EP About this file: EP0505161
| EP0505161 - Photosensitive polymer composition [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 14.04.2000 Database last updated on 30.07.2024 | Most recent event Tooltip | 14.04.2000 | No opposition filed within time limit | published on 31.05.2000 [2000/22] | Applicant(s) | For all designated states Shin-Etsu Chemical Co., Ltd. 6-1, Otemachi 2-chome Chiyoda-ku Tokyo / JP | [N/P] |
| Former [1992/39] | For all designated states SHIN-ETSU CHEMICAL CO., LTD. 6-1, Ohtemachi 2-chome Chiyoda-ku Tokyo / JP | Inventor(s) | 01 /
Okinoshima, Hiroshige 19-1, Isobe 3-chome Annaka-shi, Gunma-ken / JP | 02 /
Kato, Hideto No. 179-5, Kaminamie-machi Takasaki-shi, Gunma-ken / JP | [1992/39] | Representative(s) | Stoner, Gerard Patrick, et al Mewburn Ellis LLP City Tower 40 Basinghall Street London EC2V 5DE / GB | [N/P] |
| Former [1992/39] | Stoner, Gerard Patrick, et al MEWBURN ELLIS York House 23 Kingsway London WC2B 6HP / GB | Application number, filing date | 92302326.1 | 18.03.1992 | [1992/39] | Priority number, date | JP19910078587 | 18.03.1991 Original published format: JP 7858791 | [1992/39] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP0505161 | Date: | 23.09.1992 | Language: | EN | [1992/39] | Type: | B1 Patent specification | No.: | EP0505161 | Date: | 16.06.1999 | Language: | EN | [1999/24] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 12.06.1992 | Classification | IPC: | G03F7/037, G03F7/075, G03F7/038 | [1992/39] | CPC: |
G03F7/0757 (EP,US);
C09D179/08 (KR);
C08L79/08 (KR);
G03F7/027 (KR);
G03F7/037 (EP,KR,US);
G03F7/0387 (EP,US)
| Designated contracting states | DE, FR, GB [1992/39] | Title | German: | Photoempfindliche Polymerzusammensetzung | [1992/39] | English: | Photosensitive polymer composition | [1992/39] | French: | Composition polymère photosensible | [1998/29] |
| Former [1992/39] | Composition polymérique photosensible | Examination procedure | 08.02.1993 | Examination requested [1993/15] | 19.09.1996 | Despatch of a communication from the examining division (Time limit: M04) | 23.12.1996 | Reply to a communication from the examining division | 05.08.1997 | Despatch of a communication from the examining division (Time limit: M04) | 08.12.1997 | Reply to a communication from the examining division | 05.08.1998 | Despatch of communication of intention to grant (Approval: Yes) | 21.09.1998 | Communication of intention to grant the patent | 14.12.1998 | Fee for grant paid | 14.12.1998 | Fee for publishing/printing paid | Opposition(s) | 17.03.2000 | No opposition filed within time limit [2000/22] | Fees paid | Renewal fee | 23.03.1994 | Renewal fee patent year 03 | 21.03.1995 | Renewal fee patent year 04 | 21.03.1996 | Renewal fee patent year 05 | 21.03.1997 | Renewal fee patent year 06 | 23.03.1998 | Renewal fee patent year 07 | 23.03.1999 | Renewal fee patent year 08 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [Y]JP01105241 ; | [Y]DE1522441 (BASF AG); | [A]EP0337698 (CHISSO CORP [JP]) | [Y] - PATENT ABSTRACTS OF JAPAN vol. 13, no. 345 (P-909)(3693) 3 August 1989 & JP-A-01 105 241 ( HITACHI CHEM CO LTD ) 21 April 1989, & JP01105241 A 19890421 | Examination | EP0453237 |