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EP0585848
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EP About this file: EP0585848
| EP0585848 - Method and apparatus for thin film formation by CVD [Right-click to bookmark this link] | Status | The application has been withdrawn Status updated on 06.06.1994 Database last updated on 14.06.2024 | Most recent event Tooltip | 06.06.1994 | Withdrawal of application | published on 27.07.1994 [1994/30] | Applicant(s) | For all designated states HOECHST AKTIENGESELLSCHAFT Brüningstrasse 50 65929 Frankfurt am Main / DE | [N/P] |
| Former [1994/10] | For all designated states HOECHST AKTIENGESELLSCHAFT Brüningstrasse 50 D-65929 Frankfurt am Main / DE | Inventor(s) | 01 /
Häussler, Peter Dr. Am Steinbruch 4 D-76227 Karlsruhe / DE | 02 /
Steinig, Heinz Zum Häuserstein 9 D-65529 Waldems / DE | [1994/10] | Application number, filing date | 93113803.6 | 30.08.1993 | [1994/10] | Priority number, date | DE19924229247 | 02.09.1992 Original published format: DE 4229247 | [1994/10] | Filing language | DE | Procedural language | DE | Publication | Type: | A1 Application with search report | No.: | EP0585848 | Date: | 09.03.1994 | Language: | DE | [1994/10] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 14.12.1993 | Classification | IPC: | C23C16/44, C23C16/40 | [1994/10] | CPC: |
C23C16/4481 (EP);
C23C16/408 (EP)
| Designated contracting states | BE, DE, DK, FR, GB, IT, NL [1994/10] | Title | German: | Verfahren und Vorrichtung zur chemischen Gasphasenabscheidung dünner Schichten | [1994/10] | English: | Method and apparatus for thin film formation by CVD | [1994/10] | French: | Procédé et dispositif de formation des films minces par dépôt chimique en phase vapeur | [1994/10] | File destroyed: | 03.09.2001 | Examination procedure | 26.05.1994 | Application withdrawn by applicant [1994/30] |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [XDA]WO9107236 (GEORGIA TECH RESEARCH CORPORATION) [XD] 1,3,6 * page 14, line 2 - line 14 * [AD] 2,4,5,7-9; | [XA]US3754529 (P.L. FLEISCHNER) [X] 8 * column 3, line 20 - column 4, line 27 * [A] 9; | [A]WO8707848 (SPECTRUM CONTROL INC) [A] 1-9 * page 16, line 25 - page 17, line 2; figure 5 *; | [A]EP0361171 (LEYBOLD AKTIENGESELLSCHAFT) [A] 9 * column 7, line 1 - line 8 * | [XA] - S. MATSUNO ET AL, "METALORGANIC CHEMICAL VAPOR DEPOSITION USING A SINGLE SOLUTION SOURCE FOR HIGH Jc Y1Ba2Cu3O7-X SUPERCONDUCTING FILMS.", APPLIED PHYSICS LETTERS, US, (19920511), vol. 60, no. 19, pages 2427 - 2429, XP000275895 [X] 1,4,6 * figure 1 * [A] 2,3,5-9 DOI: http://dx.doi.org/10.1063/1.106994 |