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EP About this file: EP0522986

EP0522986 - Apparatus and process for diamond deposition by micro wave assisted CVD [Right-click to bookmark this link]
Status	The application has been withdrawn Status updated on 31.05.1995 Database last updated on 19.10.2024
Most recent event Tooltip	31.05.1995	Withdrawal of application	published on 19.07.1995 [1995/29]
Applicant(s)	For all designated states PECHINEY RECHERCHE (Groupement d'Intérêt Economique régi par l'ordonnance du 23 Septembre 1967) Immeuble Balzac, 10, place des Vosges 92400 Courbevoie la Défense 5 / FR
	[N/P]
Former [1993/02]	For all designated states PECHINEY RECHERCHE (Groupement d'Intérêt Economique régi par l'Ordonnance du 23 Septembre 1967) Immeuble Balzac 10, place des Vosges F-92400 Courbevoie, La Défense 5 / FR
Inventor(s)	01 / Bou, Pierre 1, rue Edouard Manet, Résidence le Lac F-45100 Orleans la Source / FR
	02 / Vandenbulcke, Lionel 131 bis rue Demay F-45650 Saint Jean le Blanc / FR
	03 / Quilgars, Alain 148 Allée du Bois de la Moise F-45370 Jouy le Potier / FR
	04 / Coulon, Michel 15 Avenue Regnault F-95160 Montmorency / FR
	05 / Moisan, Michel 101 Avenue Beloeil Outremont H2V 2Z1, Quebec / CA
	[1993/02]
Representative(s)	Jacquet, Michel, et al PECHINEY 28, rue de Bonnel 69433 Lyon Cédex 03 / FR
	[N/P]
Former [1993/02]	Jacquet, Michel, et al PECHINEY 28, rue de Bonnel F-69433 Lyon Cédex 03 / FR
Application number, filing date	92420233.6	09.07.1992
	[1993/02]
Priority number, date	FR19910009552	12.07.1991 Original published format: FR 9109552
	[1993/02]
Filing language	FR
Procedural language	FR
Publication	Type:	A1 Application with search report
	No.:	EP0522986
	Date:	13.01.1993
	Language:	FR
	[1993/02]
Search report(s)	(Supplementary) European search report - dispatched on:	EP	10.11.1992
Classification	IPC:	C23C16/26, C23C16/50, H01J37/32	[1993/02]
	CPC:	C23C16/274 (EP,US); C23C16/277 (EP,US); C23C16/511 (EP,US); H01J37/32357 (EP,US)
Designated contracting states	DE, ES, GB, IT, SE [1993/02]
Title	German:	Verfahren und Vorrichtung zur Diamantabscheidung mittels Mikrowellen-Plasma CVD	[1993/02]
	English:	Apparatus and process for diamond deposition by micro wave assisted CVD	[1993/02]
	French:	Dispositif et procédé de dépot de diamant par DCPV assisté par plasma microonde	[1993/02]
File destroyed:	03.03.2001
Examination procedure	19.02.1993	Examination requested [1993/16]
	05.08.1994	Despatch of a communication from the examining division (Time limit: M04)
	26.11.1994	Reply to a communication from the examining division
	17.02.1995	Despatch of communication of intention to grant (Approval: )
	22.05.1995	Application withdrawn by applicant [1995/29]
Fees paid	Renewal fee
	23.06.1994	Renewal fee patent year 03
Opt-out from the exclusive Tooltip competence of the Unified Patent Court	See the Register of the Unified Patent Court for opt-out data
	Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:	Search	[A]JP60231498 ;
		[A]JP59171136 ;
		[A]JP2085368 ;
		[A]JP57133623 ;
		[A]JP1290591 ;
		[A]EP0145346 (GEN INSTRUMENT CORP [US]);
		[A]FR2575151 (FRANCE ETAT [FR]);
		[A]US4989542 (KAMO MUTSUKAZU [JP])
		[A] - PATENT ABSTRACTS OF JAPAN vol. 10, no. 98 (C-339)(2155) 15 Avril 1986 & JP-A-60 231 498 ( HITACHI SEISAKUSHO KK ) 18 Novembre 1985, & JP60231498 A 00000000
		[AD] - J. PHYS. E. SCI. INSTRUM. vol. 20, 14 Mai 1987, UK pages 1356 - 1361 M. MOISAN ET AL. 'The waveguide surfatron:a high power surface wave launcher to sustain large diameter dense plasma columns.'
		[A] - PATENT ABSTRACTS OF JAPAN vol. 9, no. 23 (E-293)(1746) 30 Janvier 1985 & JP-A-59 171 136 ( HITACHI SEISAKUSHO KK ) 27 Septembre 1984, & JP59171136 A 00000000
		[A] - PATENT ABSTRACTS OF JAPAN vol. 14, no. 280 (C-729)(4223) 18 Juin 1990 & JP-A-2 085 368 ( FUJITSU LTD ) 26 Mars 1990, & JP2085368 A 00000000
		[A] - PATENT ABSTRACTS OF JAPAN vol. 6, no. 230 (E-142)(1108) 16 Novembre 1982 & JP-A-57 133 623 ( HITACHI SEISAKUSHO KK ) 18 Août 1982, & JP57133623 A 00000000
		[A] - APPLIED PHYSICS LETTERS vol. 53, no. 23, 5 Décembre 1988, N.Y, U.S.A pages 2326 - 2327 Y. TZENG ET AL 'SPIRAL HOLLOW CATHODE PLASMA-ASSISTED DIAMOND DEPOSITION'
		[A] - PATENT ABSTRACTS OF JAPAN vol. 14, no. 68 (C-686)(4011) 8 Février 1990 & JP-A-1 290 591 ( HITACHI LTD ) 22 Novembre 1989, & JP1290591 A 00000000

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