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EP0616045
European procedure
Extract from the Register of European Patents
EP About this file: EP0616045
| EP0616045 - Silicide targets for sputtering and method of manufacturing the same [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 30.01.1998 Database last updated on 03.09.2024 | Most recent event Tooltip | 30.01.1998 | No opposition filed within time limit | published on 18.03.1998 [1998/12] | Applicant(s) | For all designated states JAPAN ENERGY CORPORATION 10-1, Toranomon 2-chome Minato-ku Tokyo / JP | [N/P] |
| Former [1994/38] | For all designated states JAPAN ENERGY CORPORATION 10-1, Toranomon 2-chome Minato-ku, Tokyo / JP | Inventor(s) | 01 /
Kano, Osamu, c/o Nikko Kyodo Co., Ltd. Isohara Factory, 187-4 Usuba, Hanakawa-cho Kitaibaraki-shi, Ibaraki-ken / JP | 02 /
Yasui, Koichi, c/o Nikko Kyodo Co., Ltd. Isohara Factory, 187-4 Usuba, Hanakawa-cho Kitaibaraki-shi, Ibaraki-ken / JP | 03 /
Sato, Yasuyuki, c/o Nikko Kyodo Co., Ltd. Isohara Factory, 187-4 Usuba, Hanakawa-cho Kitaibaraki-shi, Ibaraki-ken / JP | 04 /
Yamakoshi, Yasuhiro, c/o Nikko Kyodo Co., Ltd. Isohara Factory, 187-4 Usuba, Hanakawa-cho Kitaibaraki-shi, Ibaraki-ken / JP | 05 /
Anan, Junichi, c/o Nikko Kyodo Co., Ltd. Isohara Factory, 187-4 Usuba, Hanakawa-cho Kitaibaraki-shi, Ibaraki-ken / JP | 06 /
Wada, Hironori, c/o Nikko Kyodo Co., Ltd. Isohara Factory, 187-4 Usuba, Hanakawa-cho Kitaibaraki-shi, Ibaraki-ken / JP | 07 /
Yasuoka, Akio, c/o Nikko Kyodo Co., Ltd. Isohara Factory, 187-4 Usuba, Hanakawa-cho Kitaibaraki-shi, Ibaraki-ken / JP | [1994/38] | Representative(s) | Schwan, Gerhard Schwan Schwan Schorer Patentanwälte Bauerstrasse 22 80796 München / DE | [N/P] |
| Former [1994/38] | Schwan, Gerhard, Dipl.-Ing. Elfenstrasse 32 D-81739 München / DE | Application number, filing date | 93112762.5 | 09.08.1993 | [1994/38] | Priority number, date | JP19930083941 | 19.03.1993 Original published format: JP 8394193 | JP19930112517 | 16.04.1993 Original published format: JP 11251793 | [1994/38] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP0616045 | Date: | 21.09.1994 | Language: | EN | [1994/38] | Type: | B1 Patent specification | No.: | EP0616045 | Date: | 26.03.1997 | Language: | EN | [1997/13] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 02.06.1994 | Classification | IPC: | C23C14/14, C23C14/34, C22C29/18, C23C14/06 | [1997/13] | CPC: |
H01J37/3426 (EP,US);
C23C14/0682 (EP,US);
C23C14/3414 (EP,US);
H01J37/3491 (EP,US)
|
| Former IPC [1994/38] | C23C14/14, C23C14/34, C22C29/18 | Designated contracting states | DE, FR [1994/38] | Title | German: | Silizid-Targets für das Aufstäubungsverfahren und Verfahren zur Herstellung derselben | [1994/38] | English: | Silicide targets for sputtering and method of manufacturing the same | [1994/38] | French: | Cibles de pulvérisation en siliciure et procédé pour leur fabrication | [1994/38] | Examination procedure | 03.08.1994 | Examination requested [1994/39] | 30.07.1996 | Despatch of communication of intention to grant (Approval: Yes) | 30.09.1996 | Communication of intention to grant the patent | 18.11.1996 | Fee for grant paid | 18.11.1996 | Fee for publishing/printing paid | Opposition(s) | 30.12.1997 | No opposition filed within time limit [1998/12] | Fees paid | Renewal fee | 31.08.1995 | Renewal fee patent year 03 | 05.08.1996 | Renewal fee patent year 04 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]EP0483375 (TOSHIBA KK [JP]) [A] 1-6; | [A]EP0374931 (TOSHIBA KK [JP]) [A] 1-6; | [A]US4938798 (CHIBA YOSHITAKA [JP], et al) [A] 1-6; | [A]US4750932 (PARENT EDWARD D [US], et al) [A] 1-6; | [A]US4663120 (PARENT EDWARD D [US], et al) [A] 1-6 |