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Extract from the Register of European Patents

EP About this file: EP0559986

EP0559986 - Method for producing semiconductor wafer and substrate used for producing the semiconductor [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  31.01.1997
Database last updated on 05.10.2024
Most recent event   Tooltip17.02.2006Change - lapse in a contracting state
Updated state(s): FR
published on 05.04.2006  [2006/14]
Applicant(s)For all designated states
MITSUBISHI DENKI KABUSHIKI KAISHA
2-3, Marunouchi 2-chome
Chiyoda-ku
Tokyo / JP
[N/P]
Former [1993/37]For all designated states
MITSUBISHI DENKI KABUSHIKI KAISHA
2-3, Marunouchi 2-chome Chiyoda-ku
Tokyo / JP
Inventor(s)01 / Miyashita, Motoharu, c/o Mitsubishi Denki K. K.
Optoelect. and Microwave Devices R&D Lab., No. 1
Mizuhara 4-chome, Itami-shi, Hyogo-ken / JP
02 / Hayafuji, Norio, c/o Mitsubishi Denki K. K.
Optoelect. and Microwave Devices R&D Lab., No. 1
Mizuhara 4-chome, Itami-shi, Hyogo-ken / JP
03 / Mihashi, Yutaka, c/o Mitsubishi Denki K. K.
Optoelect. and Microwave Devices R&D Lab., No. 1
Mizuhara 4-chome, Itami-shi, Hyogo-ken / JP
[1993/37]
Representative(s)Beresford, Keith Denis Lewis, et al
Beresford Crump LLP
16 High Holborn
London WC1V 6BX / GB
[N/P]
Former [1993/37]Beresford, Keith Denis Lewis, et al
BERESFORD & Co. 2-5 Warwick Court High Holborn
London WC1R 5DJ / GB
Application number, filing date92310796.525.11.1992
[1993/37]
Priority number, dateJP1992008941612.03.1992         Original published format: JP 8941692
[1993/37]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0559986
Date:15.09.1993
Language:EN
[1993/37]
Type: A3 Search report 
No.:EP0559986
Date:15.12.1993
Language:EN
[1993/50]
Type: B1 Patent specification 
No.:EP0559986
Date:27.03.1996
Language:EN
[1996/13]
Search report(s)(Supplementary) European search report - dispatched on:EP26.10.1993
ClassificationIPC:C30B33/00, H01L21/00
[1993/37]
CPC:
B28D5/0005 (EP,US); B28D5/0011 (EP,US); C30B33/00 (EP,US);
Y10T428/219 (EP,US); Y10T428/24273 (EP,US); Y10T428/24298 (EP,US);
Y10T428/24306 (EP,US); Y10T428/24314 (EP,US); Y10T428/24479 (EP,US);
Y10T428/2457 (EP,US); Y10T428/24777 (EP,US) (-)
Designated contracting statesDE,   FR,   GB,   NL [1993/37]
TitleGerman:Verfahren zur Herstellung eines Halbleiterplätchens und Substrat für die Herstellung eines Halbleiters[1993/37]
English:Method for producing semiconductor wafer and substrate used for producing the semiconductor[1993/37]
French:Méthode pour la production de pastilles semi-conductrices et un substrat utilisé pour produire le semi-conducteur[1993/37]
Examination procedure17.12.1993Examination requested  [1994/06]
16.05.1995Despatch of communication of intention to grant (Approval: No)
11.09.1995Despatch of communication of intention to grant (Approval: later approval)
18.09.1995Communication of intention to grant the patent
23.11.1995Fee for grant paid
23.11.1995Fee for publishing/printing paid
Opposition(s)28.12.1996No opposition filed within time limit [1997/12]
Fees paidRenewal fee
24.11.1994Renewal fee patent year 03
23.11.1995Renewal fee patent year 04
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competence of the Unified
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See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipFR27.03.1996
NL27.03.1996
DE28.06.1996
[2006/14]
Former [2003/07]NL27.03.1996
DE28.06.1996
FR23.08.1996
Former [1997/12]DE28.06.1996
FR23.08.1996
Former [1997/03]DE28.06.1996
Documents cited:Search[A]US4488930  (KOE KIYOHIKO [JP]);
 [A]EP0221454  (MITSUBISHI METAL CORP [JP], et al);
 [A]JPS62225019
 [A]  - PATENT ABSTRACTS OF JAPAN, (19880326), vol. 12, no. 94, Database accession no. (E - 593), & JP62225019 A 19871003 (TOSHIBA CORP) [A] * abstract *
 [A]  - JACKSEN, "Materials and technology of wafering", SOLID STATE TECHNOLOGY, WASHINGTON US, (198507), vol. 28, no. 7, pages 107 - 114
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.