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EP0601468
European procedure
Extract from the Register of European Patents
EP About this file: EP0601468
| EP0601468 - Process and electromagnetically coupled planar plasma apparatus for etching oxides [Right-click to bookmark this link] | Status | Patent revoked Status updated on 02.04.2004 Database last updated on 29.03.2025 | Most recent event Tooltip | 05.10.2005 | Change: Appeal number | Applicant(s) | For all designated states Applied Materials, Inc. 3050 Bowers Avenue M/S 2061 Santa Clara, California 95054-3299 / US | [N/P] |
| Former [1998/12] | For all designated states APPLIED MATERIALS, INC. 3050 Bowers Avenue, M/S 2061 Santa Clara, California 95054-3299 / US | ||
| Former [1994/24] | For all designated states APPLIED MATERIALS, INC. 3050 Bowers Avenue Santa Clara California 95054-3299 / US | Inventor(s) | 01 /
Collins, Kenneth S. 165 Knightshaven Way San Jose, CA 95111 / US | 02 /
Marks, Jeffrey 4730 Cielo Vista Way San Jose, California 94129-1446 / US | [1994/24] | Representative(s) | Zimmermann, Gerd Heinrich, et al Zimmermann & Partner Patentanwälte mbB Postfach 330 920 80069 München / DE | [N/P] |
| Former [2000/04] | Zimmermann, Gerd Heinrich, et al Zimmermann & Partner, P.O. Box 33 09 20 80069 München / DE | ||
| Former [1994/24] | Diehl, Hermann, Dr. Dipl.-Phys., et al DIEHL, GLÄSER, HILTL & PARTNER Patentanwälte Flüggenstrasse 13 D-80639 München / DE | Application number, filing date | 93119391.6 | 01.12.1993 | [1994/24] | Priority number, date | US19920984045 | 01.12.1992 Original published format: US 984045 | [1994/24] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP0601468 | Date: | 15.06.1994 | Language: | EN | [1994/24] | Type: | B1 Patent specification | No.: | EP0601468 | Date: | 18.03.1998 | Language: | EN | [1998/12] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 23.02.1994 | Classification | IPC: | H01J37/32 | [1994/24] | CPC: |
H01J37/32871 (EP,KR,US);
H01J37/321 (EP,KR,US);
H01J37/32165 (EP,US);
H01J37/32458 (EP,US);
H01J37/32522 (EP,KR,US);
H01L21/31116 (EP,KR,US);
H01L21/6831 (EP,US);
H01F2029/143 (EP,US);
H01J2237/3345 (EP,US);
H01J2237/3346 (EP,US)
(-)
| Designated contracting states | DE, ES, FR, GB, IT, NL [1994/24] | Title | German: | Verfahren und Gerät zur Erzeugung eines elektromagnetisch gekoppelten flachen Plasmas zum Ätzen von Oxyden | [1994/24] | English: | Process and electromagnetically coupled planar plasma apparatus for etching oxides | [1994/24] | French: | Procédé et appareil de production d'un plasma plan par couplage électromagnétique pour graver des oxydes | [1994/24] | Miscellaneous | EPB 1998/12: (deleted) | EPB 1998/12: (deleted) | EPB 1998/12: (deleted) | EPB 1997/36: Teilanmeldung 97109781.1 eingereicht am 16/06/97 | EPB 1997/36: Divisional application 97109781.1 filed on 16/06/97 | EPB 1997/36: Demande divisionnaire 97109781.1 déposée le 16/06/97 | Examination procedure | 15.12.1994 | Examination requested [1995/07] | 10.06.1996 | Despatch of a communication from the examining division (Time limit: M06) | 20.12.1996 | Reply to a communication from the examining division | 06.02.1997 | Despatch of communication of intention to grant (Approval: Yes) | 27.06.1997 | Communication of intention to grant the patent | 02.10.1997 | Fee for grant paid | 02.10.1997 | Fee for publishing/printing paid | Divisional application(s) | EP97109781.1 / EP0802560 | Opposition(s) | Opponent(s) | 01
18.12.1998
ADMISSIBLE Institute of Technological Information, Inc. 2-2, Kitahara 2-chome Asaka-shi Saitama-ken 351 / JP Opponent's representative Marsh, Roy David Hoffmann Eitle ATTENTION : ADDRESS INACTIVE - USE ASS-NR - CDR / DE | [N/P] |
| Former [1999/07] | |||
| Opponent(s) | 01
18.12.1998
ADMISSIBLE Institute of Technological Information, Inc. 2-2, Kitahara 2-chome Asaka-shi Saitama-ken 351 / JP Opponent's representative Marsh, Roy David Hoffmann Eitle, Patent- und Rechtsanwälte, Arabellastrasse 4 81925 München / DE | 28.01.1999 | Invitation to proprietor to file observations on the notice of opposition | 06.08.1999 | Reply of patent proprietor to notice(s) of opposition | 13.03.2001 | Date of oral proceedings | 17.07.2001 | Despatch of interlocutory decision in opposition | 17.07.2001 | Despatch of minutes of oral proceedings | 29.01.2004 | Legal effect of revocation of patent [2004/21] | 29.01.2004 | Despatch of communication that the patent will be revoked | Appeal following opposition | 17.09.2001 | Appeal received No. T1034/01 | 23.11.2001 | Statement of grounds filed | 26.03.2004 | Interlocutory revision of appeal | 26.03.2004 | Result of appeal procedure: revocation of the patent | 29.01.2004 | Date of oral proceedings | 18.02.2004 | Minutes of the oral proceedings despatched | Fees paid | Renewal fee | 15.12.1995 | Renewal fee patent year 03 | 23.12.1996 | Renewal fee patent year 04 | 23.12.1997 | Renewal fee patent year 05 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | NL | 01.07.2001 | ES | 02.12.2002 | [2004/28] |
| Former [2004/15] | NL | 01.07.2001 | |
| ES | 13.01.2003 | ||
| Former [2002/14] | NL | 01.07.2001 | Documents cited: | Search | [DA]US4948458 (OGLE JOHN S [US]) [DA] 1,3-6,11,12 * column 3, paragraph 1 - paragraph 2 * * column 5, line 33 - column 6, line 16 * * column 6, line 60 - column 7, line 10; figures 1,2,6 *; | [PA]EP0552491 (APPLIED MATERIALS INC [US]) [PA] 1,7-10,12-18,21 * claim 1 ** page 9, line 46 - page 10, line 23; figure 1 * | [OA] - J. MARKS ET AL., "Introduction of a new high density plasma reactor concept for high aspect ratio oxide etching", CONFERENCE, ADVANCED TECHNIQUES FOR INTEGRATED CIRCUIT PROCESSING II, SAN JOSE, CALIFORNIA (USA), (19920921) [OA] 1,12 | [ ] - PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, USA, (1992), vol. 1803, pages 235 - 247 [ ] * whole document * |