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Extract from the Register of European Patents

EP About this file: EP0588492

EP0588492 - High aspect ratio, flexible thick film positive photoresist [Right-click to bookmark this link]
StatusThe application has been withdrawn
Status updated on  03.04.1995
Database last updated on 19.10.2024
Most recent event   Tooltip03.04.1995Withdrawal of applicationpublished on 24.05.1995 [1995/21]
Applicant(s)For all designated states
MORTON INTERNATIONAL, INC.
Morton International Building 100 North Riverside Plaza Randolph Street at the River Chicago
Illinois 60606-1596 / US
[N/P]
Former [1994/12]For all designated states
MORTON INTERNATIONAL, INC.
Morton International Building 100 North Riverside Plaza Randolph Street at the River
Chicago Illinois 60606-1596 / US
Inventor(s)01 / Dixit, Sunit S.
23572 Via Breve
Mission Viejo, California 92621 / US
[1994/12]
Representative(s)Bankes, Stephen Charles Digby, et al
Baron Warren Redfern
1000 Great West Road
Brentford TW8 9DW / GB
[N/P]
Former [1994/12]Bankes, Stephen Charles Digby, et al
BARON & WARREN 18 South End Kensington
London W8 5BU / GB
Application number, filing date93306421.413.08.1993
[1994/12]
Priority number, dateUS1992093791328.08.1992         Original published format: US 937913
[1994/12]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0588492
Date:23.03.1994
Language:EN
[1994/12]
Search report(s)(Supplementary) European search report - dispatched on:EP05.01.1994
ClassificationIPC:G03F7/004, G03F7/023
[1994/12]
CPC:
G03F7/16 (EP); G03F7/004 (KR); G03F7/0233 (EP)
Designated contracting statesAT,   BE,   DE,   FR,   GB,   IT,   NL [1994/12]
TitleGerman:Flexibler, dicker Positiv-Photoresistfilm mit hohem Aspektverhältnis[1994/12]
English:High aspect ratio, flexible thick film positive photoresist[1994/12]
French:Film épais et flexible de photorésistance positive ayant un haut facteur de forme[1994/12]
File destroyed:03.03.2001
Examination procedure13.04.1994Examination requested  [1994/23]
20.03.1995Application withdrawn by applicant  [1995/21]
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Documents cited:Search[A]GB1243963  (HOWSON ALGRAPHY LTD [GB]);
 [A]US4448875  (LEWIS DAVID F [US]);
 [A]US4728597  (HSIEH SHANE [US], et al);
 [A]DE3736996  (BASF AG [DE])
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.