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Extract from the Register of European Patents

EP About this file: EP0578507

EP0578507 - Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  04.08.2006
Database last updated on 22.08.2024
Most recent event   Tooltip04.08.2006No opposition filed within time limitpublished on 06.09.2006  [2006/36]
Applicant(s)For all designated states
EKC TECHNOLOGY, INC.
2520 Barrington Court Hayward
California 94545 / US
[N/P]
Former [2005/39]For all designated states
EKC TECHNOLOGY, INC.
2520 Barrington Court Hayward
California 94545 / US
Former [1994/02]For all designated states
EKC TECHNOLOGY, INC.
2520 Barrington Court
Hayward California 94545 / US
Inventor(s)01 / Lee, Wai Mun
40898 Abuelo Way
Fremont, California 94539 / US
02 / Pittman, Charles Uria Jr.
18 Triangle Townhouses Highway 25
Starkville, Mississippi 39759 / US
03 / Small, Robert James
354 Teakwood Drive
Stasuma Alabama 36572 / US
[1994/02]
Representative(s)Gallafent, Richard John
Gallafents Ltd The Old Vicarage
Stanbridge, Bedfordshire LU7 9HX / GB
[N/P]
Former [1994/02]Gallafent, Richard John
GALLAFENT & CO. 8 Staple Inn
London WCIV 7QH / GB
Application number, filing date93305418.109.07.1993
[1994/02]
Priority number, dateUS1992091110209.07.1992         Original published format: US 911102
US1993007865721.06.1993         Original published format: US 78657
[1994/02]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0578507
Date:12.01.1994
Language:EN
[1994/02]
Type: A3 Search report 
No.:EP0578507
Date:19.07.1995
Language:EN
[1995/29]
Type: B1 Patent specification 
No.:EP0578507
Date:28.09.2005
Language:EN
[2005/39]
Search report(s)(Supplementary) European search report - dispatched on:EP01.06.1995
ClassificationIPC:G03F7/42, C11D3/30, C11D3/26
[1994/02]
CPC:
H01L21/76885 (EP); B24B37/042 (EP); C09D9/00 (EP);
C11D7/263 (EP); C11D7/265 (EP); C11D7/267 (EP);
C11D7/32 (EP); C11D7/3209 (EP); C11D7/3218 (EP);
C11D7/3227 (EP); C11D7/3245 (EP); C11D7/3254 (EP);
C11D7/3263 (EP); C11D7/3272 (EP); C11D7/3281 (EP);
C11D7/34 (EP); C11D7/5013 (EP); C23G1/103 (EP);
C23G1/205 (EP); G03F7/42 (EP); G03F7/425 (EP);
H01L21/02063 (EP); H01L21/02071 (EP); H01L21/31133 (EP);
H01L21/76802 (EP); C11D2111/22 (EP) (-)
Designated contracting statesDE,   FR,   GB,   IT,   NL [1994/02]
TitleGerman:Reinigungsmittelzusammensetzung, das einem Redox Aminverbindung enthält[1994/02]
English:Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials[1994/02]
French:Composition de nettoyage à base d'un composé aminé redox[1994/02]
Examination proceduredeletedDecision about request for accelerated examination - accepted: No
23.09.1995Examination requested  [1995/46]
22.02.1996Despatch of a communication from the examining division (Time limit: M06)
17.12.1996Reply to a communication from the examining division
06.03.1998Despatch of a communication from the examining division (Time limit: M06)
16.09.1998Reply to a communication from the examining division
06.05.1999Despatch of a communication from the examining division (Time limit: M06)
15.11.1999Reply to a communication from the examining division
15.11.1999Request for accelerated examination filed
31.01.2001Despatch of a communication from the examining division (Time limit: M06)
10.08.2001Reply to a communication from the examining division
27.06.2002Despatch of a communication from the examining division (Time limit: M06)
03.01.2003Reply to a communication from the examining division
19.09.2003Communication of intention to grant the patent
23.01.2004Fee for grant paid
23.01.2004Fee for publishing/printing paid
Opposition(s)29.06.2006No opposition filed within time limit [2006/36]
Request for further processing for:17.12.1996Request for further processing filed
17.12.1996Full payment received (date of receipt of payment)
Request granted
20.01.1997Decision despatched
Fees paidRenewal fee
14.07.1995Renewal fee patent year 03
17.07.1996Renewal fee patent year 04
30.07.1997Renewal fee patent year 05
22.07.1998Renewal fee patent year 06
17.06.1999Renewal fee patent year 07
26.07.2000Renewal fee patent year 08
22.06.2001Renewal fee patent year 09
26.06.2002Renewal fee patent year 10
04.07.2003Renewal fee patent year 11
30.06.2004Renewal fee patent year 12
29.06.2005Renewal fee patent year 13
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Documents cited:Search[X]EP0009677  (IBM [US]) [X] 1,2,4,7,8,17-20,22-24 * the whole document *;
 [XY]EP0299166  (MITSUBISHI HEAVY IND LTD [JP]) [X] 1,2,4,6,7,10,12-19 * claim 2 * * table 1 * [Y] 1-24;
 [A]EP0300463  (TOKYO OHKA KOGYO CO LTD [JP]);
 [Y]EP0485161  (EKC TECHNOLOGY INC [US]) [Y] 1-24 * the whole document *
ExaminationUS4617251
 EP0219789
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.