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EP0573281
European procedure
Extract from the Register of European Patents
EP About this file: EP0573281
| EP0573281 - Method for optimizing a light source profile in an optical exposure apparatus and optical exposure method in which a light source profile is set using such optimization method, in particular where the light is projected obliquely towards a mask [Right-click to bookmark this link] | |||
| Former [1993/49] | Oblique illumination of a mask using a spatial filter with at least one extending parallel to the mask pattern | ||
| [1999/51] | Status | No opposition filed within time limit Status updated on 28.07.2001 Database last updated on 26.03.2026 | Most recent event Tooltip | 28.07.2001 | No opposition filed within time limit | published on 12.09.2001 [2001/37] | Applicant(s) | For all designated states FUJITSU LIMITED 1015, Kamikodanaka, Nakahara-ku Kawasaki-shi Kanagawa 211 / JP | [N/P] |
| Former [1993/49] | For all designated states FUJITSU LIMITED 1015, Kamikodanaka, Nakahara-ku Kawasaki-shi, Kanagawa 211 / JP | Inventor(s) | 01 /
Haruki, Tamae, c/o Fujitsu Limited 1015, Kamikodanaka, Nakahara-ku Kawasaki-shi, Kanagawa 211 / JP | 02 /
Nakagawa, Kenji, c/o Fujitsu Limited 1015, Kamikodanaka, Nakahara-ku Kawasaki-shi, Kanagawa 211 / JP | 03 /
Taguchi, Masao, c/o Fujitsu Limited 1015, Kamikodanaka, Nakahara-ku Kawasaki-shi, Kanagawa 211 / JP | 04 /
Tanaka, Hiroyuki, c/o Fujitsu Limited 1015, Kamikodanaka, Nakahara-ku Kawasaki-shi, Kanagawa 211 / JP | 05 /
Asai, Satoru, c/o Fujitsu Limited 1015, Kamikodanaka, Nakahara-ku Kawasaki-shi, Kanagawa 211 / JP | 06 /
Hanyu, Isamu, c/o Fujitsu Limited 1015, Kamikodanaka, Nakahara-ku Kawasaki-shi, Kanagawa 211 / JP | [1993/49] | Representative(s) | Gibbs, Christopher Stephen, et al Haseltine Lake LLP Lincoln House, 5th Floor 300 High Holborn London WC1V 7JH / GB | [N/P] |
| Former [1993/49] | Gibbs, Christopher Stephen, et al Haseltine Lake & Co. Hazlitt House 28 Southampton Buildings Chancery Lane, London WC2A 1AT / GB | Application number, filing date | 93304280.6 | 02.06.1993 | [1993/49] | Priority number, date | JP19920141548 | 02.06.1992 Original published format: JP 14154892 | JP19920141755 | 02.06.1992 Original published format: JP 14175592 | JP19920182913 | 18.06.1992 Original published format: JP 18291392 | JP19920267415 | 06.10.1992 Original published format: JP 26741592 | JP19930060593 | 19.03.1993 Original published format: JP 6059393 | [1993/49] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0573281 | Date: | 08.12.1993 | Language: | EN | [1993/49] | Type: | A3 Search report | No.: | EP0573281 | Date: | 16.02.1994 | Language: | EN | [1994/07] | Type: | B1 Patent specification | No.: | EP0573281 | Date: | 27.09.2000 | Language: | EN | [2000/39] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 28.12.1993 | Classification | IPC: | G03F7/20 | [1993/49] | CPC: |
G03F7/70566 (EP,US);
G03F7/201 (EP,US);
G03F7/70091 (EP,US);
G03F7/701 (EP,US);
G03F7/70125 (EP,US);
G03F7/70241 (EP,US);
| Designated contracting states | FR, GB, IT [1993/49] | Title | German: | Verfahren zur Optimierung eines Lichtquellen-Profils in einem optischen Belichtungsapparat und Verfahren zur optischen Belichtung, in welchem ein Lichtquellen-Profil aus diesem Optimierungsverfahrens verwendet wird, insbesondere indem das Licht schräg auf eine Maske projiziert wird | [1999/51] | English: | Method for optimizing a light source profile in an optical exposure apparatus and optical exposure method in which a light source profile is set using such optimization method, in particular where the light is projected obliquely towards a mask | [1999/51] | French: | Procédé d'optimisation du profil d'une source lumineuse dans un appareil de projection optique et procédé de projection optique basé sur un profil d'une source lumineuse obtenu par ce procédé d'optimisation, notamment par projection oblique de la lumière vers un masque | [1999/51] |
| Former [1993/49] | Schrägeinfallende Beleuchtung einer Maske unter Verwendung von einem Räumlichen Filter mit mindestens einer zum Maskenmuster parallel ausgerichteten Öffnung | ||
| Former [1993/49] | Oblique illumination of a mask using a spatial filter with at least one extending parallel to the mask pattern | ||
| Former [1993/49] | Illumination oblique d'un masque utilisant un filtre spatial avec au moins une ouverture allongée parallèle au motif du masque | Examination procedure | 09.08.1994 | Examination requested [1994/41] | 31.01.1997 | Despatch of a communication from the examining division (Time limit: M06) | 29.07.1997 | Reply to a communication from the examining division | 26.11.1997 | Despatch of a communication from the examining division (Time limit: M06) | 25.05.1998 | Reply to a communication from the examining division | 26.10.1999 | Date of oral proceedings | 29.11.1999 | Despatch of communication of intention to grant (Approval: Yes) | 29.11.1999 | Minutes of oral proceedings despatched | 03.04.2000 | Communication of intention to grant the patent | 26.06.2000 | Fee for grant paid | 26.06.2000 | Fee for publishing/printing paid | Opposition(s) | 28.06.2001 | No opposition filed within time limit [2001/37] | Fees paid | Renewal fee | 02.05.1995 | Renewal fee patent year 03 | 25.06.1996 | Renewal fee patent year 04 | 19.06.1997 | Renewal fee patent year 05 | 25.06.1998 | Renewal fee patent year 06 | 21.06.1999 | Renewal fee patent year 07 | 26.06.2000 | Renewal fee patent year 08 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [AY] K. KAMON ET AL.: "Photolithography System Using Annular Illumination", JAPANESE JOURNAL OF APPLIED PHYSICS, vol. 30, no. 11B, November 1991 (1991-11-01), TOKYO JP, pages 3021 - 3029, XP000263405 [A] 1,3,5,7,9,11,13,16-20,23 * page 3023, column L; table 1 * * page 3028, column L, paragraph 3 - page 3029, column L; figures 3,11 *[Y] 32,33,35 DOI: http://dx.doi.org/10.1143/JJAP.30.3021 | [A] S. ASAI ET AL.: "Improving projection lithography image illumination by using sources far from the optical axis", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B., vol. 9, no. 6, November 1991 (1991-11-01), NEW YORK US, pages 2788 - 2791, XP000268482 [A] 25,28 * the whole document * DOI: http://dx.doi.org/10.1116/1.585645 |